Program
Wednesday, September 12, morning Room Richard-Strauss
08:30 - 09:15 Plenary Lecture PL0004 |
Chair: James Bradley, Liverpool, United Kingdom Transport of neutral and charged species in conventional magnetrons, RF-IPVD and HiPIMS Tiberiu Minea1 1LPGP : CNRS-Unersity Paris-Sud, Orsay, France Abstract | Extended Abstract |
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Oral Session | Session 12 - HiPIMS I
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09:25 - 09:55 Keynote Lecture KN1200 |
First commercial HiPIMS-coatings for cutting tool applications Stephan Bolz1, Christoph Schiffers1, Oliver Lemmer1, Werner Kölker1, Grzegorz Greczynski2, Lars Hultman2 1CemeCon AG, Würselen, Germany, 2Department of Physics, IFM, Linköping University, Linköping, Sweden Abstract | Extended Abstract |
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09:55 - 10:15 OR1201 |
HIPIMS Arc Free Reactive Discharge for Deposition of Non-conductive Films on ENDURA 200 mm Cluster Tools. Roman Chistyakov1, Bassam Abrahan2 1Zond Inc, Mansfield, United States, 2Zpulser LLC, Mansfield, United States Abstract | Extended Abstract |
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10:15 - 10:35 OR1202 |
Stress in HIPIMS deposited TiN thin films Guido Janssen1, Daniel Magnfält2, Gregory Abadias3, Kostas Sarakinos2 1TU Delft, Delft, Netherlands, 2Linköping University, Linköping, Sweden, 3Université de Poitiers, F86962 Chasseneuil Futuroscope cedex, France Abstract | Extended Abstract |
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10:35 - 10:55 OR1203 |
High-rate reactive high power impulse magnetron sputtering of multifunctional Ta-O-N films Jaroslav Vlcek1, Jiri Rezek2, Jiri Houska1, Radomir Cerstvy1 1University of West Bohemia, Plzen, Czech Republic, 2NTIS, University of West Bohemia, Plzen, Czech Republic Abstract | Extended Abstract |
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10:55 - 11:15 | Coffee break |
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11:15 - 11:35 OR1204 |
High Power Impulse Magnetron Sputtering of ZrH2 and Zr Films Hans Högberg1, Lina Tengdelius1, Jun Lu1, Jens Jensen1, Fredrik Eriksson1, Lars Hultman1 1Linköping University, Linköping, Sweden Abstract | Extended Abstract |
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11:35 - 11:55 OR1205 |
High Power Density Pulse Magnetron Sputtering - Process and Film Properties Peter Frach1, Christian Gottfried1, Fred Fietzke1, Heidrun Klostermann1, Hagen Bartzsch1, Daniel Glöß1 1Fraunhofer FEP, Dresden, Germany Abstract | Extended Abstract |
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11:55 - 12:15 OR1206 |
Properties of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering
Jon Tomas Gudmundsson1, Fridrik Magnus2, Arni S. Ingason2, Hamid R. Jafari3, M. R. Naimi-Jamal4, Olafur B. Sveinsson5, Sveinn Olafsson2 1Shanghai Jiao Tong University, Shanghai, China, 2Science Institute, University of Iceland, Reykjavik, Iceland, 3University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai, China, 4Iran University of Science and Technology, Teheran, Iran,5Science Institute, University of Ieland, Reykjavik, Iceland Abstract | Extended Abstract |
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12:15 - 12:35 OR1207 |
Controlled copper release from Ti-Cu films: effect of reduced pressure during HiPIMS deposition Vitezslav Stranak1, Harm Wulff1, Carmen Zietz2, Steffen Drache1, Martin Cada3, Zdenek Hubicka3, Rainer Bader2, Rainer Hippler1 1University of Greifswald, Greifswald, Germany, 2University of Rostock, Rostock, Germany, 3Academy of Sciences of the Czech Republic, Prague, Czech Republic Abstract | Extended Abstract |
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12:35 - 12:55 OR1208 |
Hysteresis-free HiPIMS deposition of high-index optical coatings Matej Hala1, Jiri Capek1, Oleg Zabeida1, Jolanta E. Sapieha1, Ludvik Martinu1 1Ecole Polytechnique Montreal, Montreal (QC), Canada Abstract | Extended Abstract |
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12:55 - 13:15 OR1209 |
TiC nanocomposite differences between HiPIMS and DCMS Alessandro Patelli1, Marino Colasuonno1, Diego Giordani1, Alessandro Surpi1, Marco Bazzan2, Giovanni Mattei2, Valentino Rigato3 1Veneto Nanotech, Marghera Venezia, Italy, 2Università di Padova, Padova, Italy, 3LNL - INFN, Legnaro (Padova), Italy Abstract | Extended Abstract |
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13:15 - 14:20 | Lunch break |
Wednesday, September 12, morning Room Zugspitze
08:30 - 09:15 | Plenary Lecture PL0004, Room Richard-Strauss |
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Oral Session | Session 13 - Conductive and Catalytic Oxides
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09:25 - 09:55 Keynote Lecture KN1300 |
Recent developments in the field of transparent conductive oxide films for
oxide electronics and photovoltaics Bernd Szyszka1, Wilma Dewald1, Sanjeev Kumar Gurram1, Andreas Pflug1, Christina Schulz1, Volker Sittinger1, Stephan Ulrich1, Wolfgang Werner1 1Fraunhofer IST, Braunschweig, Germany Abstract | Extended Abstract |
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09:55 - 10:15 OR1301 |
Process control, performance limits and dopant activation of Al-doped ZnO grown by reactive pulsed magnetron sputtering Steffen Cornelius1, Mykola Vinnichenko1, Frans Munnik1, Rene Heller1, Andreas Kolitsch1, Wolfhard Möller1 1Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany Abstract | Extended Abstract |
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10:15 - 10:35 OR1302 |
Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate Naho Itagaki1, Iping Suhariadi1, Kazunari Kuwahara1, Koichi Oshikawa1, Daisuke Yamashita1, Hyunwoong Seo1, Kunihiro Kamataki1, Giichiro Uchida1, Kazunori Koga1, Masaharu Shiratani1 1Kyushu University, Fukuoka, Japan Abstract | Extended Abstract |
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10:35 - 10:55 OR1303 |
Electrical properties of ZnO:Sc films deposited by RF magnetron sputtering Petr Novák1, Marie Netrvalová1, Lucie Prušáková1, Jan Říha1, Pavol Šutta1 1University of West Bohemia, Plzeň, Czech Republic Abstract | Extended Abstract |
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10:55 - 11:15 | Coffee break |
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11:15 - 11:35 OR1304 |
Enhanced properties of photocatalytic thin films via doping during magnetron sputter deposition Peter Kelly1, Marina Ratova1, Glen West1, Ivanka Iordanova2 1Manchester Metropolitan University, Manchester, United Kingdom, 2University of Sofia, Sofia, Bulgaria Abstract | Extended Abstract |
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11:35 - 11:55 OR1305 |
Electronic structure of N-doped TiO2 films grown by
reactive pulsed magnetron sputtering RAUL GAGO-FERNANDEZ1, Andrés Redondo-Cubero2, Javier Palomares1, Mykola Vinnichenko3, Jens Lehmann3, Frans Munnik3 1ICMM-CSIC, Madrid, Spain, 2ITN, Sacavém, Portugal, 3HZDR, Dresden, Germany Abstract | Extended Abstract |
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11:55 - 12:15 OR1306 |
Optical and Electronical Properties of TiOx:Nb, Ta, Zr -Films, Deposited by Reactive Magnetron Sputtering from Metallic Targets Rainald Mientus1, Klaus Ellmer2, Stefan Seeger1, Michael Weise1, Johanna Reck1, Elisabeth Reck1 1OUT e.V., Berlin, Germany, 2Helmholtz-Zentrum Berlin, Berlin, Germany Abstract | Extended Abstract |
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12:15 - 12:35 OR1307 |
Evaluation of the best strategy to obtain N-doped TiO2 thin films by reactive rf magnetron sputtering for visible light photocatalysis Jerome PULPYTEL1, Wilson Smith2, Houssam Fakhouri2, Farzaneh Arefi-Khonsari2 1UPMC-ENSCP, Paris, France, 2UPMC - ENSCP, Paris, France Abstract | Extended Abstract |
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12:35 - 12:55 OR1308 |
The Effect of Nitrogen Partial Pressure and Substrate Temperature on the Characteristics of Photocatalytic N:TiO2 Thin Films deposited by Filtered Vacuum Arc Deposition Eda Goldenberg1, Ines Chayun-Zucker1, Rudi Avni1, Raymond L. Boxman1 1Tel Aviv University, Tel Aviv, Israel Abstract | Extended Abstract |
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12:55 - 13:15 OR1309 |
Electrochemical and structural characterization of BITAVOX.20 thin films. Eloi Dereeper1, Pascal Briois1, Rose-Noëlle Vannier2, Alain Billard1 1LERMPS-UTBM, Belfort, France, 2LCPS, UMR CNRS 8012, ENSCL, Villeneuve d'Ascq Cedex, France Abstract | Extended Abstract |
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13:15 - 14:20 | Lunch break |
Wednesday, September 12, morning Room Olympia
08:30 - 09:15 | Plenary Lecture PL0004, Room Richard-Strauss |
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Oral Session | Session 14 - Plasma Diffusion Treatment
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09:25 - 09:55 Keynote Lecture KN1400 |
Nitrogen interstitial solution in austenitic stainless steel by plasma surface modification: enhanced wear and corrosion resistance mechanism M.K. Lei1 1Dalian University of Technology, Dalian, China Abstract | Extended Abstract |
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09:55 - 10:15 OR1401 |
In situ Observation of Layer Growth During Low Energy Nitriding of Austenitic Stainless Steel Darina Manova1, A. Bergmann1, S. Mändl1, H. Neumann1, B. Rauschenbach1 1Institute for Surface Modification, Leipzig, Germany Abstract | Extended Abstract |
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10:15 - 10:35 OR1402 |
Atom probe tomography characterization of the decomposition in austenitic stainless steels 304L and 316L induced by low temperature plasma nitriding Andrius Martinavičius1, Raphaële Danoix1, Frédéric Danoix1, Gintautas Abrasonis2, Michel Drouet3, Claude Templier3, Béatrice Hannoyer1 1Université de Rouen, ST Etienne du Rouvray, France, 2Helmholtz-Zentrum Dresden - Rossendorf, Dresden, Germany, 3Institut PPRIME, UPR 3346, CNRS, Université de Poitiers, Futuroscope-Chasseneuil, France Abstract | Extended Abstract |
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10:35 - 10:55 OR1403 |
Corrosion behavior of plasma nitrocarburized and post-oxidized AISI 4140 steel in fuel-grade bioethanol Carlos Figueroa1, Rosiana Boniatti1, Aline Bandeira1, Ângela Crespi1, Eliena Birriel1, Israel Baumvol2 1UCS, Caxias do Sul, Brazil,2UCS and UFRGS, Caxias do Sul, Brazil Abstract | Extended Abstract |
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10:55 - 11:15 | Coffee break |
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11:15 - 11:35 OR1404 |
DLC coating on low temperature plasma nitrided or carburized austenitic stainless steel Masato Tsujikawa1, Motoo Egawa2, Nobuhiro Ueda2, Takumi Sone3, Kazuo Murata3, Kenji Higashi1 1Osaka Prefecture University, Sakai-shi, Japan, 2Technology Research Institute of Osaka Prefecture, Izumi-shi, Japan, 3Industry Technology Support Institute of, Higashiosaka-shi, Japan Abstract | Extended Abstract |
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11:35 - 11:55 OR1405 |
Effect of Xe+ ion bombardment induced patterns in stainless steel on plasma nitriding processes Silvia Azevedo dos Santos Cucatti1, E.A. Ochoa2, M. Morales1, R. Droppa Jr.3, J. Garcia4, H.C. Pinto5, D. Wisnivesky6, F. Alvarez1 1Instituto de Física, UNICAMP, Campinas, Brazil, 2Departamento de Física, PUCRJ, Rio de Janeiro, Brazil, 3Universidade Federal do ABC, UFABC, Santo André, SP, Brazil, 4Sandvik Machining Solutions, Stockholm, Sweden,5Escola de Engenharia de São Carlos, EESC., USP, São Carlos, SP, Brazil, 6Plasma-LIITS, Equipamentos e Processos, Campinas, SP, Brazil Abstract | Extended Abstract |
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11:55 - 12:15 OR1406 |
Interaction between carbon and nitrogen during plasma assisted nitrocarburizing and sequential nitriding and carburizing treatments of austenitic stainless steel Thierry Czerwiec1, Yuanyuan Guo1, Grégory Marcos1, Thierry Belmonte1 1IJL, Nancy, France Abstract | Extended Abstract |
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12:15 - 12:35 OR1407 |
Investigations on the active screen plasma nitriding process Kristian Börner1, Igor Burlacov1, Heinz-Joachim Spies1, Horst Biermann1, Stephan Hamann2, Jürgen Röpcke2 1Institute of Materials Engineering, Freiberg, Germany, 2INP Greifswald, Greifswald, Germany Abstract | Extended Abstract |
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12:35 - 12:55 OR1408 |
Understanding Analytically: Role of Hydrogen in Plasma Nitriding Suraj K Sinha1, Subroto Mukherjee2 1Department of Physics, Puducherry, India, 2Institute for Plasma Research, Gandhinagar, India Abstract | Extended Abstract |
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12:55 - 13:15 OR1409 |
Plasma Boriding Peter Kaestner1, Kyong-Tschong Rie1, Guenter Braeuer1 1Inst. f. Surface Technology, Braunschweig, Germany Abstract | Extended Abstract |
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13:15 - 14:20 | Lunch break |
Wednesday, September 12, afternoon Room Richard-Strauss
14:20 - 15:05 Plenary Lecture PL0005 |
Chair: Thierry Czerwiec, Nancy Cedex, France Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices Masaharu Shiratani1 1Kyushu University, Fukuoka, Japan Abstract | Extended Abstract |
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15:15 - 16:25 | Poster Session 3, Foyer | ||||
16:25 - 16:45 | Coffee break |
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Oral Session | Session 15- HiPIMS II
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16:45 - 17:15 Keynote Lecture KN1500 |
Progress in HiPIMS modeling Daniel Lundin1, Nils Brenning1, Chunqing Huo1, Gabi Stancu2, Catalin Vitelaru2, Tiberiu Minea2 1Royal Institute of Technology, Stockholm, Sweden, 2Université Paris Sud-XI, Orsay Cedex, France Abstract | Extended Abstract |
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17:15 - 17:35 OR1501 |
Modelling of an RF-IPVD magnetron discharge for deposition of Cu thin films. Jean Bretagne1, Ismael GUESMI2 1LPGP UMR 8578 CNRS-Université Paris-Sud, ORSAY Cedex, France, 2LPGP, UMR CNRS-Université Paris-Sud, ORSAY Cedex., France Abstract | Extended Abstract |
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17:35 - 17:55 OR1502 |
Towards deeper understanding of a HiPIMS discharge by time-resolved optical plasma diagnostics Nikolay Britun1, Maria Palmucci1, Stephanos Konstantinidis1, Rony Snyders1 1Chimie des Interactions Plasma Surface, Mons, Belgium Abstract | Extended Abstract |
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17:55 - 18:15 OR1503 |
Study of the ionisation in a nickel plasma by Inductively Coupled Impulse Sputtering (ICIS) Daniel Loch1, Arutiun Ehiasarian1 1Sheffield Hallam University, Sheffield, United Kingdom Abstract | Extended Abstract |
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18:30 - 23:00 | Bavarian Evening, "Bayernhalle" |
Wednesday, September 12, afternoon Room Zugspitze
14:20 - 15:05 | Plenary Lecture PL0005, Room Richard-Strauss | ||||
15:15 - 16:25 | Poster Session 3, Foyer | ||||
16:25 - 16:45 | Coffee break |
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Oral Session | Session 16 - Particles in Plasma
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16:45 - 17:15 Keynote Lecture KN1600 |
Nanoparticle Synthesis in a Plasma Downstream Reactor – From Plasma Parameters to Nanoparticle Properties Christian Roth1, Gina Oberbossel1, Philipp Rudolf von Rohr1 1ETH Zürich, Zürich, Switzerland Abstract | Extended Abstract |
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17:15 - 17:35 OR1601 |
Silicon dioxide coating of titanium dioxide nano particles from dielectric barrier discharge in a gaseous mixture of silan and nitrogen Sebastian Dahle1, Lienhard Wegewitz2, Alfred P. Weber3, Wolfgang Maus-Friedrichs4 1IEPT - TU Clausthal, Clausthal-Zellerfeld, Germany, 2Clausthaler Zentrum für Materialtechnik, Technische Universität Clausthal, Clausthal-Zellerfeld, Germany, 3Institut für Mechanische Verfahrenstechnik, Technische Universität Clausthal, Clausthal-Zellerfeld, Germany, 4Institut für Physik und physikalische Technologien, Technische Universität Clausthal, Clausthal-Zellerfeld, Germany Abstract | Extended Abstract |
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17:35 - 17:55 OR1602 |
High Power Pulsed Hollow Cathode for Nanoparticle Synthesis Daniel Söderström1, Iris Pilch2, Nils Brenning3, Ulf Helmersson2 1Linköping University, Linköping, Sweden, 2Linköping University, Plasma & Coatings Physics, Linköping, Sweden, 3Royal Institute of Technology, School of Electrical Engineering, Division of Space & Plasma Physics, Stockholm, Sweden Abstract | Extended Abstract |
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17:55 - 18:15 OR1603 |
A versatile magnetized pulsed cascaded arc source for deposition of nano-structured oxides at high rates Gregory De Temmerman1, Jakub Zielinski2, Thomas Morgan2, Richard van de Sanden2 1FOM-DIFFER, Nieuwegein, Netherlands, 2FOM Institute DIFFER, Nieuwegein, Netherlands Abstract | Extended Abstract |
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18:30 - 23:00 | Bavarian Evening, "Bayernhalle" |
Wednesday, September 12, afternoon Room Olympia
14:20 - 15:05 | Plenary Lecture PL0005, Room Richard-Strauss | ||||
15:15 - 16:25 | Poster Session 3, Foyer | ||||
16:25 - 16:45 | Coffee break |
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Oral Session | Session 17 - Bioactive Films and Surfaces I
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16:45 - 17:15 Keynote Lecture KN1700 |
Multifunctional coatings for biomedical applications: challenges and problems Sandra Carvalho1 1Universidade do Minho, Guimaraes, Portugal Abstract | Extended Abstract |
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17:15 - 17:35 OR1701 |
Performance of atmospheric plasma sprayed HA coatings under dry and wet fatigue conditions James Nicholas Barry1, Alun J. Carr1, Denis P. Dowling1 1University College Dublin, Dublin, Ireland Abstract | Extended Abstract |
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17:35 - 17:55 OR1702 |
Surface chemistry vs surface topography. What is important for metallic and polymer implants? Dmitry Shtansky1, Evgeny Levashov2, Igor Smurov3, Igor Yadroitsev3, Nikolay Ryashin3, Irina Batenina2, Natalia Gloushankova4, Alexei Grigoryan5, Alexander Kyudryashov2, Alexander Sheveiko2 1National Univ. Science + Technol. MISIS, Moscow, Russia, 2National Univ. Science & Technol. MISIS, Moscow, Russian Federation, 3ENISE, St Etienne, France, 4Cancer Research Center of RAS, Moscow, Russian Federation, 5Central Res. Inst. of Stomatology & Maxillo-Facial Surgery, Moscow, Russian Federation Abstract | Extended Abstract |
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17:55 - 18:15 OR1703 |
Comparison of microbiological effects in long fine-lumen tubes by low and atmospheric pressure plasmas Uta Schnabel1, Manfred Stieber1, Jörg Ehlbeck1 1INP Greifswald e.V., Greifswald, Germany Abstract | Extended Abstract |
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18:30 - 23:00 | Bavarian Evening, "Bayernhalle" |