Tutorials
1. Tutorial
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Fundamentals and Trends of Plasma Surface Processing Sunday, September 16, 2018 The tutorial will cover the fundamentals of selected modern plasma processes and their applications in research and industry. Lectures will be given by internationally recognized senior scientists. |
Tutorial Registration FeesRegular 300 € Students 100 € This registration is only valid for the particular tutorial ordered. |
The tutorial will be organized by the German PISE Group (PLASMA GERMANY) in cooperation with EFDS, chaired by Christian Oehr, Fraunhofer-Institut für Grenzflächen- und Bioverfahrenstechnik (IGB), Stuttgart (D).
2. Tutorial
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Plasma assisted atomic level processing – PEALD & ALE Sunday, September 16, 2018 The focus will be on atomic level processing technologies, such as Plasma Enhanced Atomic Layer Deposition (PEALD) and Atomic Layer Etching (ALE). The tutorial will provide the basics of the processes, but also insights into the fundamentals of processes, as well as an overview of the processing equipment and applications of these leading edge technologies. The tutorial will be organized by Adriana Creatore, TU Eindhoven, Belgium, in cooperation with Jonas Sundqvist, Fraunhofer IKTS, Dresden, Germany.
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 © Jonas Sundqvist |
3. Tutorial (SVC C-337)
ITO and Alternative TCO: From Fundamentals to Controlling Properties
Thursday, September 20, 2018
This tutorial course is intended for scientists, engineers, technicians, and others, interested in understanding the fundamentals, materials, deposition, manufacturing, properties and applications of TCO.
This tutorial will be organized by the Society of Vacuum Coaters (SVC) in cooperation with EFDS and will be presented by Clark Bright, Bright Thin Film Solutions, LLC (retired 3M), USA.