1. Tutorial

Fundamentals and Trends of Plasma Surface Processing

Sunday, September 16, 2018

The tutorial will cover the fundamentals of selected modern plasma processes and their applications in research and industry. Lectures will be given by internationally recognized senior scientists.

Tutorial Registration Fees

Regular      300 €

Students    100 €

This registration is only valid for the particular tutorial ordered.

The tutorial will be organized by the German PISE Group (PLASMA GERMANY) in cooperation with EFDS, chaired by  Christian Oehr, Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik (IGB), Stuttgart (D).


2. Tutorial

Plasma assisted atomic level processing – PEALD & ALE

Sunday, September 16, 2018

The focus will be on atomic level processing technologies, such as Plasma Enhanced Atomic Layer Deposition (PEALD) and Atomic Layer Etching (ALE). The tutorial will provide the basics of the processes, but also  insights into the fundamentals of processes, as well as an overview of the processing equipment and applications of these leading edge technologies.

The tutorial will be organized by Adriana Creatore, TU Eindhoven, Belgium, in cooperation with Jonas Sundqvist, Fraunhofer IKTS, Dresden, Germany.


© Jonas Sundqvist


3. Tutorial (SVC C-337)

ITO and Alternative TCO: From Fundamentals to Controlling Properties

Thursday, September 20, 2018

This tutorial course is intended for scientists, engineers, technicians, and others, interested in understanding the fundamentals, materials, deposition, manufacturing, properties and applications of TCO.

This tutorial will be organized by the Society of Vacuum Coaters (SVC) in cooperation with EFDS and will be presented by Clark Bright, Bright Thin Film Solutions, LLC (retired 3M), USA.