Program

Wednesday, September 12, morning Room Richard-Strauss

08:30 - 09:15
Plenary Lecture
PL0004

Chair: James Bradley, Liverpool, United Kingdom
Transport of neutral and charged species in conventional magnetrons, RF-IPVD and HiPIMS
Tiberiu Minea¹
¹LPGP : CNRS-Unersity Paris-Sud, Orsay, France
Abstract | Extended Abstract

Oral Session

Session 12 - HiPIMS I

Chairs:	Gerhard Eichenhofer, Villaz-St. Pierre, Switzerland
	Pierre-Yves Jouan, NANTES, France

09:25 - 09:55
Keynote Lecture
KN1200

First commercial HiPIMS-coatings for cutting tool applications
Stephan Bolz¹, Christoph Schiffers¹, Oliver Lemmer¹, Werner Kölker¹, Grzegorz Greczynski², Lars Hultman²
¹CemeCon AG, Würselen, Germany, ²Department of Physics, IFM, Linköping University, Linköping, Sweden
Abstract | Extended Abstract

09:55 - 10:15
OR1201

HIPIMS Arc Free Reactive Discharge for Deposition of Non-conductive Films on ENDURA 200 mm Cluster Tools.
Roman Chistyakov¹, Bassam Abrahan²
¹Zond Inc, Mansfield, United States, ²Zpulser LLC, Mansfield, United States
Abstract | Extended Abstract

10:15 - 10:35
OR1202

Stress in HIPIMS deposited TiN thin films
Guido Janssen¹, Daniel Magnfält², Gregory Abadias³, Kostas Sarakinos²
¹TU Delft, Delft, Netherlands, ²Linköping University, Linköping, Sweden, ³Université de Poitiers, F86962 Chasseneuil Futuroscope cedex, France
Abstract | Extended Abstract

10:35 - 10:55
OR1203

High-rate reactive high power impulse magnetron sputtering of multifunctional Ta-O-N films
Jaroslav Vlcek¹, Jiri Rezek², Jiri Houska¹, Radomir Cerstvy¹
¹University of West Bohemia, Plzen, Czech Republic, ²NTIS, University of West Bohemia, Plzen, Czech Republic
Abstract | Extended Abstract

10:55 - 11:15

Coffee break

11:15 - 11:35
OR1204

High Power Impulse Magnetron Sputtering of ZrH2 and Zr Films
Hans Högberg¹, Lina Tengdelius¹, Jun Lu¹, Jens Jensen¹, Fredrik Eriksson¹, Lars Hultman¹
¹Linköping University, Linköping, Sweden
Abstract | Extended Abstract

11:35 - 11:55
OR1205

High Power Density Pulse Magnetron Sputtering - Process and Film Properties
Peter Frach¹, Christian Gottfried¹, Fred Fietzke¹, Heidrun Klostermann¹, Hagen Bartzsch¹, Daniel Glöß¹
¹Fraunhofer FEP, Dresden, Germany
Abstract | Extended Abstract

11:55 - 12:15
OR1206

Properties of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering
Jon Tomas Gudmundsson¹, Fridrik Magnus², Arni S. Ingason², Hamid R. Jafari³, M. R. Naimi-Jamal⁴, Olafur B. Sveinsson⁵, Sveinn Olafsson²
¹Shanghai Jiao Tong University, Shanghai, China, ²Science Institute, University of Iceland, Reykjavik, Iceland, ³University of Michigan-Shanghai Jiao Tong University Joint Institute, Shanghai, China, ⁴Iran University of Science and Technology, Teheran, Iran,⁵Science Institute, University of Ieland, Reykjavik, Iceland
Abstract | Extended Abstract

12:15 - 12:35
OR1207

Controlled copper release from Ti-Cu films: effect of reduced pressure during HiPIMS deposition
Vitezslav Stranak¹, Harm Wulff¹, Carmen Zietz², Steffen Drache¹, Martin Cada³, Zdenek Hubicka³, Rainer Bader², Rainer Hippler¹
¹University of Greifswald, Greifswald, Germany, ²University of Rostock, Rostock, Germany, ³Academy of Sciences of the Czech Republic, Prague, Czech Republic
Abstract | Extended Abstract

12:35 - 12:55
OR1208

Hysteresis-free HiPIMS deposition of high-index optical coatings
Matej Hala¹, Jiri Capek¹, Oleg Zabeida¹, Jolanta E. Sapieha¹, Ludvik Martinu¹
¹Ecole Polytechnique Montreal, Montreal (QC), Canada
Abstract | Extended Abstract

12:55 - 13:15
OR1209

TiC nanocomposite differences between HiPIMS and DCMS
Alessandro Patelli¹, Marino Colasuonno¹, Diego Giordani¹, Alessandro Surpi¹, Marco Bazzan², Giovanni Mattei², Valentino Rigato³
¹Veneto Nanotech, Marghera Venezia, Italy, ²Università di Padova, Padova, Italy, ³LNL - INFN, Legnaro (Padova), Italy
Abstract | Extended Abstract

13:15 - 14:20

Lunch break

Wednesday, September 12, morning Room Zugspitze

08:30 - 09:15

Plenary Lecture PL0004, Room Richard-Strauss

Oral Session

Session 13 - Conductive and Catalytic Oxides

Chairs:	Aryasomayajulu Subrahmanyam, Chennai, India
	Stephanos Konstantinidis, Mons, Belgium

09:25 - 09:55
Keynote Lecture
KN1300

Recent developments in the field of transparent conductive oxide films for oxide electronics and photovoltaics
Bernd Szyszka¹, Wilma Dewald¹, Sanjeev Kumar Gurram¹, Andreas Pflug¹, Christina Schulz¹, Volker Sittinger¹, Stephan Ulrich¹, Wolfgang Werner¹
¹Fraunhofer IST, Braunschweig, Germany
Abstract | Extended Abstract

09:55 - 10:15
OR1301

Process control, performance limits and dopant activation of Al-doped ZnO grown by reactive pulsed magnetron sputtering
Steffen Cornelius¹, Mykola Vinnichenko¹, Frans Munnik¹, Rene Heller¹, Andreas Kolitsch¹, Wolfhard Möller¹
¹Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany
Abstract | Extended Abstract

10:15 - 10:35
OR1302

Crystallinity control of sputtered ZnO films by utilizing buffer layers fabricated via nitrogen mediated crystallization: Effects of nitrogen flow rate
Naho Itagaki¹, Iping Suhariadi¹, Kazunari Kuwahara¹, Koichi Oshikawa¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kunihiro Kamataki¹, Giichiro Uchida¹, Kazunori Koga¹, Masaharu Shiratani¹
¹Kyushu University, Fukuoka, Japan
Abstract | Extended Abstract

10:35 - 10:55
OR1303

Electrical properties of ZnO:Sc films deposited by RF magnetron sputtering
Petr Novák¹, Marie Netrvalová¹, Lucie Prušáková¹, Jan Říha¹, Pavol Šutta¹
¹University of West Bohemia, Plzeň, Czech Republic
Abstract | Extended Abstract

10:55 - 11:15

Coffee break

11:15 - 11:35
OR1304

Enhanced properties of photocatalytic thin films via doping during magnetron sputter deposition
Peter Kelly¹, Marina Ratova¹, Glen West¹, Ivanka Iordanova²
¹Manchester Metropolitan University, Manchester, United Kingdom, ²University of Sofia, Sofia, Bulgaria
Abstract | Extended Abstract

11:35 - 11:55
OR1305

Electronic structure of N-doped TiO2 films grown by reactive pulsed magnetron sputtering
RAUL GAGO-FERNANDEZ¹, Andrés Redondo-Cubero², Javier Palomares¹, Mykola Vinnichenko³, Jens Lehmann³, Frans Munnik³
¹ICMM-CSIC, Madrid, Spain, ²ITN, Sacavém, Portugal, ³HZDR, Dresden, Germany
Abstract | Extended Abstract

11:55 - 12:15
OR1306

Optical and Electronical Properties of TiOx:Nb, Ta, Zr -Films, Deposited by Reactive Magnetron Sputtering from Metallic Targets
Rainald Mientus¹, Klaus Ellmer², Stefan Seeger¹, Michael Weise¹, Johanna Reck¹, Elisabeth Reck¹
¹OUT e.V., Berlin, Germany, ²Helmholtz-Zentrum Berlin, Berlin, Germany
Abstract | Extended Abstract

12:15 - 12:35
OR1307

Evaluation of the best strategy to obtain N-doped TiO2 thin films by reactive rf magnetron sputtering for visible light photocatalysis
Jerome PULPYTEL¹, Wilson Smith², Houssam Fakhouri², Farzaneh Arefi-Khonsari²
¹UPMC-ENSCP, Paris, France, ²UPMC - ENSCP, Paris, France
Abstract | Extended Abstract

12:35 - 12:55
OR1308

The Effect of Nitrogen Partial Pressure and Substrate Temperature on the Characteristics of Photocatalytic N:TiO2 Thin Films deposited by Filtered Vacuum Arc Deposition
Eda Goldenberg¹, Ines Chayun-Zucker¹, Rudi Avni¹, Raymond L. Boxman¹
¹Tel Aviv University, Tel Aviv, Israel
Abstract | Extended Abstract

12:55 - 13:15
OR1309

Electrochemical and structural characterization of BITAVOX.20 thin films.
Eloi Dereeper¹, Pascal Briois¹, Rose-Noëlle Vannier², Alain Billard¹
¹LERMPS-UTBM, Belfort, France, ²LCPS, UMR CNRS 8012, ENSCL, Villeneuve d'Ascq Cedex, France
Abstract | Extended Abstract

13:15 - 14:20

Lunch break

Wednesday, September 12, morning Room Olympia

08:30 - 09:15

Plenary Lecture PL0004, Room Richard-Strauss

Oral Session

Session 14 - Plasma Diffusion Treatment

Chairs:	Reinar Grün, Siegen, Germany
	Subroto Mukherjee, Gandhinagar, India

09:25 - 09:55
Keynote Lecture
KN1400

Nitrogen interstitial solution in austenitic stainless steel by plasma surface modification: enhanced wear and corrosion resistance mechanism
M.K. Lei¹
¹Dalian University of Technology, Dalian, China
Abstract | Extended Abstract

09:55 - 10:15
OR1401

In situ Observation of Layer Growth During Low Energy Nitriding of Austenitic Stainless Steel
Darina Manova¹, A. Bergmann¹, S. Mändl¹, H. Neumann¹, B. Rauschenbach¹
¹Institute for Surface Modification, Leipzig, Germany
Abstract | Extended Abstract

10:15 - 10:35
OR1402

Atom probe tomography characterization of the decomposition in austenitic stainless steels 304L and 316L induced by low temperature plasma nitriding
Andrius Martinavičius¹, Raphaële Danoix¹, Frédéric Danoix¹, Gintautas Abrasonis², Michel Drouet³, Claude Templier³, Béatrice Hannoyer¹
¹Université de Rouen, ST Etienne du Rouvray, France, ²Helmholtz-Zentrum Dresden - Rossendorf, Dresden, Germany, ³Institut PPRIME, UPR 3346, CNRS, Université de Poitiers, Futuroscope-Chasseneuil, France
Abstract | Extended Abstract

10:35 - 10:55
OR1403

Corrosion behavior of plasma nitrocarburized and post-oxidized AISI 4140 steel in fuel-grade bioethanol
Carlos Figueroa¹, Rosiana Boniatti¹, Aline Bandeira¹, Ângela Crespi¹, Eliena Birriel¹, Israel Baumvol²
¹UCS, Caxias do Sul, Brazil,²UCS and UFRGS, Caxias do Sul, Brazil
Abstract | Extended Abstract

10:55 - 11:15

Coffee break

11:15 - 11:35
OR1404

DLC coating on low temperature plasma nitrided or carburized austenitic stainless steel
Masato Tsujikawa¹, Motoo Egawa², Nobuhiro Ueda², Takumi Sone³, Kazuo Murata³, Kenji Higashi¹
¹Osaka Prefecture University, Sakai-shi, Japan, ²Technology Research Institute of Osaka Prefecture, Izumi-shi, Japan, ³Industry Technology Support Institute of, Higashiosaka-shi, Japan
Abstract | Extended Abstract

11:35 - 11:55
OR1405

Effect of Xe+ ion bombardment induced patterns in stainless steel on plasma nitriding processes
Silvia Azevedo dos Santos Cucatti¹, E.A. Ochoa², M. Morales¹, R. Droppa Jr.³, J. Garcia⁴, H.C. Pinto⁵, D. Wisnivesky⁶, F. Alvarez¹
¹Instituto de Física, UNICAMP, Campinas, Brazil, ²Departamento de Física, PUCRJ, Rio de Janeiro, Brazil, ³Universidade Federal do ABC, UFABC, Santo André, SP, Brazil, ⁴Sandvik Machining Solutions, Stockholm, Sweden,⁵Escola de Engenharia de São Carlos, EESC., USP, São Carlos, SP, Brazil, ⁶Plasma-LIITS, Equipamentos e Processos, Campinas, SP, Brazil
Abstract | Extended Abstract

11:55 - 12:15
OR1406

Interaction between carbon and nitrogen during plasma assisted nitrocarburizing and sequential nitriding and carburizing treatments of austenitic stainless steel
Thierry Czerwiec¹, Yuanyuan Guo¹, Grégory Marcos¹, Thierry Belmonte¹
¹IJL, Nancy, France
Abstract | Extended Abstract

12:15 - 12:35
OR1407

Investigations on the active screen plasma nitriding process
Kristian Börner¹, Igor Burlacov¹, Heinz-Joachim Spies¹, Horst Biermann¹, Stephan Hamann², Jürgen Röpcke²
¹Institute of Materials Engineering, Freiberg, Germany, ²INP Greifswald, Greifswald, Germany
Abstract | Extended Abstract

12:35 - 12:55
OR1408

Understanding Analytically: Role of Hydrogen in Plasma Nitriding
Suraj K Sinha¹, Subroto Mukherjee²
¹Department of Physics, Puducherry, India, ²Institute for Plasma Research, Gandhinagar, India
Abstract | Extended Abstract

12:55 - 13:15
OR1409

Plasma Boriding
Peter Kaestner¹, Kyong-Tschong Rie¹, Guenter Braeuer¹
¹Inst. f. Surface Technology, Braunschweig, Germany
Abstract | Extended Abstract

13:15 - 14:20

Lunch break

Wednesday, September 12, afternoon Room Richard-Strauss

14:20 - 15:05
Plenary Lecture
PL0005

Chair: Thierry Czerwiec, Nancy Cedex, France
Control of nanoparticle formation in reactive plasmas and its application to fabrication of green energy devices
Masaharu Shiratani¹
¹Kyushu University, Fukuoka, Japan
Abstract | Extended Abstract

15:15 - 16:25

Poster Session 3, Foyer

16:25 - 16:45

Coffee break

Oral Session

Session 15- HiPIMS II

Chairs:	Roman Chistyakov, Mansfield, USA
	Kostas Sarakinos, Linköping, Sweden

16:45 - 17:15
Keynote Lecture
KN1500

Progress in HiPIMS modeling
Daniel Lundin¹, Nils Brenning¹, Chunqing Huo¹, Gabi Stancu², Catalin Vitelaru², Tiberiu Minea²
¹Royal Institute of Technology, Stockholm, Sweden, ²Université Paris Sud-XI, Orsay Cedex, France
Abstract | Extended Abstract

17:15 - 17:35
OR1501

Modelling of an RF-IPVD magnetron discharge for deposition of Cu thin films.
Jean Bretagne¹, Ismael GUESMI²
¹LPGP UMR 8578 CNRS-Université Paris-Sud, ORSAY Cedex, France, ²LPGP, UMR CNRS-Université Paris-Sud, ORSAY Cedex., France
Abstract | Extended Abstract

17:35 - 17:55
OR1502

Towards deeper understanding of a HiPIMS discharge by time-resolved optical plasma diagnostics
Nikolay Britun¹, Maria Palmucci¹, Stephanos Konstantinidis¹, Rony Snyders¹
¹Chimie des Interactions Plasma Surface, Mons, Belgium
Abstract | Extended Abstract

17:55 - 18:15
OR1503

Study of the ionisation in a nickel plasma by Inductively Coupled Impulse Sputtering (ICIS)
Daniel Loch¹, Arutiun Ehiasarian¹
¹Sheffield Hallam University, Sheffield, United Kingdom
Abstract | Extended Abstract

18:30 - 23:00

Bavarian Evening, "Bayernhalle"

Wednesday, September 12, afternoon Room Zugspitze

14:20 - 15:05

Plenary Lecture PL0005, Room Richard-Strauss

15:15 - 16:25

Poster Session 3, Foyer

16:25 - 16:45

Coffee break

Oral Session

Session 16 - Particles in Plasma

Chairs:	Holger Kersten, Kiel, Germany
	Ignacio Jimenez, Madrid, Spain

16:45 - 17:15
Keynote Lecture
KN1600

Nanoparticle Synthesis in a Plasma Downstream Reactor – From Plasma Parameters to Nanoparticle Properties
Christian Roth¹, Gina Oberbossel¹, Philipp Rudolf von Rohr¹
¹ETH Zürich, Zürich, Switzerland
Abstract | Extended Abstract

17:15 - 17:35
OR1601

Silicon dioxide coating of titanium dioxide nano particles from dielectric barrier discharge in a gaseous mixture of silan and nitrogen
Sebastian Dahle¹, Lienhard Wegewitz², Alfred P. Weber³, Wolfgang Maus-Friedrichs⁴
¹IEPT - TU Clausthal, Clausthal-Zellerfeld, Germany, ²Clausthaler Zentrum für Materialtechnik, Technische Universität Clausthal, Clausthal-Zellerfeld, Germany, ³Institut für Mechanische Verfahrenstechnik, Technische Universität Clausthal, Clausthal-Zellerfeld, Germany, ⁴Institut für Physik und physikalische Technologien, Technische Universität Clausthal, Clausthal-Zellerfeld, Germany
Abstract | Extended Abstract

17:35 - 17:55
OR1602

High Power Pulsed Hollow Cathode for Nanoparticle Synthesis
Daniel Söderström¹, Iris Pilch², Nils Brenning³, Ulf Helmersson²
¹Linköping University, Linköping, Sweden, ²Linköping University, Plasma & Coatings Physics, Linköping, Sweden, ³Royal Institute of Technology, School of Electrical Engineering, Division of Space & Plasma Physics, Stockholm, Sweden
Abstract | Extended Abstract

17:55 - 18:15
OR1603

A versatile magnetized pulsed cascaded arc source for deposition of nano-structured oxides at high rates
Gregory De Temmerman¹, Jakub Zielinski², Thomas Morgan², Richard van de Sanden²
¹FOM-DIFFER, Nieuwegein, Netherlands, ²FOM Institute DIFFER, Nieuwegein, Netherlands
Abstract | Extended Abstract

18:30 - 23:00

Bavarian Evening, "Bayernhalle"

Wednesday, September 12, afternoon Room Olympia

14:20 - 15:05

Plenary Lecture PL0005, Room Richard-Strauss

15:15 - 16:25

Poster Session 3, Foyer

16:25 - 16:45

Coffee break

Oral Session

Session 17 - Bioactive Films and Surfaces I

Chairs:	Dmitry V. Shtansky, Moscow, Russia
	Klaus-Dieter Weltmann, Greifswald, Germany

16:45 - 17:15
Keynote Lecture
KN1700

Multifunctional coatings for biomedical applications: challenges and problems
Sandra Carvalho¹
¹Universidade do Minho, Guimaraes, Portugal
Abstract | Extended Abstract

17:15 - 17:35
OR1701

Performance of atmospheric plasma sprayed HA coatings under dry and wet fatigue conditions
James Nicholas Barry¹, Alun J. Carr¹, Denis P. Dowling¹
¹University College Dublin, Dublin, Ireland
Abstract | Extended Abstract

17:35 - 17:55
OR1702

Surface chemistry vs surface topography. What is important for metallic and polymer implants?
Dmitry Shtansky¹, Evgeny Levashov², Igor Smurov³, Igor Yadroitsev³, Nikolay Ryashin³, Irina Batenina², Natalia Gloushankova⁴, Alexei Grigoryan⁵, Alexander Kyudryashov², Alexander Sheveiko²
¹National Univ. Science + Technol. MISIS, Moscow, Russia, ²National Univ. Science & Technol. MISIS, Moscow, Russian Federation, ³ENISE, St Etienne, France, ⁴Cancer Research Center of RAS, Moscow, Russian Federation, ⁵Central Res. Inst. of Stomatology & Maxillo-Facial Surgery, Moscow, Russian Federation
Abstract | Extended Abstract

17:55 - 18:15
OR1703

Comparison of microbiological effects in long fine-lumen tubes by low and atmospheric pressure plasmas
Uta Schnabel¹, Manfred Stieber¹, Jörg Ehlbeck¹
¹INP Greifswald e.V., Greifswald, Germany
Abstract | Extended Abstract

18:30 - 23:00

Bavarian Evening, "Bayernhalle"

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