Tuesday, September 16, 2014Poster Session, 18:45 - 22:00

Poster - Simulation and modelling of structure, stoichiometry and growth

PO2001 An improved modeling and simulation tool for arbitrary coated surfaces - FilmDoctor goes Mathematica
Nick Bierwisch1, Norbert Schwarzer1
1SIO, Nordhausen, Germany
PO2002 The elastic and electronic properties of Fe3Al and Fe-X-Al(X=Cr,Mo,W) from First-principles Calculation
Yu Chen1
1Nanjing Institute Of Industry Technology, Nanjing, China
PO2003 Computational study of thin film growth by pulsed deposition techniques
Rudolf Hrach1, Vera Hrachova1
1Charles University, Prague 8, Czech Republic
PO2004 The effect of nitrogen vacancies on the phase stability, structure and mechanical properties of Cr1-xTMx(TM=Mo, W)N1-y
Liangcai Zhou1, Liangcai Zhou2, David Holec3, David Holec4, Paul Heinz Mayrhofer2, Paul Heinz Mayrhofer4
1Institute of Materials Science and -Tec, Wien, Austria, 2Institute of Materials Science and Technology, Vienna University of Technology, Vienna, Austria, 3Department of Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Leoben, Austria, 4Christian Doppler Laboratory for Application Oriented Coating Development at the Institute of Materials Science and Technology, Vienna University of Technology, Vienna, Austria

Poster - Nano films

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PO2006 Multiyayering strategies to enhance the mechanical performance of arc PVD deposited CrAlO films
Gonzalo G Fuentes1, Eluxka Almandoz1, Rafael J. Rodríguez1, Satish Kulkarni1
1AIN_TECH, Galar, Spain
PO2007 The Study of Se Ion Beam Assisted Reactive Magnetron Sputtering of CIGS Films
Yi Wang1, Yudong Feng2, Zhimin Wang2, Jinxiao Wang2, Kai Zhao2, Hu Wang2, Miao Yang2
1Lanzhou Institute of Physics, Lanzhou, China, 2Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou, China
PO2008 Modulus and compressive stress graded Ti-C - TiC/TiSiC nano metric multilayer coating for Ti-6Al-4V aerospace alloy
Thulasi Raman Kamalakshi Hemachandran1, Mohan Rao Gowravaram1
1Indian Institute of Science, Bangalore, India
PO2009 High temperature mechanical behaviour of epitaxial TiN/AlN nanomultilayers
Vipin Chawla1, Jeffrey M. Wheeler1, Johannes Zechner1, Helmut Riedl2, Paul H. Mayrhofer2, Ivo Utke1, Johann Michler1
1EMPA, Thun, Switzerland, 2Vienna University of Technology, Vienna, Austria
PO2010 Length-scale-dependent mechanical and damping properties of NiTiCu/AlN/Si thin film multilayers
Davinder Kaur1, Navjot Kaur1
1I.I.T Roorkee, Roorkee, India
PO2011 A Study of TiAlCrSiCN Coating for Aluminum Die Casting Dies
Jun Seok Lee1, Chang Hyun Shin1, Ji Hwan Yun1, Sung Chul Cha2, Dong Ha Kang2, Hak Kyun Roh3
1Dongwoo HST, Gyeonggi-do, South Korea, 2Hyundai Motor Group, Gyeonggi-do, South Korea, 3Kia Motors, Gyeonggi-do, South Korea
PO2012 Cr-based binary nitride and oxide multilayer coatings
Ali Khatibi1, Mirjam Arndt1
1Oerlikon Balzers Coating AG, Balzers, Liechtenstein
PO2013 The structures and properties of TiAlN/CrN multi-layer coated by dual rf magnetron sputter
Yoon Kee Kim1, Jin Ki Kim1
1Hanbat National University, Daejeon, South Korea

Poster - Plasma-enhanced chemical vapor deposition - PECVD

PO2014 Tribological behaviors of the Fe-Al-Cr-Nb alloyed layer deposited on 45# steel via double glow plasma surface metallurgy
Xixi Luo1, Zhengjun Yao1, Pingze Zhang1, Yu Chen1, Dongbo Wei1, Junmou Zhu1, Xiaofeng Wu1, Hongqin Yang1
1NUAA, Nanjing, China
PO2015 Use of pulsed PECVD for low temperature deposition of TiSiO optical thin films
ELISABETH Stéphane1, Michèle CARETTE1, Agnes GRANIER1, Antoine GOULLET1
1Institut des matériaux Jean Rouxel, Nantes, France
PO2016 Multi SWD plasma jet system for PECVD deposition of thin films
Jiri Olejnicek1, Jiří Šmíd1, Martin Čada1, Štěpán Kment1, Zdeněk Hubička1, Lubomír Jastrabík1
1Institute of Physics of ASCR, Prague, Czech Republic
PO2017 NH2-siloxane layers deposited in an Ar-N2 microwave afterglow using 3-Aminopropyltriethoxysilane (APTES): how to improve the amino-group retention?
Elodie Lecoq1, Simon Bulou1, Magamou Gueye2, Thomas Gries2, Cedric Noel2, Thierry Belmonte2, Patrick Choquet1
1CRP Gabriel Lippmann, Belvaux, Luxembourg, 2Institut jean Lamour, Nancy, France
PO2018 Deposition of SiCxNy:H thin films by low pressure ECR plasma enhanced CVD - Effect of microwave power and H2 injection
Amanda Thouvenin1, Ahmad Ahmad1, Robert Hugon1, Ludovic de Poucques1, Damien Genève1, Jean-Luc Vasseur1, Patrice Miska1, Mohammed Belmahi1
1Université de Lorraine - IJL, Vandoeuvre–lès–Nancy, France
PO2019 Zinc Oxide Thin Film Coating by Plasma Enhanced Chemical Vapor Deposition of Zn(acac)2 and Study of Optical and Structural Properties
Amirreza Ghassami1, Seyed Iman Hosseini1, Mojtaba Rajabi1, Marzieh Abbasi Firouzjah1, Babak Shokri1
1Shahid Beheshti University, Tehran, Iran
PO2020 Hydration of Hydrophobic HMDSO Plasma Polymers
Noemi Blanchard1, Manfred Heuberger1, Dirk Hegemann1
1Empa, St. Gallen, Switzerland
PO2021 A study on the synthesized of conductive polymer thin films by PECVD
Long Wen1, Amjed Javid2, Dongcheol Jeong3, Sanghoon Kim4, JaeDo Nam5, Changsik Song3, Jeongeon Han6
1Center for advanced plasma surface Tech, Suwon-si, South Korea, 2NU-SKKU Joint Institute for Plasma-Nano Materials, Center for Advanced Plasma Surface Technology, Suwon, South Korea, 3Department of Chemistry, Chemical and Biological Defense Research Center, Suwon, South Korea, 4Department of Energy Science, Suwon, South Korea, 5Department of Energy Science and Department of Polymer Science and Engineering, Suwon, South Korea, 6NU-SKKU Joint Institute for Plasma-Nano Materials, Center for Advanced Plasma Surface Technology,, Suwon, South Korea
PO2022 Effect of Relative Inlet Flow Location of Monomer and Oxygen Gases in a System with a Rotatable Substrate Table for Deposition of Plasma Polymer Multilayers
Wei-Yu Chen1, Ko-Shao Chen2, Allan Matthews1
1University of Sheffield, Sheffield, United Kingdom, 2Tatung University, Taipei City, Taiwan
PO2023 Modelling of ion transport through plasma sheath to substrates with trenches
Tomas Ibehej1, Jakub Hromadka1, Rudolf Hrach1
1Charles University in Prague, Prague 8, Czech Republic
PO2024 Deposition of silica films into trenches: Comparison of reactive magnetron sputtering and PECVD
Andreas Dubbe1, Roland Dittmeyer1
1Inst. for Micro Process Engineering, KIT, Eggenstein-Leopoldshafen, Germany
PO2026 SiCN:H antireflective and passivation films deposited from liquid organosilicon with low and microwave frequency PECVD.
Béatrice PLUJAT1, I. Bousquet2, J.A. Silva3, A. Soum-Glaude1, S. Quoizola2, E. Hernandez2, L. Thomas2
1Laboratoire PROMES, PERPIGNAN, France, 2Laboratoire PROMES, Université VIA DOMITIA, Perpignan, France, 3Dom Luiz Institut, Faculty of Science University, Lisbon, Portugal
PO2027 Feasibility study on polyparylene deposition by an rf-plasma
Erik v. Wahl1, Maik Fröhlich2, Holger Kersten1
1Group Plasma Technology, Kiel University, Kiel, Germany, 2Leib­niz In­sti­tu­te for Plas­ma Sci­ence and Tech­no­lo­gy, Greifswald, Germany
PO2028 Plasma Polymerization of Thin Functional Films at Atmospheric Pressure Using Capillary Jets
James Bradley1, Fred Moix1, Kirsty McKay1
1University of Liverpool, Liverpool, United Kingdom
PO2029 Fluorocarbon finishing of textiles by plasma enhanced chemical vapor deposition and plasma grafting
Jakob Barz1, Georg Umlauf2, Christian Oehr1, Thomas Hirth2
1Fraunhofer IGB, Stuttgart, Germany, 2University of Stuttgart, Stuttgart, Germany
PO2030 PEO-like coatings deposited by PECVD using tetraglyme precursor
Alessandro Patelli1, Andrea Saracino2, Roberto Olivotto1, Marino Colasuonno1, Marco Scoponi2
1Veneto Nanotech SCpA, Venezia, Italy, 2Universita' di Ferrara, Ferrara, Italy
PO2031 Transparent Protective Coating by Plasma Polymerization of Vinyltrimethylsilane or Hexamethyldisilazane and Oxygen Post-treatment
Ko-Shao Chen1, Ko-Shao Chen1, Wan-Yu Liu1, Vladimir Cech2, Norihiro Inagaki3
1Tatung University, Taipei, Taiwan, 2Brno University of Technology, Brno, Czech Republic, 3Shizuoka University, Hamamatsu, Japan
PO2032 The influence of deposition angle and plasma parameters on thin films polyaniline obtained by DC glow discharge plasma polymerization
Bogdan Butoi1, Claudia Nastase2, Valentin Barna2, Florin Nastase2
1Faculty of Physics, University of Bucharest, Magurele, Romania, 2University of Bucharest, Bucharest, Romania
PO2033 Low molecular weight monomer for plasma deposition of superhydrophilic PEO-like coatings
Eleftherios Amanatides1, Villy Vrakatseli1, Dimitris Mataras1
1Dept. Chem. Engineering - Un. of Patras, PATRA, Greece

Poster - Magnetron sputtering

PO2034 Low absorption SiO2 film synthesis from a boron doped silicon target by reactive sputtering
Kęstutis Juškevičius1, Martynas Audronis2, Andrius Subačius1, Ramutis Drazdys1, Allan Matthews2
1Center for Physical Sciences and Techno, Vilnius, Lithuania, 2Department of Materials Science and Engineering, The University of Sheffield, Sheffield, United Kingdom
PO2035 On the Deposition Rate of Magnetron Sputtered Thin Films at Oblique Angles
Rafael Alvarez1, Jose Miguel Garcia-Martin2, Carmen Lopez-Santos1, Victor Rico1, Francisco Javier Ferrer3, José Cotrino1, Agustin R. Gonzalez-Elipe1, Alberto Palmero1
1Materials Science Institute of Seville, Seville, Spain, 2Microelectronics Institute of Madrid, Madrid, Spain, 3Centro Nacional de Aceleradores, Seville, Spain
PO2036 Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices
Radek Žemlička1, Mojmír Jílek2, Petr Vogl2, Pavel Souček1, Vilma Buršíková1, Petr Vašina1
1Faculty of Science, Masaryk University, Brno, Czech Republic, 2PIVOT a.s., Šumperk, Czech Republic
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PO2038 Sputtered oxide layers for cast iron milling
Joern Kohlscheen1
1Kennametal, Essen, Germany
PO2039 Impact of molybdenum on structure, mechanical and tribological properties and thermal stability of Cr1-xAlxN coatings
Fedor Klimashin1, Jörg Paulitsch1, Paul H. Mayrhofer1
1Vienna University of Technology, Vienna, Austria
PO2040 Enhanced shielding surface technologies to improve vacuum processes performances
Olivier Marchand1, Frank Friedrich1, Reed Rosenberg2, Yoann Danlos3
1Cleanpart GmbH, Asperg, Germany, 2Cleanpart, Phoenix, United States, 3IRTES-LERMPS Université de Technologie de Belfort Montbéliard, Belfort, France
PO2041 Structural and magnetic properties of Heusler Rh2MnZ, Z=Al, Bi epitaxial thin films fabricated by DC magnetron sputtering.
Jan Lancok1, Oleg Heczko1, Jiri Bulir1, Vaclav Drchal1, Josef Kudrnovsky1, Stanislav Cichon1, Vladimir Chab1, Jaroslav Hamrle2, Jindrich Musil3
1Institute of Physics AS CR, Prague, Czech Republic, 2VSB - Technical University of Ostrava, Ostrava, Czech Republic, 3Department of Physics University of West Bohemia, Pilsen, Czech Republic
PO2042 Exploiting the material-specific current-voltage-pressure relationship of the reactive magnetron discharge for the growth of transparent conductive (Al,Ga) doped ZnO and Nb doped TiO2 layers
Steffen Cornelius1, Mykola Vinnichenko2, Wolfhard Möller1
1Helmholtz-Zentrum Dresden-Rossendorf e.V, Dresden, Germany, 2Fraunhofer-Institut für Keramische Technologien und Systeme, IKTS Dresden, Dresden, Germany
PO2043 Effects of Thickness on the Electrical, Structural and Optical Properties of ZnO:Al Thin Films Grown by RF Magnetron Sputtering Deposition.
RAHMANE Saâd1, Aïda Mohamed Salah2, Djouadi Mohamed Abdou3, Barreau Nicolas3
1University of Biskra, biskra, Algeria, 2Université Mentouri, Constantine, Algeria, 3Université de Nantes, Nantes, France
PO2044 Stable & High Quality Al doped ZnO Films with ICP assisted Facing Targets Sputtering at Low Temperature
Hye Ran KIM1, Yoon Seok CHOI1, Jeon Geon HAN1
1CAPST, IPNM, Sungkyunkwan University, Suwon, South Korea
PO2045 High rate dc magnetron sputtering
Alexander Pal1, Valery Mitin2, Alexander Parfinovich3, Alexey Ryabinkin1, Alexander Serov4
1SINP, Moscow State University, Moscow, Russia, 2VNIINM, Moscow, Russian Federation, 3Naco Technologies, Riga, Latvia, 4SINP, Moscow State University, Moscow, Russian Federation
PO2046 Mechanical and tribological properties of magnetron sputtered (Ti,Al,V)N nitride films
Jan Prochazka1, Radomir Cerstvy1, Zbynek Soukup1, Jindrich Musil1
1University of West Bohemia, Plzen, Czech Republic
Asmae HAMZAOUI1, Sébastien BEGOC2, Philippe NIVET3, Frédéric SANCHETTE4, Alain BILLARD1
1IRTES_LERMPS_UTBM, Belfort, France, 2CENTRE NATIONAL D'ETUDES SPATIALES (Cnes), Paris, France, 3Snecma (SAFRAN), Vernon, France, 4Institut Charles Delaunay-Laboratoire des Systèmes Mécaniques et d’Ingénierie Simultanée (LASMIS), Nogent, France
PO2048 Influence of the post-annealing temperature on optoelectronic properties of magnesium doped Cu-Cr-O thin films
1IRTES-LERMPS, UTBM, Belfort cedex, France, 2Institut Charles Delaunay, Laboratoire des Systèmes Mécaniques et d’Ingénierie Simultanée UMR CNRS 6279–UTT, Nogent, France
PO2049 Long cylindrical magnetron with dynamic magnetic field
Marek Betiuk1
1Institute of Precision Mechanics, Warszawa, Poland
PO2050 Discharge characteristics of metallic targets in reactive magnetron sputtering: A comparative study of the reactive gases O2, N2, H2S and H2Se
Jonas Schulte1, Klaus Ellmer1
1HZB Berlin, Berlin, Germany
PO2051 A Classical Controller Design Approach to the Reactive Sputtering Control Problem
Joseph Brindley1, Benoit Daniel1, Victor Bellido-Gonzalez1
1Gencoa Ltd, Liverpool, United Kingdom
PO2052 Influence of hydrogen injection on the deposited SiCxNy:H films in reactive magnetron sputtering plasma
Ahmad Ahmad1, Amanda Thouvenin2, robert Hugon2, Ludovic de Poucques2, damien Genève2, jean luc Vasseur2, Mouhamed Blemahi2
1Institut Jean Lamour, Nancy, France, 2IJL/université de lorraine, VANDOEUVRE LES NANCY CEDEX, France
PO2053 A TUBE (InTerconnection under UHV of ChamBers for Elaboration, and Characterization for Novel Materials) FOR MULTI-MATERIAL GROWTH AND MULTI-TECHNIC CHARACTERIZATION UNDER ULTRA HIGH VACUUM
Maud JULLIEN1, Stéphane MANGIN1, Danielle PIERRE1
1Institut Jean Lamour, VANDOEUVRE LES NANCY CEDEX, France
PO2054 Magnetron discharge with liquid metal cathode for high rate film deposition
Alexander Tumarkin1, Georgy Khodachenko1, Mikhail Zibrov1, Andrei Kaziev1
1NRNU MEPhI, Moscow, Russia
Pavel Baroch1, Jiří Čapek1, Jiří Rezek1, Petr Zeman1
1University of West Bohemia, Plzeň, Czech Republic
PO2056 Oxygen impurity related hardening mechanisms of Ti-Al-N thin films
Helmut Riedl1, Christian Koller1, Richard Rachbauer2, Szilard Kolozsvári3, Francisca Mendez Martin4, Paul H. Mayrhofer5
1TU Wien, Wien, Austria, 2Oerlikon Balzers Coating AG, Balzers, Liechtenstein, 3Plansee Composite Materials GmbH, Lechbruck am See, Germany, 4Department of Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Leoben, Austria, 5Vienna University of Technology, Vienna, Austria

Poster - Electrical and magnetic coatings

PO2057 BiVO4 Photoanodes for Efficient Water Splitting, Deposited by Reactive Magnetron Cosputtering
Klaus Ellmer1, Haibo Gong1, Norman Freudenberg1, Man Nie1
1Helmholtz-Zentrum Berlin, Berlin, Germany
PO2058 Deposition of semiconductor Fe2O3 and WO3 thin films for water splitting application.
Zdenek Hubicka1, Stepan Kment1, Martin Cada1, Jiri Olejnicek1, Michaela Brunclikova1
1Institute of Physics ASCR, Prague, Czech Republic
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PO2060 The Optimization of the deposition parameters to prepare Cd2SnO4 by RF Magnetron Sputtering from Powder targets
YanWen Zhou1, ShengLi Li2, Jing Li3
1Uni. of Science and Technology Liaoning, Anshan, Liaoning, China, 2University of Science & Technology Liaoning, Anshan Liaoning, China, 3University of Science & Technology Liaoning, Anshan, Liaoning, China
PO2061 Physical and Functional Characterization of Iron Pyrite (FeS2) Grown from Iron Hematite (α-Fe2O3)
Stepan Kment1, Zdenek Hubicka2, Natale Ianno3, Rodney Soukup3, Amitabha Sarkar3, Hana Kmentova4, Josef Krysa5, Jiri Olejnicek6, Martin Cada7
1Institue of Physics AS CR, Prague, Czech Republic, 2Institute of Physics AS CR, Prague, Czech Republic, 3University of Nebraska - Lincoln, Lincoln, United States, 4Institute of Chemical Process Fundamentals ASCR, Prague, Czech Republic, 5Institute of Chemical Technology Prague, Prague, Czech Republic, 6Institute of Physics ASCR, Prague, Czech Republic, 7Institute of Physics AS CR, Prague, Czech Republic
PO2062 Cu(In,Ga)Se2 deposited by hybrid sputtering process: how plasma study allows controlling the thin film structure and properties
Jorge Posada1, Marie Jubault2, Angélique Bousquet3, Eric Tomasella3, Daniel Lincot2
1Institute of RaD on Photovoltaic Energy, Chatou, France, 2Institute of R&D on Photovoltaic Energy, Chatou, France, 3Institute of Chemistry of Clermont - Ferrand, Aubière, France
PO2063 State of the art encapsulation of humidity sensitive electronic devices – Organic photovoltaic encapsulation
Pavel Kudlacek1, H. B. Akkerman1, W. A. Groen1
1Holst Centre, Eindhoven, Netherlands
PO2064 Growth of NiO thin films by reactive sputtering: roles of oxygen partial pressure and total pressure
Yong Wang1, Jaafar Ghanbaja1, Flavio Soldera2, Andre Mezin1, David Horwat1, Frank Mücklich2, Jean-Francois Pierson1
1Institut Jean Lamour, Nancy, France, 2Department for Materials Science, Functional Materials, Saarland University, Saarbrücken, Germany
PO2065 Photocatalytic nitrogen doped TiO2 thin films prepared by hybrid PLD technique at low temperature
Jan Mikšovský1, Jan Remsa2, Miroslav Jelínek3
1FBME CTU in Prague, Kladno, Czech Republic, 2Czech Technical University in Prague, Faculty of Nuclear Sciences and Physical Engineering, Prague, Czech Republic, 3Institute of Physics ASCR, v. v. i., Prague, Czech Republic
PO2066 Transparent and Conductive ZnO:Al Thin Film Deposited by Spray Pyrolysis and Magnetron Sputtering methods.
RAHMANE Saâd1, Bdirina Madani2, Ben Temam Hachemi2, Aïda Mohamed Salah3, Djouadi Mohamed Abdou4
1University of Biskra, biskra, Algeria, 2Université de Biskra, Biskra, Algeria, 3Université Mentouri, Constantine, Algeria, 4Université de Nantes, Nantes, Algeria
Asdrubal Ramirez1, Gerardo Gordillo1
1National University of Colombia, Bogotá, Colombia
PO2068 Total pressure effect on the structure and the properties of CuS sputtered films
aurelien didelot1, Patrice Miska1, Jean Francois Pierson1
1Institut Jean Lamour, Nancy, France
PO2069 PVD and PACVD for the deposition of coatings for flexible electronic devices
Parnia Navabpour1, Joanne Stallard1, Kevin Cooke1, Sue Field1, Alexander Goruppa2, Katrin Zorn2, Andreas Klug3, Emil List-Kratochvil3, Katrin Koren4
1Teer Coatings Ltd, Miba Coating Group, Droitwich, United Kingdom, 2High Tech Coatings, Miba Coating Group, Vorchdorf, Austria, 3NanoTecCenter Weiz, Weiz, Austria, 4NanoTecCenter Weiz / TU Graz, Weiz, Austria
PO2070 Electrochemical hydrogen insertion in substoechiometric titanium carbide TiCx thin films
Julien Nguyen1, Cédric Jaoul1, Nicolas Glandut1, Pierre Lefort1
1Université de Limoges - CNRS - SPCTS, Limoges, France
PO2071 Non-reversible charge-discharge behavior in ruthenium nitride thin films used as negative electrode in Li-ion batteries
Jean-François PIERSON1, Said BOUHTIYYA1, Barbara LAIK2, Sylvie MIGOT1, Fabien CAPON1, Jean-Pierre PEREIRA RAMOS2
1Institut Jean Lamour, Nancy, France, 2ICMPE, Thiais, France
PO2072 Thin AlN films deposited by reactive HiPIMS and pulsed DC sputtering – a comparative study
Tomas Kubart1, Ilia Katardjiev2, Milena Moreira3
1Uppsala University, Uppsala, Sweden, 2The Ångström Laboratory, Uppsala University, Uppsala, Sweden, 3Center for Semiconductor Components (CCS), University of Campinas, Campinas-SP, Brazil
PO2073 Nanocomposite Fe-Zr-N and Fe-Ti-B thin films with improved magnetic characteristics
Philipp Kiryukhantsev-Korneev1, Elena Sheftel2, Pavel Trukhanov1, Valentin Tedzhetov2, Evgeny Harin2, Evgeny Levashov1
1National University "MISIS", Moscow, Russia, 2Baikov IMET RAS, Moscow, Russian Federation

Poster - Physical vapor deposition - PVD

PO2074 Influence of magnetic-coil voltage and frequency on structures, mechanical and tribological performances of AlCrN coatings deposited by multi-arc ion plating
Shihong Zhang1, Zhong Chen1, Qimin Wang2, Sikchol Kwon1
1Anhui University of Technology, Maanshan, China, 2Guangdong University of Technology, Guangzhou, China
PO2075 Effect of Multi-arc Ion Plating Chromium Coatings on Oxidation Resistance Of TiAl Intermetallics
Xiangfei Wei1, Pingze Zhang1, Dongbo Wei1, Xiaohu Chen1, Ya Wang1, Baozhang Duan1, Jian Song1
1NUAA, Nanjing, China
PO2076 Influence of Ti-Si cathode grain size on the cathodic arc process and resulting Ti-Si-N coatings
Jianqiang Zhu1, M. P. Johansson-Jöesaar2, P. Polcik3, J. Jensen1, G. Greczynski1, L. Hultman1, M. Odén1
1IFM, Linköping University, Linköping, Sweden, 2Seco tools, Fagersta, Sweden, 3Plansee Composite Materials GmbH, Lechbruck am See, Germany
PO2077 Effect of cathode composition on macroparticle generation in DC arc plasma from Ti-Al, Ti-Si, Ti-C, Ti-W, and Mo-Cu compound cathodes.
Igor Zhirkov1, Johanna Rosen2
1Linkoping University, Linkoping, Sweden, 2Linköping University, Linkoping, Sweden
PO2078 TiO2 films synthesis by atmospheric pressure PECVD using an Axial Injection Torch
Gazal Yoan1, Christelle Dublanche-Tixier1, Christophe Chazelas1, Pascal Tristant1, Maggy Colas1, Etienne Laborde1, Pierre Carles1, Yann Launay2, Christophe Le Niniven1
1SPCTS - CNRS, Limoges, France, 2GEMH - ENSCI, Limoges, France
PO2079 Atmospheric plasma deposition as an alternative method of boron coatings formation for large area neutron detectors
Andriy Styervoyedov1, Svyatoslav Alimov1, Jörg Schleuer1, Thomas Wilpert1
1Helmholtz Zentrum Berlin, Berlin, Germany
PO2080 Ion Beam Sputtering of Ag - Correlation of Process Parameters, Secondary Particle Properties and Thin Film Properties
René Feder1, Carsten Bundesmann1, Jürgen Gerlach1, Horst Neumann1, Bernd Rauschenbach1
1IOM Leipzig, Leipzig, Germany
PO2081 Development of Ion Energy Analyzer for Linear Anode Layer Ion Source
Hu Wang1, Yudong Feng1, Yi Wang1, Zhimin Wang1, Kai Zhao1, Xiaomei Su1, Miao Yang1
1Lanzhou Institute of Physics, Lanzhou, China
PO2082 The Study of Plasma Characteristics on Ion Beam Assisted Reactive Magnetron Sputtering System
Xuelei Li1, Yudong Feng2, Yi Wang2, Zhimin Wang2, Kai Zhao2, Jinxiao Wang2, Miao Yang2
1Lanzhou Institute of Physics, Lanzhou, China, 2Science and Technology on Surface Engineering Laboratory, Lanzhou Institute of Physics, Lanzhou, China
PO2083 B4C Sputtered Coatings on Resistive Plate Chambers for Neutron Detection
Luís Margato1, Francisco Fraga2, Cristina Louro3
1LIP-Coimbra, Dep. Física, Univ. Coimbra, Coimbra, Portugal, 2LIP-Coimbra, Dep. of Physics, University of Coimbra, Coimbra, Portugal, 3SEG-CEMUC, Mechanical Eng. Dep., University of Coimbra, Coimbra, Portugal
PO2084 AlCrN/VN nanolayered thin films synthesized by cathodic arc deposition for high-temperature friction reduction
Mohammad Arab Pour Yazdi1, fernando lomello2, Michel Tabarant3, Frederic Sanchette4, Frederic Schuster5, Alain Billard2
1IRTES-LERMPS-UTBM, Belfort, France, 2LRC CEA- UTBM LIS-HP, site de Montbéliard,, Belfort cedex, France, France, 3DEN/DANS/DPC/SEARS/LISL CEA Saclay,, Gif-sur-Yvette,, France, 44Institut Charles Delaunay, Laboratoire des Systèmes Mécaniques et d’Ingénierie Simultanée – UMR CNRS 6281, LRC NICCI, CEA-ICD-LASMIS-UTT, UTT, Antenne de Nogent-52, Pôle Technologique de Haute-Champagne,, Nogent,, France, 5CEA Cross-Cutting Program on Advanced Materials, Saclay,, Gif-sur-Yvette, France
PO2085 Photoactivity of titanium dioxide films grown by cathodic arc doped with Cu and N
Ariel Kleiman1, Darina Manova2, Stephan Mändl2, J. Martín Meichtry3, Marta I. Litter3, Adriana Márquez4
1INFIP, CONICET-UBA, Buenos Aires, Argentina, 2Leibniz Institute of Surface Modification, Leipzig, Germany, 3Comisión Nacional de Energía Atómica, San Martín, Prov. Buenos Aires, Argentina, 4INFIP, Buenos Aires, Argentina
PO2086 Influence of Zirconium on thermal stability and mechanical properties of arc evaporated Ti-Al-N hard coatings
Stefan Albert Glatz1, Robert Hollerweger1, Richard Rachbauer2, Szilárd Kolozsvári3, Jörg Paulitsch1, Paul H. Mayrhofer1
1TU Wien, Vienna, Austria, 2Oerlikon Balzers Coating AG, Balzers, Liechtenstein, 3Plansee Composite Materials GmbH, Lechbruck am See, Germany
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PO2088 Surface Deposition of Hard Silica-like Layers by a Coplanar Surface Barrier Discharge using HMDSO
Martin Bellmann1, Jennifer Hoffmeister2, Ghiath Jnido2, Wolfgang Viöl1
1Fraunhofer IST/HAWK, Göttingen, Germany, 2HAWK, Göttingen, Germany
PO2089 Application of atmospheric plasmas to enhance the properties of carbon fibre reinforced epoxy composites
Kate O'Flynn1, Peter Dobbyn2, Denis P. Dowling2
1University College Dublin, Dublin 4, Ireland, 2School of Mechanical and Materials Engineering, University College Dublin, Ireland, Dublin, Ireland

Poster - Antibacterial applications and sterilization

PO2090 Influence to colonization on Escherichia coli by applying electric field and plasma to nutrient agar
Tsukasa Isogai1, Hiroyuki Kousaka1, Noritsugu Umehara1
1Nagoya University, Nagoya, Japan
PO2091 Treatment of seeds by microwave plasma discharge
Petr Bartos1, Pavel Kriz 2, Petr Spatenka2, Marta Horakova2, Jan Ptacnik3, Pavel Olsan2, Zbynek Havelka2
1University of South Bohemia, Ceske Budejovice, Czech Republic, 2University of South Bohemia, Pedagogical Faculty, Department of Applied Physics and Technology, Ceske Budejovice, Czech Republic, 3University of West Bohemia in Pilsen, Faculty of Applied Sciences, Department of Physics, Plzen, Czech Republic
PO2092 Liquid Phase Inactivation of Bacillus spores Using a Atmospheric Pressure Low-Temperature Plasma
Bo Yang1, Yun Ma1, Qingsong Yu2, Mengshi Lin2, Azlin Mustapha2
1Xi'an Shiyou University, Xi`an, China, 2University of Missouri, columbia, United States
PO2093 Plasma Decontamination of Cork Stoppers to Prevent Cork Taint
Martina Leins1, Joachim Schneider2, Antonio Llaverias3, Arturo Portugal3, Stéphane Boutou4, Albert Biswanger5, Andreas Schulz1, Matthias Walker1, Thomas Hirth1
1IGVP Uni Stuttgart, Stuttgart, Germany, 2MUEGGE GmbH, Reichelsheim, Germany, 3Ateknea Solutions, Cornellà de Llobregat, Barcelona, Spain, 4LABORATOIRE EXCELL, Mérignac, Bordeaux, France, 5AFS Entwicklungs + Vertriebs GmbH, Horgau, Germany
PO2094 Inactivation of Candida albicans by cold atmospheric pressure plasma jet
Konstantin G. Kostov1, Aline C. Borges 2, Cristiane Y. Koga-Ito 2, Thalita M. C. Nishime 1, Vadym Prysiazhnyi 1, Roberto Y. Honda 1
1Universidade Estadual Paulista - UNESP, Guaratinguetá, Brazil, 2Institute of Science and Technology - ICT, UNESP, São José dos Campos, Brazil
PO2095 Reduction of microorganism from eggshell of table and hatching eggs by atmospheric plasma
Maike Moritz1, Claudia Wiacek1, Oliver Schlüter2, Jörg Ehlbeck3, Peggy Braun1
1Institut für Lebensmittelhygiene, Leipzig, Germany, 2Leibniz-Institut für Agrartechnik Potsdam-Bornim e.V., Potsdam, Germany, 3Leibniz-Institut für Plasmaforschung und Technologie e.V., Greifswald, Germany
Matteo Gherardi1, Giovanni Anceschi1, Simone Bianconi1, Francesca Cavrini1, Vittorio Colombo1, Romolo Laurita1, Paolo Sanibondi1, Augusto Stancampiano1, Anna Liguori1
1University of Bologna, Bologna, Italy
PO2097 Effect of Active Oxygen Species Generated by Low Pressure RF Oxygen Plasma on Antioxidative Substances in plants
Reoto Ono1, Shohei Uchida1, Satoshi Kitazaki1, Nobuya Hayashi1
1Kyushu University, Kasuga, Japan
PO2098 Growth Enhancement of Plant by Plasma and UV Irradiation to Seeds.
Shohei Uchida1, Reoto Ono1, Satoshi Kitazaki1, Nobuya Hayashi1
1Kyushu University, Kasuga, Japan
PO2099 Tuning the preferred growth orientation in reactively sputtered copper oxide thin films
Yong Wang1, Jaafar Ghanbaja1, Pascal Boulet1, David Horwart1, Flavio Soldera2, Frank Mücklich2, Jean-Francois Pierson1
1Institut Jean Lamour, Nancy, France, 2Department for Materials Science, Functional Materials, Saarland University, Saarbrücken, Germany
PO2100 Plasma enhanced supersonic inseminated jet deposition of hierarchical nanostructures for dye sensitized solar cells.
Francesco Fumagalli1, Giorgio Nava1, Marco Monti2, Luca Passoni1, Fabio Di Fonzo1
1Istituto Italiano di Tecnologia, milano, Italy, 2Politecnico di Milano, milano, Italy