Program

Wednesday, September 14, 2016Poster Session, 15:15 - 16:45

Poster - Physical Vapour Deposition PVD

PO3001 Deposition and characterization of NbxAlx-1N thin films for high temperatures applications
Eduardo Tentardini1, Renata Carvalho1, Lucas Felix1, Daniel Fernandez1, Gleyciane Souza1, Roberto Hubler2, Agenor Junior3, Fabiana Mendes4
1Federal University of Sergipe / DCEM, São Cristóvão, br, 2Pontifícia Universidade Católica do Rio Grande do Sul, Porto Alegre, Brazil, 3Federal University of Rio Grande do Sul, Porto Alegre, Brazil, 4Instituto Nacional de Tecnologia, Rio de Janeiro, Brazil
Abstract

PO3002 Influence of the discharge power on reactive and non-reactive magnetron sputtering of Ti in DC and pulsed DC mode
Christian Saringer1, Robert Franz1, Katrin Zorn2, Christian Mitterer1
1Montanuniversität Leoben, Leoben, at, 2MIBA High Tech Coatings, Vorchdorf, Austria
Abstract

PO3003 Frequency effects in dual magnetron sputtering
Moritz Heintze1, Thomas Kroyer2
1TRUMPF Hüttinger GmbH + Co. KG, Freiburg, de, 2Fraunhofer-Institut für Solare Energiesysteme ISE, Freiburg, Germany
Abstract

PO3004 Reactive ac magnetron sputtering with a pulsed reactive gas flow control applied to depositions of ZrO2 films
Jiri Rezek1, Jaroslav Vlcek1, Jiri Capek1, Jiri Houska1, Pavel Baroch1
1University of West Bohemia, Plzen, cz
Abstract

PO3007 Facing target cathode: a low damage deposition process
Dominik Jaeger1, Hartmut Rohrmann1
1Evatec, Trübbach, ch
Abstract

PO3008 Aluminum Oxynitride Thin Films Deposited by R-CFDCMS
Maria Fischer1, Mathis Trant1, Kerstin Thorwarth1, Hans Josef Hug1, Jörg Patscheider1
1Empa, Dübendorf, ch
Abstract

PO3009 One step synthesis of LaFeO3-xNx thin film by dual reactive magnetron sputtering
Emile HAYE1, Fabien CAPON1, Silvère BARRAT1, Jean-François PIERSON1
1Institut Jean Lamour, Nancy, fr
Abstract

PO3010 The Effect of Hot-wire on the Plasma of Magnetron Sputtering and the TiN Coatings
YanWen Zhou1, Jian Bo Gao2, YuanYuan Guo3, Biao Meng2, XiaoMing Wang2
1University ofScience&Technology Liaoning, Anshan Liaoning, cn, 2University of Science and Technology Liaoning, Anshan, China, 3University of Science and Technology, Anshan, China
Abstract

PO3011 Physical-chemical characterization of ZrN/Ag thin films deposited by reactive magnetron sputtering for biomedical applications
Cesar Aguzzoli1, A.E.D. Maddalozzo1, T.P. Soares1, C.M. Menezes1, C.A. Figueroa1, J. Catafesta1, M. Giovanela1
1University of Caxias do Sul, Caxias do Sul, br
Abstract

PO3012 Effect of Si incorporation in ZrN Thin Films Deposited by Reactive Magnetron Sputtering
Eduardo Tentardini1, Flavio Freitas1, Daniel Fernandez1, Lucas Felix1, Gleyciane Souza1, Roberto Hubler2, Agenor Henz3, Fabiana Mendes4
1Federal University of Sergipe / DCEM, São Cristóvão, br, 2Pontifícia Universidade Católica do Rio grande do Sul, Porto Alegre, Brazil, 3Federal University of Rio Grande do Sul, Porto Alegre, Brazil, 4Instituto Nacional de tecnologia, Rio de Janeiro, Brazil
Abstract

PO3013 On the existence of a double S-shaped process curve during reactive magnetron sputtering
Roeland Schelfhout1, Koen Strijckmans1, Diederik Depla1
1Ghent University, Ghent, be
Abstract

PO3014 Energetic contributions at the substrate in various regimes of reactive magnetron sputter deposition
Anne-Lise THOMANN1, Mariem El Mokh2, Amael Caillard3, Thomas Lecas3
1GREMI / CNRS, Orléans cedex2, fr, 2GREMI CNRS / université d'Orléans, Orléans, France, 3GREMI CNRS / Université d'Orléans, Orléans, France
Abstract

PO3015 General review of the influence of experimental parameters of RF reactive magnetron sputtering to get columnar, equiaxed nanograined or amorphous oxynitrides
Valerie BRIEN1, Pascal Boulet2
1CNRS Institut Jean Lamour, Vandoeuvre lès Nancy, fr, 2IJL (CC X-gamma) CNRS, Vandoeuvre lès Nancy, France
Abstract

PO3016 Study on yttria stabilized zirconia electrolyte and gadolinia-doped ceria barrier layer deposited by d.c. magnetron sputtering under reactive conditions
Pierre CODDET1, Amael CAILLARD1, Julien VULLIET2, Caroline RICHARD3, Anne-Lise THOMANN1
1GREMI - CNRS / Université d'Orléans, Orléans, fr, 2CEA DAM Le Ripault, Monts, France, 3LMR / Université de Tours, Tours, France
Abstract

PO3017 Microstructure and surface properties of Cr-DLC films deposited by MF magnetron sputtering enhanced by hollow cathode arc
Jian Hu1, Xiubo Tian2, Mingzhong Wu2, Chunzhi Gong2
1Harbin Institute of Technology, Harbin City, cn, 2State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin City, China
Abstract

PO3018 Preparation of Hard Yet Moderately Ductile Mo2BC Thin Films by Pulsed-DC Magnetron Sputtering
Stanislava Debnárová1, Pavel Soucek1, Petr Vasina1, Lukáš Zábranský1, Vilma Buršíková1
1Faculty of Science, Masaryk University, Brno, cz
Abstract

PO3019 High rate sputtered thick films
Alexander Pal1, Valery Mitin2, Alexey Ryabinkin3, Alexander Serov3
1TRINITI, Moscow, Troitsk, ru, 2Naco Technology, Riga, Latvia, 3SINP MSU, Moscow, Russian Federation
Abstract

PO3020 Application of ion beam assisted deposition for the preparation of films with flexible substrate
Yang Miao1, Feng yu dong2
1Lanzhou Institute of Physics, LanZhou, cn, 2Lanzhou Institute of physics, Lanzhou, China
Abstract

PO3021 The shape of the erosion racetrack in a magnetron target
Stephen Muhl1, Julio Cruz1, Johans Restrepo1
1IIM-UNAM, Mexico, mx
Abstract

PO3022 Thermal conductivity of nitride based thin films
Vincent Moraes1, Helmut Riedl2, Richard Rachbauer3, Szilard Koloszvari4, Matthias Ikeda5, Lukas Prochaska5, Silke Buehler-Paschen5, Paul H. Mayrhofer6
1CDL-AOS TU Wien, Vienna, at, 2CDL-AOS Institute of Material Science and Technology / TU Wien, Vienna, Austria, 3Oerlikon Balzers, Oerlikon Balzers Surface Solutions AG, Balzers, Liechtenstein, 4Plansee Composite Materials GmBH, Lechbruck am See, Germany, 5Institute of Solid State Physics, TU Wien, Vienna, Austria, 6Institute of Materials Science and Technology, Vienna, Austria
Abstract

PO3023 Investigation of TiAlN HiPIMS coating deposited on the newly developed Ni-based superalloy AD730
Aleksei Obrosov1, Muhammad Naveed1, Ulrich Krupp2, Mikhail Solovev2, Sabine Weiß1
1Brandenburg University of Technology, Cottbus, de, 2University of Applied Sciences, Osnabrück, Germany
Abstract

PO3024 SYNTHESIS OF IRON OXIDE FILMS BY REACTIVE MAGNETRON SPUTTERING ASSISTED BY PLASMA EMISSION MONITORING
Eric AUBRY1, Alain Billard1, Tao Liu2, Frédéric Perry3, Stéphane Mangin2, Thomas Hauet2
1IRTES-LERMPS, Belfort, fr, 2Institut Jean Lamour, Nancy, France, 3PVDco, Baccarat, France
Abstract

PO3025 The effects of different sputtering process parameters on the properties of Ti-doped ZnO thin film
Fazia Bouaraba1, Salim LAMRI2, Mohammed Said BELKAID1, Imane Bouabibsa2, Sofiane Achache2
1Université Mouloud Mammeri, Tizi Ouzou, dz, 2Université de Technologie de Troyes, Troyes, France
Abstract

PO3026 Visible-light active thin-film WO3 photocatalyst deposited by low-damage hollow-cathode reactive-gas-flow sputtering
Yuzo Shigesato1, Nobuto Oka2, Junjun Jia1
1Aoyama Gakuin University, Sagamihara, Kanagawa, jp, 2Kindai University, Iizuka-shi, Fukuoka-kenn, Japan
Abstract

PO3027 Wear mechanisms of carbide tools with nanoscale multi-layer composite coatings during machining of various material
Alexey Vereschaka1, Anatoly Vereschaka1, Nikolay Sitnikov2, Anatoly Aksenenko1, Abdre Batako3
1MSTU STANKIN, Moscow, ru, 2FSUE “Keldysh Research Center”, Moscow, Russian Federation, 3Liverpool John Moores University, Liverpool, United Kingdom
Abstract

PO3028 Effect of substrate current on the microstructure and corrosion behavior of TiCN coating deposited by pulse enhanced arc evaporation
CHUNZHI GONG1, Yinghe Ma2, Jianping Xu3, Chunwei Li4, Xiubo Tian2
1Harbin Institute of Technology, Harbin, cn, 2State Key Lab. of Advanced Welding and Joining, Harbin Institute of Technology, Harbin, China, 3Department of Materials and Chemical Engineering, Heilongjiang Institute of Technology, Harbin, China, 4College of Engineering and Technology, Northeast Forestry University, Harbin, China
Abstract

PO3029 Combined vacuum deposition technologies for high-rate coating of 3D-parts
Jens-Peter Heinß1, Heidrun Klostermann1, Fred Fietzke1, Henry Morgner1, Bert Scheffel1, Burkhard Zimmermann1, Christoph Metzner1
1Fraunhofer FEP, Dresden, de
Abstract

PO3030 Is nanoparticles sputtering at atmospheric pressure a solution to make nanostructured thin films?
Laura Gaudy1, Jean-Michel Martinez1, Rémy Bazinette2, Emmanuel Hernandez1, Françoise Massines3
1Laboratoire PROMES/UPVD, PERPIGNAN, fr, 2Université de Pau et des Pays de l'Adour, PAU, France, 3Laboratoire PROMES-CNRS, PERPIGNAN, France
Abstract

PO3031 The effect of alloying molybdenum to cathodic arc evaporated Ti-Al-N coatings on their mechanical properties and thermal stability
Stefan A. Glatz1, Christian M. Koller2, Richard Rachbauer3, Szilárd Kolozsvári4, Paul H. Mayrhofer5
1CDL AOS, TU Wien, Vienna, at, 2CDL AOS at Materials Science, TU Wien, Vienna, Austria, 3Oerlikon Balzers, Oerlikon Surface Solutions AG, Balzers, Liechtenstein, 4Plansee Composite Materials GmbH, Lechbruck am See, Germany, 5TU Wien, Institute of Materials Science, Vienna, Austria
Abstract

Poster - Energy Harvesting and Optical Coatings

PO3032 TiAlN Selective Absorber for High Temperature Concentrated Solar Power (CSP) Applications
Maxime Bichotte1, Thomas Kämpfe2, Laurent Dubost1, Thomas Pouit1, Audrey Soum-Glaude3, Alex Legal3, Yves Jourlin2
1HEF-IREIS, St Etienne, fr, 2Hubert Curien laboratory, St-Etienne, France, 3PROMES laboratory, Font-Romeu, France
Abstract

PO3033 LARGE AREA PRECISION OPTICAL COATINGS BY PULSE MAGNETRON SPUTTERING
Daniel Gloess1, Thomas Goschurny1, Andy Drescher1, Hagen Bartzsch1, Peter Frach1, Andreas Heisig2, Harald Grune2, Lothar Leischnig3, Steffen Leischnig3, Carsten Bundesmann4
1Fraunhofer FEP, Dresden, de, 2VON ARDENNE Gmbh, Dresden, Germany, 3LSA GmbH, Hilmersdorf, Germany, 4Leibniz-Institut für Oberflächenmodifizierung e. V., Leipzig, Germany
Abstract

PO3034 Decorative Zirconium oxynitride coatings deposited by magnetron sputtering: an attempt to break the chemical and color restrictions
Diego Martinez Martinez1, C.I. da Silva Oliveira1, L. Cunha1, M.S. Rodrigues1, J. Borges1, C. Lopes1, E. Alves2, N.P. Barradas3, M. Apreutesei4
1Center of Physics, University of Minho, Guimaraes, pt, 2Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Bobadela LRS, Portugal, 3Centro de Ciências e Tecnologias Nucleares, Instituto Superior Técnico, Universidade de Lisboa, Bobadela LRS, Portugal, 4INSA de Lyon, MATEIS Laboratory, Villeurbanne, France
Abstract

PO3035 An experimental study on water management and electrical conductivity behaviors of TiN coated polymer composite bipolar plates for PEMFC
Imdat Taymaz1, Elif Eker Kahveci1
1Sakarya University, Sakarya, tr
Abstract

PO3036 Plasma techniques to overcome DMFC issues: High surface area catalyst supports and Pd films as efficient crossover blocking barriers
Andrea Perego1, Andrea Monti2, Giorgio Giuffredi2, Andrea Bisello2, Andrea Casalegno2, Fabio di Fonzo1
1Istituto Italiano di Tecnologia@PoliMi, Milano, it, 2Politecnico di Milano, Department of Energy, Milano, Italy
Abstract

PO3037 Reactive magnetron co-sputtering deposition of ZnSnN2 thin films for photovoltaic applications
Fahad Alnjiman1, Sebastien Diliberto2, Patrice Miska2, Jean-francois Pierson2
1Institut Jean Lamour, Nancy, fr, 2Institut Jean Lamour (UMR CNRS 7198), Université de Lorraine, Nancy, France
Abstract

PO3038 Multi-layered Hierarchical Nanostructures for Transparent Monolithic Dye-Sensitized Solar Cells Architectures
Francesco Fumagalli1, Luca Passoni1, Andrea Perego1, Sebastiano Bellani1, Fabio Di Fonzo1
1Istituto Italiano di Tecnologia, MIlan, it
Abstract

PO3039 RF magnetron sputtering deposition of TiO2 blocking layers for perovskite solar cells
Eleftherios Amanatides1, Villy E Vrakatseli1, Dimitrios Mataras1
1University of Patras, PATRA, gr
Abstract

Poster - HiPIMS

PO3041 Low temperature deposition of crystalline photocatalytic TiO2 thin films onto polymeric web
Glen West1, Brice Delfour-Peyrethon1, Marina Ratova1, Peter Kelly1
1Manchester Metropolitan University, Manchester, gb
Abstract

PO3042 The material dependency of the (reactive) HIPIMS discharge: an experimental approach.
Filip Moens1, Diederik Depla2
1UGent, Gent, be, 2Ghent University, Gent, Belgium
Abstract

PO3043 Transport and Ion Energy Distributions in Magnetron Sputtering
Jan Trieschmann1, Sara Gallian1, Dennis Krüger1, Frederik Schmidt1, Ralf Peter Brinkmann1, Thomas Mussenbrock1
1Ruhr University Bochum, Bochum, de
Abstract

PO3044 Highly Ionized PVD for Through Silicon Vias with Aspect Ratios up to 20:1
Jürgen Weichart1, Kay Viehweger2
1Evatec AG, Trübbach, ch, 2Fraunhofer IZM ASSID, Moritzburg, Germany
Abstract

PO3045 Impurity suppression in sputtered metallic thin films using HiPIMS
Marcel Mesko1, Matthias Krause2, Frans Munnik2, René Heller2, Jörg Grenzer2, René Hübner2, Juraj Halanda1, Sibylle Gemming2
1Advanced Technologies Research Institute, Trnava, sk, 2Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany
Abstract

PO3046 The features of the breakdown and discharge formation in HIPIMS with various target materials
Xiao Zuo1
1Chinese Academy of Sciences, Ningbo, cn
Abstract

PO3047 Characterization of the mixed-mode carbon HiPIMS process
Mark Tucker1, Rajesh Ganesan2, Dougal McCulloch3, James Partridge3, Michael Stüber4, Sven Ulrich4, Marcela Bilek2, David McKenzie2, Nigel Marks1
1Curtin University, Perth, au, 2The University of Sydney, Sydney, Australia, 3RMIT University, Melbourne, Australia, 4Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany
Abstract

PO3048 Direct measurements of the ion flux at the substrate in reactive HiPIMS
Martin Cada1, Daniel Lundin2, Zdenek Hubicka1
1Institute of Physics of the AS CR, Prague 8, cz, 2CNRS — Université Paris-Sud, Orsay, France
Abstract

PO3049 WO3 THIN FILMS PREPARED BY PULSED PLASMA AND THEIR CHARACTERIZATION
Michaela Brunclíková1, Petra Kšírová1, Štěpán Kment1, Zdeněk Hubička1, Josef Krýsa2
1Institute of Physics of the CAS, Prague, cz, 2University of Chemistry and Technology, Prague, Czech Republic
Abstract

PO3050 Reactive High-Power Impulse Magnetron Sputtering of Thermochromic VO2 Films at Low Deposition Temperatures
David Kolenatý1, Jiří Houška1, Jiří Rezek1, Radomír Čerstvý1, Jaroslav Vlček1
1University of West Bohemia, Plzeň, cz
Abstract

PO3051 Highly Ionized Deposition of CrN from Rotating Target
Holger Gerdes1, Alexandros Themelis1, Ralf Bandorf1, Michael Vergöhl1, Günter Bräuer1
1Fraunhofer IST, Braunschweig, de
Abstract

PO3052 Behavior of spokes at different magnetic fields
Jaroslav Hnilica1, Marta Šlapanská1, Peter Klein1, Petr Vašina1
1Masaryk University, Brno, cz
Abstract

PO3053 Influence of plasma self-organization on the ground state atoms in HiPIMS discharge
Ante Hecimovic1, Nikolay Britun2, Stephanos Konstantinidis2, Rony Snyders2
1Ruhr-Universität Bochum, Bochum, de, 2Chimie des Interactions Plasma-Surface (ChIPS), Universite de Mons, Mons, Belgium
Abstract

PO3054 Highly tetrahedral amorphous carbon films deposited by high power impulse magnetron sputtering under an externally applied pulsed magnetic field
Rajesh Ganesan1, Benjamin Treverrow1, Stephen Bathgate1, Dougal. G. McCulloch3, David. R. McKenzie1, Marcela. M.M. Bilek1
1The University of Sydney, Sydney, au
Abstract

PO3055 Effect of pulse time on structure and mechanical properties of HPPMS deposited AlTiN coatings
Muhammad Naveed1, Aleksei Obrosov1, Sabine Weiß1
1Brandenburg Technical University, Cottbus, de
Abstract

PO3056 Electron dynamics in a HiPIMS Discharge
Dennis Krueger1, Jan Trieschmann1, Ralf Peter Brinkmann1
1Ruhr University Bochum, Bochum, de
Abstract

PO3057 Dual Closed Field Bias HiPIMS deposition of nanometer periodicity metal multilayers for complex shape Accelerating Structures
Valentino Rigato1, Matteo Campostrini1, Bruno Spataro2, Valery Dolgashev3
1INFN Laboratori Nazionali Legnaro, Legnaro, it, 2INFN Laboratori Nazionali Frascati, Frascati, Italy, 3SLAC National Accelerator Laboratory, Menlo Park, United States
Abstract

Poster - Atmospheric and In-liquid Plasmas

PO3058 Plasma processed water (PPW) – an alternative for fresh-cut salad sanitation?
Uta Schnabel1, Jörg Stachowiak1, Oliver Schlüter2, Mathias Andrasch1, Jörg Ehlbeck1
1INP Greifswald e.V., Greifswald, de, 2Leibniz Institute of Agricultural Engineering Potsdam-Bornim, Potsdam, Germany
Abstract

PO3059 Synthesis of ZnO@Cu2O Core-Shell Nanoparticles by Discharges in Liquid Nitrogen
Hiba KABBARA1, Jaafar GHANBAJA1, Cédric NOËL1, Thierry BELMONTE1
1Institut Jean Lamour, Nancy, fr
Abstract

PO3060 Pressure-dependent study of water-plasma interaction
Jakob Barz1, Jan Hennigs2, Hendrik Schikora1, Michael Haupt1, Christian Oehr1
1Fraunhofer IGB, Stuttgart, de, 2Otto-von-Guericke-University Magdeburg, Magdeburg, Germany
Abstract

PO3061 On the influence of ferroelectric components in dielectric barrier discharge plasmas
Ana Gómez-Ramírez1, Antonio M. Montoro-Damas2, Agustín R. González-Elipe2, José Cotrino3
1University of Seville, Seville, es, 2Instituto de Ciencia de Materiales de Sevilla, Sevilla, Spain, 3Universidad de Sevilla, Sevilla, Spain
Abstract

PO3062 Synthesis of 2-Dimensional Lead Oxide by Discharges in Liquid Nitrogen
Thierry BELMONTE1, Ahmad HAMDAN2, Hiba KABBARA2, Cédric NOEL2, Jaafar Ghanbaja2, Abdelkrim REDJAIMIA2
1IJL CNRS-UL, NANCY, fr, 2Institut Jean Lamour, NANCY, France
Abstract

PO3063 Why Test Inks Cannot Tell the Whole Truth About Surface Free Energy of Solids
Thomas Skrivanek1, Ming Jin1, Frank Thomsen1, Thomas Willers1
1Krüss GmbH, Applications, Hamburg, de
Abstract

PO3064 Plasma Modification of Pre-Electrospinning PCL Polymer Solutions
Silvia Grande1, Nathalie De Geyter2, Rino Morent2
1Ghent University, Dept. of Appl. Physics, Gent, be, 2Ghent University, Ghent, Belgium
Abstract

Poster - Characterization and Simulation of Films and Processes

PO3065 Non-destructive characterization for thermally sprayed coatings based on ultrasonic pulse-echo technique
Li Lin1, Wei Zhang2, Zhiyuan Ma2, Mingkai Lei2
1Dalian University Of Technology, Dalian, cn, 2Dalian University of Technology, Dalian, China
Abstract

PO3066 Surface roughness evolution of silica dioxide thin film grown on polymeric foil by Atmospheric Pressure PECVD
Anna Meshkova1, S. Starostin2, H.W. de Vries1, M.C.M. van de Sanden1
1DIFFER, EINDHOVEN, nl, 2FUJIFILM, Tilburg, Netherlands
Abstract

PO3067 Quantitative correlation between intrinsic stress and microstructure of thin films
Diederik Depla1
1Ghent University, Gent, be
Abstract

PO3068 Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas
Martin Bránecký1, Vladimír Čech1
1FCH, Brno University of Technology, Brno, cz
Abstract

PO3069 Surface treatment on electrical conductors to reduce losses due to the corona effect.
Iñigo Braceras1, Saioa Zorita1, Pablo Corengia1
1Tecnalia Research & Innovation, Donostia-San Sebastian, es
Abstract

PO3070 In-situ measurements of carrier transport and trapping in semiconductor films during plasma processing
Shota Nunomura1, Isao Sakata2, Koji Matsubara2
1Nat. Inst. Adv. Ind. Sci. Tech., Tsukuba, jp, 2AIST, Tsukuba, Japan
Abstract

PO3071 Modeling of metastable phase formation diagrams for sputtered thin films
Keke Chang1, Denis Music1, Moritz to Baben1, Dennis Lange1, Hamid Bolvardi1, Jochen Schneider1
1Materials Chemistry, RWTH Aachen, Aachen, de
Abstract

PO3072 Determination of the structure and the properties of a new nickel nitride
Jean Francois PIERSON1, Thibault Morane1, Pascal Boulet1, Emilie Gaudry1, Christine Gendarme1
1Institut Jean Lamour, Nancy, fr
Abstract

PO3073 SIMTRA: simulate your deposition profile
Francis Boydens1, Diederik Depla1
1Ghent University, Gent, be
Abstract

PO3074 Simulation of thin film growth as deposited by magnetron sputtering and evaluation of their morphology, optical and mechanical properties
Pavel Moskovkin1, Eric Kremer1, Stephane Lucas1
1University of Namur, Namur, be
Abstract

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