Tutorial 3 (SVC C-306): Non-Conventional Plasma Sources and Methods in Processing Technology

This tutorial is part of the Society of Vacuum Coaters (SVC) Education Program and will take place in cooperation with EFDS.

The tutorial will be presented by Hana Baránková, Professor, Angstrom Laboratory, Uppsala University and Ladislav Bárdos, Professor, Uppsala University - Sweden.

 

This tutorial will be held on Thursday, September 18, 2014, 09:25 - 13:00 and 15:15 - 18:55, Room Dreitorspitze.

 

Abstract:

This tutorial is a new edition of a well-established annual tutorial started in 1997. It is intended for anyone using or planning to use plasma processing technology, including cold atmospheric plasma sources and applications. Extensive applications of plasma processing are accompanied by an intense development of different new plasma sources and methods (e.g., afterglow and downstream plasmas, pulsed plasmas, inductively coupled plasmas and helicons, dc and rf hollow cathode plasmas, atmospheric plasmas, etc.). The tutorial covers both the explanation of basic physical and technical principles of conventional and non-conventional systems and typical examples of their applications. This is very important not only for adopting new plasma technologies and easier orientation in a new market, but also for better understanding of conventional commercialized systems.

Topical Outline:

  • Gas discharge plasma - definition, characterization and generation principles.
  • Fundamentals of plasma processing, conventional plasma sources and systems.
  • Decaying plasmas and afterglows, time and space resolved afterglows, pulsed plasmas, hybrid plasma systems and processing.
  • Microwave plasmas, ECR plasma, surfatron and surfaguide afterglows for PCVD of films.
  • Novel radio frequency (rf) plasma systems, inductively coupled plasma (ICP) and helicons.
  • Hollow cathode plasma sources (principles and basic applications), dc- and rf-generated hollow cathodes, linear hollow cathodes for large area processing.
  • Classification of arcs, arc evaporation of films from rf hollow cathodes, vacuum arcs, metastable-assisted regimes in hollow cathodes.
  • High density plasma sputtering.
  • Magnets-in-motion concept in plasma sources, linear magnetized hollow cathodes.
  • Cold atmospheric and subatmospheric plasma sources, corona and dielectric barrier discharges (DBD), microwave atmospheric plasma, fused hollow cathode discharge.
  • Advantages and limits of the atmospheric plasma sources and applications.