Program
Wednesday, September 14, 2016Poster
Session, 15:15 - 16:45
Poster - Physical Vapour Deposition PVD |
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PO3001 |
Deposition and characterization of NbxAlx-1N thin films for high temperatures applications Eduardo Tentardini1, Renata Carvalho1, Lucas Felix1, Daniel Fernandez1, Gleyciane Souza1, Roberto Hubler2, Agenor Junior3, Fabiana Mendes4 1Federal University of Sergipe / DCEM, São Cristóvão, br, 2Pontifícia Universidade Católica do Rio Grande do Sul, Porto Alegre, Brazil, 3Federal University of Rio Grande do Sul, Porto Alegre, Brazil, 4Instituto Nacional de Tecnologia, Rio de Janeiro, Brazil Abstract |
PO3002 |
Influence of the discharge power on reactive and non-reactive magnetron sputtering of Ti in DC and pulsed DC mode Christian Saringer1, Robert Franz1, Katrin Zorn2, Christian Mitterer1 1Montanuniversität Leoben, Leoben, at, 2MIBA High Tech Coatings, Vorchdorf, Austria Abstract |
PO3003 |
Frequency effects in dual magnetron sputtering Moritz Heintze1, Thomas Kroyer2 1TRUMPF Hüttinger GmbH + Co. KG, Freiburg, de, 2Fraunhofer-Institut für Solare Energiesysteme ISE, Freiburg, Germany Abstract |
PO3004 |
Reactive ac magnetron sputtering with a pulsed reactive gas flow control applied to depositions of ZrO2 films Jiri Rezek1, Jaroslav Vlcek1, Jiri Capek1, Jiri Houska1, Pavel Baroch1 1University of West Bohemia, Plzen, cz Abstract |
PO3007 |
Facing target cathode: a low damage deposition process Dominik Jaeger1, Hartmut Rohrmann1 1Evatec, Trübbach, ch Abstract |
PO3008 |
Aluminum Oxynitride Thin Films Deposited by R-CFDCMS Maria Fischer1, Mathis Trant1, Kerstin Thorwarth1, Hans Josef Hug1, Jörg Patscheider1 1Empa, Dübendorf, ch Abstract |
PO3009 |
One step synthesis of LaFeO3-xNx thin film by dual reactive magnetron sputtering Emile HAYE1, Fabien CAPON1, Silvère BARRAT1, Jean-François PIERSON1 1Institut Jean Lamour, Nancy, fr Abstract |
PO3010 |
The Effect of Hot-wire on the Plasma of Magnetron Sputtering and the TiN Coatings YanWen Zhou1, Jian Bo Gao2, YuanYuan Guo3, Biao Meng2, XiaoMing Wang2 1University ofScience&Technology Liaoning, Anshan Liaoning, cn, 2University of Science and Technology Liaoning, Anshan, China, 3University of Science and Technology, Anshan, China Abstract |
PO3011 |
Physical-chemical characterization of ZrN/Ag thin films deposited by reactive magnetron sputtering for biomedical applications Cesar Aguzzoli1, A.E.D. Maddalozzo1, T.P. Soares1, C.M. Menezes1, C.A. Figueroa1, J. Catafesta1, M. Giovanela1 1University of Caxias do Sul, Caxias do Sul, br Abstract |
PO3012 |
Effect of Si incorporation in ZrN Thin Films Deposited by Reactive Magnetron Sputtering Eduardo Tentardini1, Flavio Freitas1, Daniel Fernandez1, Lucas Felix1, Gleyciane Souza1, Roberto Hubler2, Agenor Henz3, Fabiana Mendes4 1Federal University of Sergipe / DCEM, São Cristóvão, br, 2Pontifícia Universidade Católica do Rio grande do Sul, Porto Alegre, Brazil, 3Federal University of Rio Grande do Sul, Porto Alegre, Brazil, 4Instituto Nacional de tecnologia, Rio de Janeiro, Brazil Abstract |
PO3013 |
On the existence of a double S-shaped process curve during reactive magnetron sputtering Roeland Schelfhout1, Koen Strijckmans1, Diederik Depla1 1Ghent University, Ghent, be Abstract |
PO3014 |
Energetic contributions at the substrate in various regimes of reactive magnetron sputter deposition Anne-Lise THOMANN1, Mariem El Mokh2, Amael Caillard3, Thomas Lecas3 1GREMI / CNRS, Orléans cedex2, fr, 2GREMI CNRS / université d'Orléans, Orléans, France, 3GREMI CNRS / Université d'Orléans, Orléans, France Abstract |
PO3015 |
General review of the influence of experimental parameters of RF reactive magnetron sputtering to get columnar, equiaxed nanograined or amorphous oxynitrides Valerie BRIEN1, Pascal Boulet2 1CNRS Institut Jean Lamour, Vandoeuvre lès Nancy, fr, 2IJL (CC X-gamma) CNRS, Vandoeuvre lès Nancy, France Abstract |
PO3016 | Study on yttria stabilized zirconia electrolyte and gadolinia-doped ceria barrier layer deposited by d.c. magnetron sputtering under reactive conditions Pierre CODDET1, Amael CAILLARD1, Julien VULLIET2, Caroline RICHARD3, Anne-Lise THOMANN1 1GREMI - CNRS / Université d'Orléans, Orléans, fr, 2CEA DAM Le Ripault, Monts, France, 3LMR / Université de Tours, Tours, France Abstract |
PO3017 | Microstructure and surface properties of Cr-DLC films deposited by MF magnetron sputtering enhanced by hollow cathode arc Jian Hu1, Xiubo Tian2, Mingzhong Wu2, Chunzhi Gong2 1Harbin Institute of Technology, Harbin City, cn, 2State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin City, China Abstract |
PO3018 | Preparation of Hard Yet Moderately Ductile Mo2BC Thin Films by Pulsed-DC Magnetron Sputtering Stanislava Debnárová1, Pavel Soucek1, Petr Vasina1, Lukáš Zábranský1, Vilma Buršíková1 1Faculty of Science, Masaryk University, Brno, cz Abstract |
PO3019 | High rate sputtered thick films Alexander Pal1, Valery Mitin2, Alexey Ryabinkin3, Alexander Serov3 1TRINITI, Moscow, Troitsk, ru, 2Naco Technology, Riga, Latvia, 3SINP MSU, Moscow, Russian Federation Abstract |
PO3020 | Application of ion beam assisted deposition for the preparation of films with flexible substrate Yang Miao1, Feng yu dong2 1Lanzhou Institute of Physics, LanZhou, cn, 2Lanzhou Institute of physics, Lanzhou, China Abstract |
PO3021 | The shape of the erosion racetrack in a magnetron target Stephen Muhl1, Julio Cruz1, Johans Restrepo1 1IIM-UNAM, Mexico, mx Abstract |
PO3022 | Thermal conductivity of nitride based thin films Vincent Moraes1, Helmut Riedl2, Richard Rachbauer3, Szilard Koloszvari4, Matthias Ikeda5, Lukas Prochaska5, Silke Buehler-Paschen5, Paul H. Mayrhofer6 1CDL-AOS TU Wien, Vienna, at, 2CDL-AOS Institute of Material Science and Technology / TU Wien, Vienna, Austria, 3Oerlikon Balzers, Oerlikon Balzers Surface Solutions AG, Balzers, Liechtenstein, 4Plansee Composite Materials GmBH, Lechbruck am See, Germany, 5Institute of Solid State Physics, TU Wien, Vienna, Austria, 6Institute of Materials Science and Technology, Vienna, Austria Abstract |
PO3023 | Investigation of TiAlN HiPIMS coating deposited on the newly developed Ni-based superalloy AD730 Aleksei Obrosov1, Muhammad Naveed1, Ulrich Krupp2, Mikhail Solovev2, Sabine Weiß1 1Brandenburg University of Technology, Cottbus, de, 2University of Applied Sciences, Osnabrück, Germany Abstract |
PO3024 | SYNTHESIS OF IRON OXIDE FILMS BY REACTIVE MAGNETRON SPUTTERING ASSISTED BY PLASMA EMISSION MONITORING Eric AUBRY1, Alain Billard1, Tao Liu2, Frédéric Perry3, Stéphane Mangin2, Thomas Hauet2 1IRTES-LERMPS, Belfort, fr, 2Institut Jean Lamour, Nancy, France, 3PVDco, Baccarat, France Abstract |
PO3025 | The effects of different sputtering process parameters on the properties of Ti-doped ZnO thin film Fazia Bouaraba1, Salim LAMRI2, Mohammed Said BELKAID1, Imane Bouabibsa2, Sofiane Achache2 1Université Mouloud Mammeri, Tizi Ouzou, dz, 2Université de Technologie de Troyes, Troyes, France Abstract |
PO3026 | Visible-light active thin-film WO3 photocatalyst
deposited by low-damage hollow-cathode reactive-gas-flow sputtering Yuzo Shigesato1, Nobuto Oka2, Junjun Jia1 1Aoyama Gakuin University, Sagamihara, Kanagawa, jp, 2Kindai University, Iizuka-shi, Fukuoka-kenn, Japan Abstract |
PO3027 | Wear mechanisms of carbide tools with nanoscale multi-layer composite coatings during machining of various material Alexey Vereschaka1, Anatoly Vereschaka1, Nikolay Sitnikov2, Anatoly Aksenenko1, Abdre Batako3 1MSTU STANKIN, Moscow, ru, 2FSUE “Keldysh Research Center”, Moscow, Russian Federation, 3Liverpool John Moores University, Liverpool, United Kingdom Abstract |
PO3028 | Effect of substrate current on the microstructure and corrosion behavior of TiCN coating deposited by pulse enhanced arc evaporation CHUNZHI GONG1, Yinghe Ma2, Jianping Xu3, Chunwei Li4, Xiubo Tian2 1Harbin Institute of Technology, Harbin, cn, 2State Key Lab. of Advanced Welding and Joining, Harbin Institute of Technology, Harbin, China, 3Department of Materials and Chemical Engineering, Heilongjiang Institute of Technology, Harbin, China, 4College of Engineering and Technology, Northeast Forestry University, Harbin, China Abstract |
PO3029 | Combined vacuum deposition technologies for high-rate coating of 3D-parts Jens-Peter Heinß1, Heidrun Klostermann1, Fred Fietzke1, Henry Morgner1, Bert Scheffel1, Burkhard Zimmermann1, Christoph Metzner1 1Fraunhofer FEP, Dresden, de Abstract |
PO3030 | Is nanoparticles sputtering at atmospheric pressure a solution to make nanostructured thin films? Laura Gaudy1, Jean-Michel Martinez1, Rémy Bazinette2, Emmanuel Hernandez1, Françoise Massines3 1Laboratoire PROMES/UPVD, PERPIGNAN, fr, 2Université de Pau et des Pays de l'Adour, PAU, France, 3Laboratoire PROMES-CNRS, PERPIGNAN, France Abstract |
PO3031 | The effect of alloying molybdenum to cathodic arc evaporated Ti-Al-N coatings on their mechanical properties and thermal stability Stefan A. Glatz1, Christian M. Koller2, Richard Rachbauer3, Szilárd Kolozsvári4, Paul H. Mayrhofer5 1CDL AOS, TU Wien, Vienna, at, 2CDL AOS at Materials Science, TU Wien, Vienna, Austria, 3Oerlikon Balzers, Oerlikon Surface Solutions AG, Balzers, Liechtenstein, 4Plansee Composite Materials GmbH, Lechbruck am See, Germany, 5TU Wien, Institute of Materials Science, Vienna, Austria Abstract |
Poster - Energy Harvesting and Optical Coatings |
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PO3032 | TiAlN Selective Absorber for High Temperature Concentrated Solar Power (CSP) Applications Maxime Bichotte1, Thomas Kämpfe2, Laurent Dubost1, Thomas Pouit1, Audrey Soum-Glaude3, Alex Legal3, Yves Jourlin2 1HEF-IREIS, St Etienne, fr, 2Hubert Curien laboratory, St-Etienne, France, 3PROMES laboratory, Font-Romeu, France Abstract |
PO3033 | LARGE AREA PRECISION OPTICAL COATINGS BY PULSE MAGNETRON SPUTTERING Daniel Gloess1, Thomas Goschurny1, Andy Drescher1, Hagen Bartzsch1, Peter Frach1, Andreas Heisig2, Harald Grune2, Lothar Leischnig3, Steffen Leischnig3, Carsten Bundesmann4 1Fraunhofer FEP, Dresden, de, 2VON ARDENNE Gmbh, Dresden, Germany, 3LSA GmbH, Hilmersdorf, Germany, 4Leibniz-Institut für Oberflächenmodifizierung e. V., Leipzig, Germany Abstract |
PO3034 | Decorative Zirconium oxynitride coatings deposited by magnetron sputtering: an attempt to break the chemical and color restrictions Diego Martinez Martinez1, C.I. da Silva Oliveira1, L. Cunha1, M.S. Rodrigues1, J. Borges1, C. Lopes1, E. Alves2, N.P. Barradas3, M. Apreutesei4 1Center of Physics, University of Minho, Guimaraes, pt, 2Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Bobadela LRS, Portugal, 3Centro de Ciências e Tecnologias Nucleares, Instituto Superior Técnico, Universidade de Lisboa, Bobadela LRS, Portugal, 4INSA de Lyon, MATEIS Laboratory, Villeurbanne, France Abstract |
PO3035 | An experimental study on water management and electrical conductivity behaviors of TiN coated polymer composite bipolar plates for PEMFC Imdat Taymaz1, Elif Eker Kahveci1 1Sakarya University, Sakarya, tr Abstract |
PO3036 | Plasma techniques to overcome DMFC issues: High surface area catalyst supports and Pd films as efficient crossover blocking barriers Andrea Perego1, Andrea Monti2, Giorgio Giuffredi2, Andrea Bisello2, Andrea Casalegno2, Fabio di Fonzo1 1Istituto Italiano di Tecnologia@PoliMi, Milano, it, 2Politecnico di Milano, Department of Energy, Milano, Italy Abstract |
PO3037 | Reactive magnetron co-sputtering deposition of ZnSnN2 thin films for photovoltaic applications Fahad Alnjiman1, Sebastien Diliberto2, Patrice Miska2, Jean-francois Pierson2 1Institut Jean Lamour, Nancy, fr, 2Institut Jean Lamour (UMR CNRS 7198), Université de Lorraine, Nancy, France Abstract |
PO3038 | Multi-layered Hierarchical Nanostructures for Transparent Monolithic Dye-Sensitized Solar Cells Architectures Francesco Fumagalli1, Luca Passoni1, Andrea Perego1, Sebastiano Bellani1, Fabio Di Fonzo1 1Istituto Italiano di Tecnologia, MIlan, it Abstract |
PO3039 | RF magnetron sputtering deposition of TiO2 blocking layers for perovskite solar cells Eleftherios Amanatides1, Villy E Vrakatseli1, Dimitrios Mataras1 1University of Patras, PATRA, gr Abstract |
Poster - HiPIMS |
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PO3041 | Low temperature deposition of crystalline photocatalytic TiO2 thin films onto polymeric web Glen West1, Brice Delfour-Peyrethon1, Marina Ratova1, Peter Kelly1 1Manchester Metropolitan University, Manchester, gb Abstract |
PO3042 | The material dependency of the (reactive) HIPIMS discharge: an experimental
approach. Filip Moens1, Diederik Depla2 1UGent, Gent, be, 2Ghent University, Gent, Belgium Abstract |
PO3043 | Transport and Ion Energy Distributions in Magnetron Sputtering Jan Trieschmann1, Sara Gallian1, Dennis Krüger1, Frederik Schmidt1, Ralf Peter Brinkmann1, Thomas Mussenbrock1 1Ruhr University Bochum, Bochum, de Abstract |
PO3044 | Highly Ionized PVD for Through Silicon Vias with Aspect Ratios up to 20:1 Jürgen Weichart1, Kay Viehweger2 1Evatec AG, Trübbach, ch, 2Fraunhofer IZM ASSID, Moritzburg, Germany Abstract |
PO3045 | Impurity suppression in sputtered metallic thin films using HiPIMS Marcel Mesko1, Matthias Krause2, Frans Munnik2, René Heller2, Jörg Grenzer2, René Hübner2, Juraj Halanda1, Sibylle Gemming2 1Advanced Technologies Research Institute, Trnava, sk, 2Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany Abstract |
PO3046 | The features of the breakdown and discharge formation in HIPIMS with various target materials Xiao Zuo1 1Chinese Academy of Sciences, Ningbo, cn Abstract |
PO3047 | Characterization of the mixed-mode carbon HiPIMS process Mark Tucker1, Rajesh Ganesan2, Dougal McCulloch3, James Partridge3, Michael Stüber4, Sven Ulrich4, Marcela Bilek2, David McKenzie2, Nigel Marks1 1Curtin University, Perth, au, 2The University of Sydney, Sydney, Australia, 3RMIT University, Melbourne, Australia, 4Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany Abstract |
PO3048 | Direct measurements of the ion flux at the substrate in reactive HiPIMS Martin Cada1, Daniel Lundin2, Zdenek Hubicka1 1Institute of Physics of the AS CR, Prague 8, cz, 2CNRS — Université Paris-Sud, Orsay, France Abstract |
PO3049 | WO3 THIN FILMS PREPARED BY PULSED PLASMA AND THEIR CHARACTERIZATION Michaela Brunclíková1, Petra Kšírová1, Štěpán Kment1, Zdeněk Hubička1, Josef Krýsa2 1Institute of Physics of the CAS, Prague, cz, 2University of Chemistry and Technology, Prague, Czech Republic Abstract |
PO3050 | Reactive High-Power Impulse Magnetron Sputtering of Thermochromic VO2 Films at Low Deposition Temperatures David Kolenatý1, Jiří Houška1, Jiří Rezek1, Radomír Čerstvý1, Jaroslav Vlček1 1University of West Bohemia, Plzeň, cz Abstract |
PO3051 | Highly Ionized Deposition of CrN from Rotating Target Holger Gerdes1, Alexandros Themelis1, Ralf Bandorf1, Michael Vergöhl1, Günter Bräuer1 1Fraunhofer IST, Braunschweig, de Abstract |
PO3052 | Behavior of spokes at different magnetic fields Jaroslav Hnilica1, Marta Šlapanská1, Peter Klein1, Petr Vašina1 1Masaryk University, Brno, cz Abstract |
PO3053 | Influence of plasma self-organization on the ground state atoms in HiPIMS discharge Ante Hecimovic1, Nikolay Britun2, Stephanos Konstantinidis2, Rony Snyders2 1Ruhr-Universität Bochum, Bochum, de, 2Chimie des Interactions Plasma-Surface (ChIPS), Universite de Mons, Mons, Belgium Abstract |
PO3054 | Highly tetrahedral amorphous carbon films deposited by high power impulse magnetron sputtering under an externally applied pulsed magnetic field Rajesh Ganesan1, Benjamin Treverrow1, Stephen Bathgate1, Dougal. G. McCulloch3, David. R. McKenzie1, Marcela. M.M. Bilek1 1The University of Sydney, Sydney, au Abstract |
PO3055 | Effect of pulse time on structure and mechanical properties of HPPMS deposited AlTiN coatings Muhammad Naveed1, Aleksei Obrosov1, Sabine Weiß1 1Brandenburg Technical University, Cottbus, de Abstract |
PO3056 | Electron dynamics in a HiPIMS Discharge Dennis Krueger1, Jan Trieschmann1, Ralf Peter Brinkmann1 1Ruhr University Bochum, Bochum, de Abstract |
PO3057 | Dual Closed Field Bias HiPIMS deposition of nanometer periodicity metal multilayers for complex shape Accelerating Structures Valentino Rigato1, Matteo Campostrini1, Bruno Spataro2, Valery Dolgashev3 1INFN Laboratori Nazionali Legnaro, Legnaro, it, 2INFN Laboratori Nazionali Frascati, Frascati, Italy, 3SLAC National Accelerator Laboratory, Menlo Park, United States Abstract |
Poster - Atmospheric and In-liquid Plasmas |
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PO3058 | Plasma processed water (PPW) – an alternative for fresh-cut salad sanitation? Uta Schnabel1, Jörg Stachowiak1, Oliver Schlüter2, Mathias Andrasch1, Jörg Ehlbeck1 1INP Greifswald e.V., Greifswald, de, 2Leibniz Institute of Agricultural Engineering Potsdam-Bornim, Potsdam, Germany Abstract |
PO3059 | Synthesis of ZnO@Cu2O Core-Shell Nanoparticles by Discharges in Liquid Nitrogen Hiba KABBARA1, Jaafar GHANBAJA1, Cédric NOËL1, Thierry BELMONTE1 1Institut Jean Lamour, Nancy, fr Abstract |
PO3060 | Pressure-dependent study of water-plasma interaction Jakob Barz1, Jan Hennigs2, Hendrik Schikora1, Michael Haupt1, Christian Oehr1 1Fraunhofer IGB, Stuttgart, de, 2Otto-von-Guericke-University Magdeburg, Magdeburg, Germany Abstract |
PO3061 | On the influence of ferroelectric components in dielectric barrier discharge plasmas Ana Gómez-Ramírez1, Antonio M. Montoro-Damas2, Agustín R. González-Elipe2, José Cotrino3 1University of Seville, Seville, es, 2Instituto de Ciencia de Materiales de Sevilla, Sevilla, Spain, 3Universidad de Sevilla, Sevilla, Spain Abstract |
PO3062 | Synthesis of 2-Dimensional Lead Oxide by Discharges in Liquid Nitrogen Thierry BELMONTE1, Ahmad HAMDAN2, Hiba KABBARA2, Cédric NOEL2, Jaafar Ghanbaja2, Abdelkrim REDJAIMIA2 1IJL CNRS-UL, NANCY, fr, 2Institut Jean Lamour, NANCY, France Abstract |
PO3063 | Why Test Inks Cannot Tell the Whole Truth About Surface Free Energy of Solids Thomas Skrivanek1, Ming Jin1, Frank Thomsen1, Thomas Willers1 1Krüss GmbH, Applications, Hamburg, de Abstract |
PO3064 | Plasma Modification of Pre-Electrospinning PCL Polymer Solutions Silvia Grande1, Nathalie De Geyter2, Rino Morent2 1Ghent University, Dept. of Appl. Physics, Gent, be, 2Ghent University, Ghent, Belgium Abstract |
Poster - Characterization and Simulation of Films and Processes |
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PO3065 | Non-destructive characterization for thermally sprayed coatings based on ultrasonic pulse-echo technique Li Lin1, Wei Zhang2, Zhiyuan Ma2, Mingkai Lei2 1Dalian University Of Technology, Dalian, cn, 2Dalian University of Technology, Dalian, China Abstract |
PO3066 | Surface roughness evolution of silica dioxide thin film grown on polymeric foil by Atmospheric Pressure PECVD Anna Meshkova1, S. Starostin2, H.W. de Vries1, M.C.M. van de Sanden1 1DIFFER, EINDHOVEN, nl, 2FUJIFILM, Tilburg, Netherlands Abstract |
PO3067 |
Quantitative correlation between intrinsic stress and microstructure of thin films Diederik Depla1 1Ghent University, Gent, be Abstract |
PO3068 |
Optical properties of a-SiC:H films deposited by continuous wave and pulsed plasmas Martin Bránecký1, Vladimír Čech1 1FCH, Brno University of Technology, Brno, cz Abstract |
PO3069 |
Surface treatment on electrical conductors to reduce losses due to the corona effect. Iñigo Braceras1, Saioa Zorita1, Pablo Corengia1 1Tecnalia Research & Innovation, Donostia-San Sebastian, es Abstract |
PO3070 |
In-situ measurements of carrier transport and trapping in semiconductor films during plasma processing Shota Nunomura1, Isao Sakata2, Koji Matsubara2 1Nat. Inst. Adv. Ind. Sci. Tech., Tsukuba, jp, 2AIST, Tsukuba, Japan Abstract |
PO3071 |
Modeling of metastable phase formation diagrams for sputtered thin films Keke Chang1, Denis Music1, Moritz to Baben1, Dennis Lange1, Hamid Bolvardi1, Jochen Schneider1 1Materials Chemistry, RWTH Aachen, Aachen, de Abstract |
PO3072 |
Determination of the structure and the properties of a new nickel nitride Jean Francois PIERSON1, Thibault Morane1, Pascal Boulet1, Emilie Gaudry1, Christine Gendarme1 1Institut Jean Lamour, Nancy, fr Abstract |
PO3073 |
SIMTRA: simulate your deposition profile Francis Boydens1, Diederik Depla1 1Ghent University, Gent, be Abstract |
PO3074 |
Simulation of thin film growth as deposited by magnetron sputtering and evaluation of their morphology, optical and mechanical properties Pavel Moskovkin1, Eric Kremer1, Stephane Lucas1 1University of Namur, Namur, be Abstract |