Program
Status as Apr 12, 2021Wednesday, September 9
Event D | Carl Zeiss Saal | CongressCenter CC
Registration
Wednesday, September 9, 2020 | 08:30 - 09:00
09:00 - 09:45 PL0003 |
Plenary Lecture | Halle 1 High-Temperature and Aerospace Coatings Christoph Leyens1, Stefan Heinze2, Andreas Leson1, Max Thorhauer2, Filofteia-Laura Toma2, Christoph Leyens2 1Fraunhofer IWS, Dresden, Germany, 2Inst. of Materials Science, TU Dresden, Dresden, Germany Abstract |
10:00 - 11:00 | Poster Session Entrance East |
11:00 - 11:30 | Coffee break Exhibition | Foyer Halle 1 |
Session D1 | Energy conversion related coatings |
|
11:30 - 11:50 ORD101 |
Hybrid Reactive High Power Impulse Magnetron Sputtering System used for the Deposition of Semiconductor Thin Films for Photoelectrochemical Applications. Zdeněk Hubička1, Martin Čada1, Jiří Olejníček1, Michaela Dvořáková1, Petra Kšírová1, Drahoslav Tvarog1, Rainer Hippler1 1Institute of Physics CAS, Prague, Czech Republic Abstract |
11:50 - 12:10 ORD102 |
Chromium nitride deposition onto silicon pyramids for supercapacitor applications Emile HAYE1, Abdelouadoud GUERRA2, Amine ACHOUR1, Jean-Jacques PIREAUX1, Stéphane LUCAS3 1UNamur, NAMUR, Belgium, 2CRTSE, Alger, Algeria, 3Unamur, NAMUR, Belgium Abstract |
12:10 - 12:30 ORD103 |
Renewable Energy for Nitric Acid Production with Atmospheric Microwave Plasma Andreas Schulz1, Aina Suphellen2, Morten Jensen2, Rune Ingels2, Matthias Walker1, Günter Tovar1 1University of Stuttgart, IGVP, Stuttgart, Germany, 2N2 Applied AS, Oslo, Norway Abstract |
12:30 - 12:50 ORD104 |
Gliding arc plasmatron- plasma chemical reactor for methane conversion Nikita Bibinov1, Simon Böddeker1, Peter Awakowicz1 1Ruhr University Bochum, Bochum, Germany Abstract |
12:50 - 13:10 ORD105 |
Microstructure, optical and electrical properties of p-type copper iodide thin films OSAMA MADKHALI1, Jaafar Ghanbaja1, Sandrine Mathieu1, Sylvie Migot1, Abdelkrim Redjaimia1, Maud Jullien1, Jean-François Pierson1 1Institute Jean Lamour, Nancy, France Abstract |
13:10 - 13:30 ORD106 |
On the bias effect in ZnSnN2 thin films grown by reactive magnetron co-sputtering. Agathe Virfeu1, Fahad Alnjiman1, Sandrine Mathieu1, Jaafar Ghanbaja1, Christophe Longeaud2, Sylvain Le Gall2, Leonardo Kopprio2, Jean-Pierre Vilcot3, Jean-François Pierson1 1Institut Jean Lamour, Nancy, France,2Group of Electrical Engineering of Paris, Gif-sur-Yvette, France, 3IEMN, Villeneuve d'Ascq, France Abstract |
13:30 - 14:30 | Lunch Break Exhibition | Foyer Halle 1 |
Session D2 | Industrial Workshop: Plasma technology for new energy concepts |
14:30 - 15:00 KND201 |
EU vision and initiatives on the Energy Transition Paul Rübig1 1Former Member European Parliament, Wels, Austria Abstract |
15:00 - 15:30 ORD201 |
Plasma activated electrochemical conversion for the electrification of the (chemical) industry Richard van de Sanden1, Richard van de Sanden2 1EIRES, Einhoven University of Technology, Eindhoven, Netherlands, 2DIFFER - Fundamental Energy Reserach, Eindhoven, Netherlands Abstract |
15:30 - 16:00 ORD202 |
Industrial equipment and coating solutions for the challenges of the energy-transition Jörg Neidhardt1 1Von Ardenne GmbH, Dresden, Germany Abstract |
16:00 - 16:30 | Coffee Break Exhibition | Foyer Halle 1 |
16:30 - 17:00 ORD203 |
Overview of developments of hydrogen technology Roel Bosch1, Jörg Karstedt2 1IHI Hauzer Techno Coating B.V., Venlo, Netherlands, 2Zentrum für BrennstoffzellenTechik GmbH, Duisburg, Germany Abstract |
17:00 - 17:30 ORD204 |
Coatings of metal bipolar plates for PEM fuel cells and electrolyzers with high durability performance David Kolenaty1, Gerrit-Jan van der Kolk1, Ton Hurkmans1, Ivailo Dolchinkov1 1IHI Ionbond Netherlands b.v., Venlo, Netherlands Abstract |
Event E | Halle 1
Registration
Wednesday, September 9, 2020 | 08:30 - 09:00
09:00 - 09:45 PL0003 |
Plenary Lecture | Halle 1 High-Temperature and Aerospace Coatings Christoph Leyens1, Stefan Heinze2, Andreas Leson1, Max Thorhauer2, Filofteia-Laura Toma2, Christoph Leyens2 1Fraunhofer IWS, Dresden, Germany, 2Inst. of Materials Science, TU Dresden, Dresden, Germany Abstract |
Session E1 | PVD 1 - Magnetronsputtering |
|
10:00 - 10:30 KNE101 |
Energetic Tailoring of Magnetron Sputtering Deposition Processes for Defect-sensitive Materials: Transparent Conductive Oxides and other Semiconductors Klaus Ellmer1, Stefan Seeger1 1Optotransmitter-Umweltschutz-Technologie, Berlin, Germany Abstract |
10:30 - 10:50 ORE101 |
Hot hollow cathode discharge as a tool for high-rate plasma deposition of oxide thin films Jiří Olejníček1, Jiří Šmíd1, Michal Kohout1, Martin Čada1, Roman Perekrestov1, Petra Kšírová1, Drahoslav Tvarog1, Zdeněk Hubička1 1Institute of Physics ASCR, Prague, Czech Republic Abstract |
10:50 - 11:10 ORE102 |
Reactive HiPIMS deposition of Ti-Al-N: Influence of the deposition parameters on the cubic to hexagonal phase transition Lukas Zauner1, Tomasz Wojcik2, Tomáš Kozák3, Jiří Čapek3, Hamid Bolvardi4, Szilárd Kolozsvári5, Paul Heinz Mayrhofer2, Helmut Riedl1 1CDL-SEC, TU Wien, Wien, Austria, 2Institute of Materials Science, TU Wien, Wien, Austria, 3Department of Physics and NTIS, Pilsen, Czech Republic, 4Oerlikon Surface Solutions AG, Balzers, Liechtenstein,5Plansee Composite Materials GmbH, Lechbruck am See, Germany Abstract |
11:10 - 11:30 ORE103 |
PARTICLES IN VACUUM COATING TECHNOLOGY Dieter Wurczinger1 1Wurczinger Engineering, Bad Vilbel, Germany Abstract |
11:30 - 12:30 | Lunch Break Exhibition | Foyer Halle 1 |
Session E2 | PVD 2 - Magnetronsputtering |
12:30 - 13:00 KNE201 |
Mechanical properties and thermal stability of reactively sputtered multicomponent Hf-Ta-Ti-V-Zr nitrides Alexander Kirnbauer1, Andreas Kretschmer1, Christian M. Koller1, Tomasz Wojcik1, Marcus Hans2, Jochen M. Schneider2, Peter Polcik5, Paul H. Mayrhofer1 1TU Wien, Wien, Austria, 2RWTH Aachen, Aachen, Germany Abstract |
13:00 - 13:20 ORE201 |
Enhancing the corrosion protection capability TiN and CrN PVD coated mild steels by addition of Mg-Rare Earth Holger Hoche1, Thomas Ulrich1, Casper Pusch1, Matthias Oechsner1 1MPA-IfW, TU-Darmstadt, Darmstadt, Germany Abstract |
13:20 - 13:40 ORE202 |
Improving phase stability, hardness and oxidation resistance of reactive magnetron sputtered (Al,Cr,Nb,Ta,Ti)N thin films by Si-alloying Andreas Kretschmer1, Kumar Yalamanchili2, Helmut Rudigier2, Paul Heinz Mayrhofer1 1TU Wien, Materials Science Division, Vienna, Austria, 2Oerlikon Surface Solutions AG, Balzers, Liechtenstein Abstract |
13:40 - 14:00 ORE203 |
Magnetron sputtering of Sn acetylacetonate coatings for sensor applications Jiří Bulíř1, Lenka Volfová1, Michal Novotny1, Jan Lancok1, Premysl Fitl2, Martin Vrnata2, Michal Bodnár3, Vlastik Moravec3 1Institute of Physics, CAS, Prague, Czech Republic, 2University of Chemistry and Technology, Prague, Czech Republic, 3Tesla, Blatna, Czech Republic Abstract |
14:00 - 14:20 ORE204 |
Monitoring structure and physical features of NiTiO3 thin films grown by RF-magnetron sputtering Meriem Chettab1, Quentin Simon1, Patrick Laffez1, Mustapha Zaghrioui1, Richard Retoux2, Micka Bah1 1GREMAN - University of Tours, Blois, France, 2CRISMAT - Normandy University, Cean, France Abstract |
14:30 - 15:00 | Coffee Break Exhibition | Foyer Halle 1 |
Session E3 | Plasma diffusion |
15:00 - 15:30 KNE301 |
Are plasma nitriding treatments effective in changing wettability and evaporation of sessile water droplets on austenitic stainless steel surfaces? Thierry Czerwiec1, svetlana Tsareva1, Aurore Andrieux1, Grégory Marcos1, Laourine Feriel1, Grégory Marcos1 1IJL, nancy, France Abstract |
15:30 - 15:50 ORE301 |
Plasma surface interaction and modification on the nanoscale -
Towards in situ TEM studies Niklas Kohlmann1, Luka Hansen2, Urlich Schürmann1, Holger Kersten2, Lorenz Kienle1 1Inst. Materials Science, Kiel University, Kiel, Germany, 2IEAP, Kiel University, Kiel, Germany Abstract |
15:50 - 16:10 ORE302 |
Newest developments in Plasma Diffusion Treatment Peter Kaestner1, Guenter Braeuer1 1IOT, TU Braunschweig, Braunschweig, Germany Abstract |
16:10 - 16:30 ORE303 |
In-situ XRD for details on expanded austenite formation Stephan Mändl1, Patrick Schlenz1, Jürgen W. Gerlach1, Darina Manova1 1Leibniz Institute of Surface Engineering, Leipzig, Germany Abstract |
Event F | Panorama Saal
Registration
Wednesday, September 9, 2020 | 08:30 - 09:00
09:00 - 09:45 PL0003 |
Plenary Lecture | Halle 1 High-Temperature and Aerospace Coatings Christoph Leyens1, Stefan Heinze2, Andreas Leson1, Max Thorhauer2, Filofteia-Laura Toma2, Christoph Leyens2 1Fraunhofer IWS, Dresden, Germany, 2Inst. of Materials Science, TU Dresden, Dresden, Germany Abstract |
10:00 - 10:30 | Coffee Break Exhibition | Foyer Halle 1 |
Session F1 | Plasma and ion source technologies |
|
10:30 - 11:00 KNF101 |
Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge. Rainer Hippler1, Martin Cada1, Zdenek Hubicka1 1Institute of Physics CAS, Prague 8, Czech Republic Abstract |
11:00 - 11:20 ORF101 |
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputtering Martin Rudolph1, Nils Brenning2, Michael A. Raadu2, Hamid Hajihoseini3, Jón Tómas Guðmundsson3, André Anders4, Daniel Lundin5 1Leibniz Institute of Surface Engineering, Leipzig, Germany, 2KTH Royal Institute of Technology, Stockholm, Sweden, 3Science Institute, University of Iceland, Reykjavik, Iceland,4Institute of Surface Engineering (IOM), Leipzig, Germany, 5Linköping University, Linköping, Sweden Abstract |
11:20 - 11:40 ORF102 |
Effect of pulsed arc discharge energy on properties of doped ta-C films Ivailo Dolchinkov1, Gerrit Jan van der Kolk2 1IHI Ionbond AG, Olten, Switzerland, 2Ionbond Netherlands b.v., Venlo, Netherlands Abstract |
11:40 - 12:00 ORF103 |
Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment João Oliveira1, Filipe Fernandes1, Sebastian Calderon2, Paulo Ferreira3, Albano Cavaleiro1 1SEG-CEMMPRE, University of Coimbra, Coimbra, Portugal, 2INL - International Iberian Nanotechnolo, Braga, Portugal, 3University of Texas, Austin, United States Abstract |
12:00 - 12:30 ORF104 |
HiPIMS with positive pulses as a new tool to tailor film properties Ivan Fernandez1, Ambiorn Wennberg2, Jose Antonio Santiago Varela3 1NANO4ENERGY SL, MADRID, Spain, 2Nano4Energy SL, MADRID, Spain, 3Nano4energy SL, MADRID, Spain Abstract |
12:30 - 13:30 | Lunch Break Exhibition | Foyer Halle 1 |
Session F2 | Plasma and particles |
13:30 - 14:00 KNF201 |
Plasma and Laser enabled metallurgy of Nanoparticles: Reshape the microstructure to reshape Plasmons Alexandre Nomine1, Natalie Tarasenka2, Valentin Milichko3, Alena Nevar2, Stephanie Bruyere1, Jaafar Ghanbaja1, Nikita Kulachenkov3, Nikolai Tarasenko2, Thierry Belmonte1 1Institut Jean Lamour, Nancy, France, 2National Academy of Sciences of Belarus, Minsk, Belarus, 3ITMO University, St Petersburg, Russia Abstract |
14:00 - 14:20 ORF201 |
A microwave plasma torch for CO2 conversion Katharina Wiegers1, Irina Kistner1, Andreas Schulz1, Matthias Walker1, Günter Tovar1 1IGVP, University of Stuttgart, Stuttgart, Germany Abstract |
14:20 - 14:40 ORF202 |
Development of an AP-DBD plasma assisted CVD process with submillimetre resolution: Experimental and Simulation approach Kishor Acharya1, Simon Bulou2, Thomas Gaulain2, Joris Kadok2, Mathieu Gérard2, Patrick Choquet2 1Luxembourg Institute of Science and Tech, Belvaux, Luxembourg, 2LIST, Belvaux, Luxembourg Abstract |
14:40 - 15:00 ORF203 |
A scalable linear PECVD microwave source for transparent films Tobias Radny1, Klaus-Dieter Nauenburg1, Rolf Schäfer1 1robeko GmbH & Co. KG, Mehlingen, Germany Abstract |
15:00 - 15:20 ORF204 |
Power-to-X Applications Performed by Atmospheric Microwave Plasma Torches Joachim Schneider1, Jens Hofmann1, Moritz Gorath1, Klaus Baumgärtner1, Irina Kistner2, Andreas Schulz2, Matthias Walker2, Günter Tovar2 1Muegge GmbH, Reichelsheim, Germany, 2University of Stuttgart, IGVP, Stuttgart, Germany Abstract |
15:30 - 16:00 | Coffee Break Exhibition | Foyer Halle 1 |
16:00 - 17:00 | Poster Session Entrance East |