Tutorials

Tutorial 1
Fundamentals and Trends of Plasma Surface Processing
Sunday, September 16, 2018

Tutorial 2
Plasma assisted atomic level processing – PEALD & ALE
Sunday, September 16, 2018

Tutorial 3
ITO and Alternative TCO: From Fundamentals to Controlling Properties
Thursday, September 20, 2018

Tutorial Registration Fees

Regular      300 €

Students    100 €

This registration is only valid for the particular tutorial ordered.

 

1. Tutorial

Fundamentals and Trends of Plasma Surface Processing

Sunday, September 16, 2018

The tutorial will cover the fundamentals of selected modern plasma processes and their applications in research and industry. Lectures will be given by internationally recognized senior scientists.

The tutorial will be organized by the German PISE Group (PLASMA GERMANY) in cooperation with EFDS, chaired by  Christian Oehr, Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik (IGB), Stuttgart (D).

 

Program [PDF]

 

09:00-10:30

Modelling of technical plasmas
Ralf Peter Brinkmann, Ruhr-Universität Bochum, GER

10:30-10:40

Break

10:40-12:10

The role of ion bombardment for thin film deposition: basics and diagnostics
Holger Kersten, Christian-Albrechts-Universität zu Kiel, GER

12:10-13:00

Lunch

13:00-14:30

HiPIMS - from plasma physics to industrial application
Ulf Helmersson, Linköping University, S

14:30-14:40

Break

14:40-16:10

Surface engineering with atmospheric-pressure plasmas
Michael Thomas, Fraunhofer IST, Braunschweig, GER

16:10-16:30

Coffee Break

16:30-18:00

Plasma treatment of polymers and plasma polymerization
Christian Oehr, Stuttgart, GER

2. Tutorial

Plasma assisted atomic level processing – PEALD & ALE

Sunday, September 16, 2018

The focus will be on atomic level processing technologies, such as Plasma Enhanced Atomic Layer Deposition (PEALD) and Atomic Layer Etching (ALE). The tutorial will provide the basics of the processes, but also  insights into the fundamentals of processes, as well as an overview of the processing equipment and applications of these leading edge technologies.

The tutorial will be organized by Adriana Creatore, TU Eindhoven, the Netherlands, in cooperation with Jonas Sundqvist, Fraunhofer IKTS, Dresden, Germany.





© Jonas Sundqvist

Program [PDF]

9:00 - 9:30

 

Introduction

Adriana Creatore, Eindhoven University of Technology, the Netherlands
Jonas Sundqvist, Fraunhofer Institute for Ceramic Technologies and Systems IKTS, Germany

9:30 - 11:00

 

“Overview of thin film deposition and nanofabrication by atomic layer deposition”

Adrie Mackus, Department of Applied Physics, Eindhoven University of Technology, the Netherlands

11:00 - 11:30

Break

11:30 - 13:00

 

“Plasma atomic layer deposition: basics, mechanisms and applications”

Harm Knoops, Oxford Instruments Plasma Technology, United Kingdom and Department of Applied Physics, Eindhoven University of Technology, the Netherlands

13:00 - 14:00

Lunch

14:00 - 15:30

 

“Principles, basics and practical examples of Plasma Atomic Layer Etching”

Sabbir Khan, Department of Physics, Lund University, Sweden

15:30 - 16:00

Break

16:00 - 17:30

 

“Plasma-ALD and ALE processes in high volume manufacturing and emerging applications”

Jonas Sundqvist, Fraunhofer Institute for Ceramic Technologies and Systems IKTS, Germany

17:30

End of the tutorial

 

3. Tutorial (SVC C-337)

ITO and Alternative TCO: From Fundamentals to Controlling Properties

Thursday, September 20, 2018
09:25 - 18:55, Room Dreitorspitze

Program [PDF]

This tutorial will be organized by the Society of Vacuum Coaters (SVC) in cooperation with EFDS and will be presented by Clark Bright, Bright Thin Film Solutions, LLC (retired 3M), USA.

This tutorial course is intended for scientists, engineers, technicians, and others, interested in understanding the fundamentals, materials, deposition, manufacturing, properties and applications of TCO.

The tutorial explains doping and conductivity in Transparent Conductive Oxides (TCO) including, indium tin oxide (ITO), indium zinc oxide (IZO), and zinc oxide with various dopants, particularly aluminum (AZO) and gallium (GZO). Other alternative TCO, e.g., SnO2:F and IGZO, are included in examples. TCO deposition by magnetron sputtering is emphasized, although other methods, e.g., evaporation, CVD/pyrolysis and Pulsed Laser Deposition (PLD) are briefly described, but can be expanded based upon class interest. Specific examples of the TCO Optical/Electrical (O/E) properties achieved with various processes are shown. Developing a robust deposition process for TCO is explained. The importance of substrate temperature and the effect of post-deposition processing also are discussed. TCO properties achieved with high temperature processes, e.g., on glass substrates, and low temperature processes, e.g., roll-to-roll on flexible plastic substrates, are compared and the large differences explained. Designing and engineering of TCO O/E properties for specific applications by controlling deposition process parameters are explained. Many application examples are presented.

Topical Outline:

  •  Introduction; history and review
    •  Conductivity and transparency in metal oxides
    •  Optical properties related to conductivity
    •  TCO Performance expectations; Theory and ITO baseline
    •  ZnO-based TCO
    •  Performance of TCO grown by major deposition methods
    •  Control of TCO film properties
    •  Developing a robust deposition process; the “Resistivity Well”
    •  Other TCO host materials and dopants
    •  Designing and engineering TCO Optical/Electrical (O/E) properties: Application examples
    •  Appendix I; Thin film optics 
    •  Appendix II; Advanced doping techniques

Instructor: Clark BrightBright Thin Film Solutions, LLC (retired 3M)