Program



Thursday, September 16, 2010Poster Session, 15:15 - 16:25

Poster - Plasma characterization

PO4001 Influence of N2 and Ar on Charge-state-resolved ion energy distributions of arc plasma from Ti3SiC2 cathodes
Anders Eriksson1, Stanislav Mráz2, Jochen M. Schneider2, Johanna Rosén3
1Linköping University, Linköping, Germany, 2Materials Chemistry, RWTH Aachen University, Aachen, Germany, 3IFM, Linköping University, Linköping, Sweden
PO4002 Generation of positive and negative ions in magnetron discharge during reactive sputtering of alumina.
Petr Pokorny1, Jiri Bulir1, Jano Lancok1, Jindrich Musil1, Michal Novotny1
1Institute of Physics ASCR, v.v.i., Praha 8, CzechRepublic
PO4003 Characterization by mass spectrometry of microwave sources for atomic species production
Cédric Noël1, Thierry Belmonte1, Gérard Henrion1
1Institut Jean Lamour, Nancy, France
PO4004 Experimental investigations of silicon tetrafluoride decomposition in ECR discharge plasma
Dmitry Mansfeld1, Alexander Vodopyanov1, Sergei Golubev1, Petr Sennikov1
1Institute of applied physics, Nizhny Novgorod, RussianFederation
PO4005 Retarding field analysis of the time averaged and time resolved ion energy distribution at a biased electrode in a plasma discharge.
David Gahan1, Borislav Dolinaj1, Donal O'Sullivan1, Mike Hopkins1
1Impedans Ltd., Dublin, Ireland
PO4006 On the determination of energy fluxes in plasma processing by calorimetric probes
Holger Kersten1, Sven Bornholdt2, Marc Stahl2, Matthias Wolter2
1Universiity of Kiel, IEAP, Kiel, Germany, 2University of Kiel, IEAP, Kiel, Germany
PO4007 Energy influx measurements with the active thermal probe in several plasma-technological processes
Ruben Wiese1, Holger Kersten2
1INP Greifswald, Greifswald, Germany, 2Universität Kiel, Kiel, Germany
PO4008 Spatially resolved Langmuir probe measurements of a magnetically enhanced hollow cathode arc plasma
Burkhard Zimmermann1, Fred Fietzke1, Wolfhard Möller2
1Fraunhofer Institute FEP, Dresden, Germany, 2Institute of Ion Beam Physics and Materials Research, FZD, Dresden, Germany
PO4009 Langmuir probe diagnostics and deposition modelling of a carbon-tungsten thermionic vacuum arc system
Cristian P. LUNGU1, Aurelian MARCU1, Constantin GRIGORIU1, Ionut JEPU1, Corneliu POROSNICU1, Vasile TIRON2, Gheorghe POPA2
1NILPRP, Bucharest, Romania, 2Al I Cuza University, Iasi, Iasi, Romania
PO4010 Automated system for DC and RF plasma parameter determination by guard double electric probes
Rosendo Pena-Eguiluz1, Israel Alejandro Rojas-Olmedo2, Regulo Lopez-Callejas3, Anibal de la Piedad-Beneitez2, Raul Valencia-Alvarado3, Antonio Mercado-Cabrera3, Samuel Roberto Barocio Delgado3, Arturo Eduardo Muñoz-Castro3, Benjamin Gonzalo Rodriguez Mendez3
1Inst. Nac. de Investigaciones Nucleares, ocoyoacac, Mexico, Mexico, 2Instituto Tecnologico de Toluca, Metepec, Edo de Mexico, Mexico, 3Instituto Nacional de Investigaciones Nucleares, Ocoyoacac, Mexico, Mexico
PO4011 OES study of PEALD process in low temperature TiO2 film growth
Sanna Lehti1, David Cameron1, Tommi Kääriäinen1
1Lappeenranta University of Technology, Mikkeli, Finland
PO4012 OES monitoring of combined deposition of C/Al layers by PECVD/Magnetron Sputtering techniques
Tomy Acsente1, Ionita Eusebiu Rosini1, Cristian Stancu1, Ionita Maria Daniela1, Dinescu Gheorghe1
1National Institute for Laser, Plasma and Radiation Physics, Bucharest - Mgurele, Romania
PO4013 Optical emission spectroscopy of pulsed magnetron sputtering plasma
Mariusz ozimek1, Jan Ziaja1
1Wrocław University of Technology, Wrocław, Poland
PO4014 Time and space-resolved detection of NH and NH2-Radicals in a RF-driven microdischarge via planar laser induced fluorescence and pulsed cavity ring-down spectroscopy
Andreas Schenk1, Martin Visser1, Eduard Bossauer1, Karl-Heinz Gericke1
1Institut für Physikalische Chemie, Braunschweig, Germany
PO4015 Characterisation of the plasma plume of an IAD plasma source by means of optical emission spectroscopy
Jens Harhausen1, Ingo Meyenburg1, Andreas Ohl1, Rüdiger Foest1
1INP-Greifswald e.V., Greifswald, Germany
PO4016 Plasma characterization of RF magnetron sputtering of silver in Ne, Ar, Kr and Xe discharges
Michal Novotny1, Jiri Bulir1, Petr Pokorny1, Jan Lancok1
1Institute of Physics ASCR, Praha 8, CzechRepublic
PO4017 In-Line Analysis of DBD Plasma at Atmospheric Pressure while modifying Polymer Foil Surfaces
Sandra Günther1, Nico Teuscher1, Renate Hänsel2, Andreas Kiesow1, Andreas Heilmann1
1Fraunhofer IWM, Halle, Germany, 2Research Institute of Leather and Plastic Sheeting, Freiberg, Germany
PO4018 Plasma temperature and surface studies of argon-hydrogen containing low-temperature dumbbell form light sources
Atis Skudra1, Zanda Gavare1, Natalia Zorina1, Madara Zinge1
1Inst. of Atomic Physics and Spectroscopy, Riga, Latvia
PO4019 Plasma diagnostic on arc evaporation processes and influence of arc source design.
Siegfried Krassnitzer1, Juerg Hagmann1, Helmut Rudigier1
1OC Oerlikon Balzers AG, Balzers, Liechtenstein
PO4020 Optimisation of the atomic nitrogen production in the hollow cathode arc discharge
Achim Lunk1, Igor Vinogradov2
1Institut for Plasma Research/TGZ PA, Stuttgart, Germany, 2Institute for Plasma Research, Stuttgart, Germany
PO4021 Gas temperature measurement and flow dynamic simulation of low temperature atmospheric pressure plasma jet.
Abdollah Sarani1, Anton Yu Nikiforov2, Christophe Leys2
1Department of Applied Physics, Gent Univ, Gent, Belgium, 2Ghent University, Department of Applied Physics, Gent, Belgium
PO4022 A combined sensor for the diagnostics of plasma und film properties in magnetron sputtering processes
Thomas Welzel1, Klaus Ellmer1, Karsten Harbauer1
1Helmholtz-Zentrum Berlin, Berlin, Germany
PO4023 New Concepts of Process Control for Sputtering and magPECVD of Inorganic and Hybrid Coatings
Daniel Glöß1, Hagen Bartzsch2, Kerstin Täschner2, Peter Frach2, Eberhard Schultheiss2
1Fraunhofer FEP, Dresden, Germany, 2Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (FEP), Dresden, Germany
PO4024 Development of a sensor platform for control and optimization of industrial plasma processes
Volker Sittinger1, Oliver Werner1, Berthold Kühnert1, Szyszka Bernd1, Günter Bräuer1, Ruben Wiese2, Nino Voss2
1Fraunhofer IST, Braunschweig, Germany, 2INP Greifswald, Greifswald, Germany

Poster - Physical Vapour Deposition

PO4025 Managing Arcs in Large Area Sputtering Applications
Uwe Krause1, Dan Carter2
1Advanced Energy Industries GmbH, Filderstadt, Germany, 2Advanced Energy Industries Inc, Fort Collins, United States
PO4026 Deposition of Large Area Multilayer Coatings for High End Optics
Dirk Rost1, Michael Zeuner1, Andreas Seifert1, Matthias Nestler1, Stefan Braun2, Andreas Leson2, Peter Gawlitza2, Maik Menzel2
1Roth&Rau MicroSystems GmbH, Hohenstein-Ernstthal, Germany, 2IWS Dresden, Dresden, Germany
PO4027 Alpha PVD deposition systems (Eifeler/Vacotec) as a basis for research and industry
Hynek Hrubý1, Milan Ruzicka1, Marcus Lartz1, Susanne Meyer1, Jürgen Anklam2
1Eifeler Werkzeuge GmbH, Düsseldorf, Germany, 2VACOTEC S.A., La Chaux-de-Fonds, Germany
PO4028 Deposition of complex materials using powder targets
Francis Boydens1, Stijn Mahieu1, Diederik Depla1
1Ghent University, Gent, Belgium
PO4029 Analysis of the behaviour of the reactive species in reactive magnetron sputtering of oxides
Wouter Leroy1, Stijn Mahieu1, Rosita Persoons2, Diederik Depla1
1Ghent University, Gent, Belgium, 2VITO, Mol, Belgium
PO4030 Suppressed hysteresis behaviour of Ti sputtering in acetylene gas
Petr Vasina1, Tereza Schmidtova1, Marek Eliás1
1Masaryk University, Brno, CzechRepublic
PO4031 Suppression of arcing in DC pulse reactive magnetron sputtering
Michal Meissner1, Pavel Baroch1, Jindrich Musil1
1University of West Bohemia, Plzen, CzechRepublic
PO4032 Influence of the oxygen flow rate and substrate temperature on the deposition of crystallised TixO2x-1 coatings
Frédéric Lapostolle1, Yunfang Gui1, Alain Billard1
1LERMPS UTBM, Belfort, France
PO4033 The Effects of Varying Process Gas on the Growth of Thin Conducting Films
Glen West1, Peter Kelly1
1Manchester Metropolitan University, Manchester, UnitedKingdom
PO4034 Effect of the deposition process and the substrate nature on the properties of sputtered lanthanum cuprate films
Nolwenn Tranvouez1, Jean-Francois Pierson2, Fabien Capon2, Jean-Philippe Bauer2
1INPL/IJL, nancy, France, 2IJL, nancy, France
PO4035 Effect of substrate material on surface morphology of thin films prepared by nonreactive magnetron sputtering
Pavel Baroch1, Tomas Kozak1, Jindrich Musil1
1University of West Bohemia, Department of Physics, Plzen, CzechRepublic
PO4036 Gravitational approach of the structure of droplets in an arc evaporation PVD process: a telluric model
Alexandre Mège-Revil1, Philippe Steyer2, Jean-François Pierson3
1Institut Jean Lamour, Nancy, France, 2INSA Lyon, laboratoire MATEIS-RI2S, Villeurbanne, France, 3Institut Jean Lamour - Ecole des Mines de Nancy - Département CP2S, Nancy, France
PO4037 Effects of dual arc source coatings on PVD process
Kwang Soo Park1, Jong Won Park1, Kyung Hwang Lee1
1RIST, Ulsan, SouthKorea
PO4038 Plasma deposition effect on laser melted Ti coated substrate
Catherine Cordier-Robert1
1Université de Lille1 - UMET, Villeneuve d'Ascq cedex, France

Poster - Conductive and Catalytic Oxides

PO4039 Influence of Al concentration on structure and electrical properties of polycrystalline and epitaxial Al-doped ZnO films grown by reactive pulsed magnetron sputtering
Steffen Cornelius1, Mykola Vinnichenko1, Andreas Kolitsch1, Wolfhard Möller1
1Forschungszentrum Dresden-Rossendorf, Dresden, Germany
PO4040 Comparative study of the optical an electrical performance of transparent conductive ZnO deposited by sol-gel and reactive magnetron sputtering
Ramon Escobar Galindo1, Miriam Yuste1, Jose de Jesus Araiza2, Olga Sanchez1, Hugo Tototzintle2, Carlos Palacio3
1Instituto Ciencia Materiales Madrid, Madrid, Spain, 2Universidad Autonoma de Zacatecas, Zacatecas, Mexico, 3Universidad Autonoma de Madrid, Madrid, Spain
PO4041 Influence of the impinging angle and of the Aluminium content on the electrical resistivity of transparent ZnO coating elaborated by DC magnetron sputtering
Pascal BRIOIS1, Alain BILLARD1
1LERMPS-UTBM, Belfort, France
PO4042 Pretreatment of glass substrates by low energy ion beam for as-sputtered textured zinc oxide thin films
Wendi Zhang1, Eerke Bunte1, Astrid Besmehn2, Florian Ruske3, Dominik Köhl4, Janine Worbs1, Hilde Siekmann1, Jürgen Hüpkes1
1IEF-5, Forschungszentrum Jülich, Jülich, Germany, 2Zentralabteilung für Chemische Analysen, Forschungszentrum Jülich, Jülich, Germany, 3Institute Silicon Photovoltaics, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Berlin, Germany, 4I. Physikalisches Institut IA, Rheinisch-Westfaelische Technische Hochschule Aachen, Aachen, Germany
PO4043
1, ,
PO4044 Improvement of Transparent Conductive Oxide films by low-temperature, atmospheric-pressure plasma annealing
Hans Winands1, Mirjam Theelen1, Ariël de Graaf1, Joop van Deelen1, Paul Poodt1
1TNO Science and Industry, Eindhoven, Netherlands
PO4045 TiOx films as transparent self-cleaning oxidation protection coatings on metals
Alessandro Patelli1, Simone Vezzu'1, Marino Colasuonno1, Lorenzo Zottarel1, Alessandro Martucci2, Stefano Costacurta1
1CIVEN, Marghera - Venezia, Italy, 2Universita' di Padova, Padova, Italy
PO4046 Effect of Spray Parameters on Photocatalytic Properties of Plasma Sprayed Nanostructured TiO2 Coating
Maryamossadat Bozorgtabar1, Mohammadreza Rahimipour2, Mehdi Salehi3, Mohammadreza Jafarpour4
1Islamic Azad University, Majlesi Branch, Isfahan, Iran, 2Materials and Energy Research Center, Tehran, Iran, 3Department of Materials Eng., Isfahan University of Technology, Isfahan, Iran, 4Mobarakeh Steel Company, Isfahan, Iran
PO4047 Production of Photocatalytically Active Titania Layers onto Textiles at Ambient Temperature
Eva Maria Moser1, Sidney Chappuis1, Vincent Rivest1, Steve Röthlisberger1
1University of Applied Sciences of Geneva, Geneva, Switzerland
PO4048 Self- Cleaning and Anti- Microbial Transparent Photocatalytic Thin Films Prepared by Ion Assisted Deposition
Redouan Boughaled1, Henrik Ehlers1, Detlev Ristau1, Michael Wark2
1Laser Zentrum Hannover e.V., Hannover, Germany, 2Institute of Physical Chemistry, Leibniz University Hannover, Hannover, Germany
PO4049 Plasma Deposited Yttria stabilized Zirconia thin films for solid oxide fuel cells
Dimitrios Mataras1, Stelios Voyatzis1, Eleftherios Amanatides1, Dimitrios Mataras1
1University of Patras, Patras, Greece
PO4050 BaCe0.9-xZrxY0.1O3 thin film elaborated by reactive magnetron sputtering
mohammad Arab Pour Yazdi1, Pascal Briois1, Alain Billard2
1LERMPS/UTBM, Belfort, France, 2LERMPS-UTBM, Belfort, France
PO4051 Structural investigations of novel catalysts for oxygen reduction reaction produced by a dual plasma process
Christian Walter1, Volker Brüser1, Antje Quade1, Klaus-Dieter Weltmann1
1INP Greifswald, Greifswald, Germany
PO4052 TTHE EFFECT OF ANNEALING ON THE PROPERTIES OF ZnO:Al FILMS GROWN BY RF MAGNETRON SPUTTERING.
Saâd Rahmane1, Djouadi Mohamed Abdou2, Aida Mohamed Salah3, Barreau Nicolas2
1Laboratoire de Chimie Appliquée, Biskra, Algeria, 2Institut des Matériaux Jean Rouxel IMN UMR 6502, Université de Nantes, Nantes, France, 3Laboratoire des Couches minces et Interfaces, Université Mentouri, Constantine, Algeria
PO4053 Pulsed Reactive DC magnetron sputtered Tantalum Oxide (Ta2O5) thin films: Photocatalytic properties
Jagadeesh Kumar1, N Ravi Chandra Raju1, A Subrahmanyam1
1Indian Institute of Technology Madras, Chennai, India
PO4054 Optimization and up-scaling of hollow cathode gas flow sputter processes in the field of photocatalytic active coatings
Jens Mahrholz1, Jens Mahrholz1, Denise Koeßler1, Sergey Shikolenko1, Kai Ortner1, Frank Neumann1, Tobias Graumann1, Markus Höfer1, Bernd Szyszka1
1Fraunhofer IST, Braunschweig, Germany
PO4055 Structure and photocatalytic properties of Ti1-xWxO2 sputtered thin films
Grégory Abadias1, Aldo Gago-Rodriguez2, Nicolas Alonso-Vante2
1University of Poitiers, Chasseneuil-Futuroscope, France, 2LACCO, Université de Poitiers-CNRS, Poitiers, France
PO4056 Stability of TiO2 films modified by Ag and Pt nanoparticles
Pavlina Hajkova1, Jindrich Matousek2, Ondrej Hedanek3
1Technical University of Liberec, Liberec, CzechRepublic, 2J. E. Purkinje University, Department of Physics, Usti nad Labem, Czech Republic, 3Technical University of Liberec, Material Science, Liberec, Czech Republic

Poster - Nanostructures and Nanoparticles

PO4057 Nanostructured surfaces via atmospheric pressure glow discharge
Ian Coook1, David Sheel1, John Hodgkinson1
1University of Salford, Manchester, UnitedKingdom
PO4058 Deposition of nanostructures by chemical vapour deposition enhanced with an atmospheric pressure remote Ar-O2 plasma.
Grégory ARNOULT1, Thierry BELMONTE2, Gérard HENRION2
1Institut Jean LAMOUR- CP2S-Team 201, nancy, France, 2Institut Jean Lamour - CP2S - team 201, nancy, France
PO4059 Deposition of superhydrophobic structures by magnetron discharge
Stéphane Lucas1, Alexandre Felten1, JP Blondeau2, Fabrizio Maseri3, JJ Pireaux1, Valérie De Vriendt1
1University of Namur (FUNDP) - PMR, Namur, Belgium, 2Université d’Orléans - LESI, Chartres, Belgium, 3Arcelor Mittal Research & Development, Liège, Belgium
PO4060 Optimisation of PECVD parameters in order to obtain aluminium nitride nano-dots
Zakaria BOUCHKOUR1, Christelle Dublanche-Tixier1, Cédric Jaoul1, Elsa Thune1, Alexandre Boulle1, René Guinebretière1, Pascal Tristant1
1Université de Limoges, CNRS, SPCTS, Limoges, France
PO4061 Analytical model for electrical resistivity of GLAD thin films
Aurélien Besnard1, Nicolas Martin1
1Institut FEMTO-ST, Besançon, France
PO4062 Engineering and Characterization of Si Nano-Columns by Oblique Angle Deposition
Levent Trabzon1, Sebahattin Guvendik1, Huseyin Kizil1
1Istanbul Technical University, Istanbul, Turkey
PO4063 On the role of supporting material and catalyst for growth of carbon nanotubes in microwave torch
Lenka Zajickova1, Ondrej Jasek2, Petr Synek2, Marek Elias2, Vit Kudrle2, Jaroslav Hubalek3, Jan Prasek3, Renata Hanzlikova4, Nadezda Pizurova5
1Masaryk University, Brno, CzechRepublic, 2Dept Phys Electronics, Masaryk University, Brno, Czech Republic, 3Dept Microelectronics, Brno University of Technology, Brno, Czech Republic, 4Inst Sci Instruments, Academy of Science of the Czech Republic, Brno, Czech Republic, 5Inst Phys Mater, Academy of Sciences of the Czech Republic, Brno, Czech Republic
PO4064 Growth and plasma surface modifications of vertically aligned carbon nanotube forests
Jean-François Colomer1, Moreau Nicolas2, Thomas Godfroid3, Rony Snyders3, Carla Bittencourt3, Jean Pol Vigneron2, Stephane Lucas2
1University of Namur (FUNDP) - PMR, Namur, Belgium, 2University of Namur (FUNDP) - PMR, Namur, Belgium, 3Materia Nova - University of Mons, Mons, Belgium
PO4065 Surface modification of Multi Wall Carbon Nanotubes by a hollow cathode discharge.
Christophe Rigaux1, Stephane Lucas2
1Nanocyl R&D Department CNT Group, Sambreville, Belgium, 2University of Namur (FUNDP) – PMR, Namur, Belgium
PO4066 Carbon nanotube functionalization with a cold atmospheric pressure plasma jet and post-plasma reactions
Daniel Kolacyak1, Jörg Ihde1, Uwe Lommatzsch1
1Fraunhofer Institute, Bremen, Germany
PO4067 Functionalization of CNT arrays and ribbons by atmospheric pressure plasma
David DUDAY1, Rémy MAURAU1, Nicolas BOSCHER1, Jérôme GUILLOT1, Gilles FRACHE1, Patrick CHOQUET1, Jean Christophe LAMBRECHTS1, Mark SCHULZ2, Vesselin SHANOV2
1CRP Gabriel Lippmann, BELVAUX, Luxembourg, 2University of Cincinnati, Cincinnatti, United States
PO4068 Synthesis and characterization of carbon nanowalls layers with metallic nanoparticles inclusions
Sorin Vizireanu1, Silviu Daniel Stoica2, Bogdana Mitu2, Catalin Romeo Luculescu2, Gheorghe Dinescu2
1NILPRP, Bucharest/Magurele, Romania, 2National Institute for Laser, Plasma and Radiation Physics, Magurele, Romania
PO4069 TiO2 Coatings with Au Nanoparticles Analyzed by Photothermal Methods
Francisco Macedo1, Filipe Vaz2, Roberto Faria Jr.2, Marc Torrell2, Albano Cavaleiro3, Klaus Junge4, Bruno Bein4
1Universidade do Minho, Braga, Portugal, 2Universidade do Minho, Centro de Física, Campus de Gualtar, Braga, Portugal, 3SEC-CEMUC – Universidade de Coimbra, Eng. Mecânica, Polo II, Coimbra, Portugal, 4Solid State Spectroscopy, Physics & Astronomy, Ruhr-University, Bochum, Germany
PO4070 Plasma functionalization of multi-scale structured surfaces to control the formation of ice crystals
Michael Haupt1, Stefan Jung2, Volker Weiss3, Markus Rullich3, Christof Koehler3, Thomas Frauenheim3, Hannelore Benien2, Franz Gammel2, Heinz Hilgers4, Christian Oehr1
1Fraunhofer IGB, Stuttgart, Germany, 2EADS Innovation Works, Munich, Germany, 3Bremen Center for Computational Materials Science, Bremen, Germany, 4Cerobear GmBH, Herzogenrath, Germany
PO4071
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PO4072 Particle agglomeration in dusty plasmas, numerical modeling and experiments
Simon DAP1, David LACROIX2, Robert HUGON1, Fabrice PATISSON3, Frédéric BROCHARD1, Ludovic de POUCQUES1, Jamal BOUGDIRA1
1IJL, Faculté des sciences et Techniques, Vandoeuvre les Nancy cedex, France, 2LEMTA, Faculté des Sciences et Techniques, BP 70239, Vandoeuvre les Nancy cedex, France, 3IJL, Ecole des Mines - CS 14234, Nancy cedex, France
PO4073 In-situ diagnostics during nano-particle generation in process plasmas
Holger Kersten1, Morten Hundt2, Patrick Sadler2, Matthias Wolter2
1Universiity of Kiel, IEAP, Kiel, Germany, 2University of Kiel, IEAP, Kiel, Germany
PO4074 Gas aggregation nanocluster source - reactive depositions of copper and titanium nanoclusters
Ales Marek1, Jan Valter1, Stanislav Kadlec1, Jiri Vyskocil1
1HVM Plasma, spol. s r.o., Prague, CzechRepublic
PO4075
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PO4076 Self-assembled Ag nanoparticles on ion sputtered GaSb dot pattern
MUKESH RANJAN1, Jing Zhou1, Monika Fritzsche1, Stefan Facsko1, Wolfhard Möller1
1Forschungszentrum Dresden-Rossendorf, Dresden, Germany

Poster - Mechanical Film Properties

PO4077 Modeling of Residual Stresses in TBC Coated Gas Turbine Blades
IMDAT TAYMAZ1, Yasar Kahraman2, Fatih Ustel3, Kemal Cakir2
1SAKARYA UNIVERSITY, MECHANICAL ENG. DEPT, SAKARYA-ADAPAZARI, Turkey, 2Sakarya University, Sakarya-Adapazari, Turkey, 3Sakarya University,Metallurgical Eng. Dept., Sakarya-Adapazari, Turkey
PO4078
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PO4079 Investigation of the application of plasticity size effects for practical tribological advantage.
Nigel Jennett1, Xiaodong Hou1
1National Physical Laboratory, Teddington, UnitedKingdom
PO4080 Evaluation of Mechanical Properties of DLC Layers using the Resonant Ultrasound Spectroscopy and AFM tip
Tomas Kocourek1, Michal Ruzek2, Michal Landa2, Miroslav Jelinek1, Jan Remsa1
1Institute of Physics AS CR, Praha, CzechRepublic, 2Institute of Thermomechanics AS CR, Praha, Czech Republic
PO4081 Mechanical properties and fatigue behavior of Co-depleted WC-Co surface prepared for diamond coating depsition
Shoji Kamiya1, Shoji Kamiya1, Hiroyuki Hanyu2
1Nagoya Institute of Technology, Nagoya, Japan, 2OSG Corporation, Toyokawa, Japan
PO4082
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PO4083 Correcting time dependent displacements effects in nanoindentation analysis
Norbert Schwarzer1, Michael Davies2, Nicola Everitt2, Ben Beake3
1Saxonian Institute of Surface Mechanics, Ummanz / Rügen, Germany, 2University of Nottingham, Nottingham, United Kingdom, 3Micro Materials Ltd., Wrexham, United Kingdom
PO4084 Advanced scratch test methods in combination with elastic stress calculations - a new tool for the failure analysis of coatings
Thomas Chudoba1, Norbert Schwarzer2
1ASMEC GmbH, Radeberg OT Rossendeorf, Germany, 2Sächsisches Institut für Oberflächenmechanik, Ummanz, Germany
PO4085 Instrumentational developments in triboanalysis of PVD coatings
Alexander Minewitsch1, Maxim Krasnensky1
1TTZH GmbH, Garbsen, Germany
PO4086 ON MEASUREMENT UNIFORMITY AT CHARACTERIZATION OF MECHANICAL AND TRIBOLOGICAL PROPERTIES OF NANOSTRUCTURED FILMS
Mikhail Petrzhik1, Marina Tyurina1, Nina Kozlova1, Eugeny Levashov1
1"MISiS", Moscow, RussianFederation
PO4087 Influence of substrate hardness on deformation mechanisms in TiN plastically deformed by nanoindentation analyzed by TEM
Magdalena Parlinska-Wojtan1, Dominik Jaeger2, Michael Stiefel3, Kilian Wasmer4, Joerg Patscheider2
1Center of Electron Microscopy, Empa, Duebenedorf, Switzerland, 2Nanoscale Materials Science, Empa, Duebendorf, Switzerland, 3Electronics/Metrology/Reliability Laboratory, Empa, Duebendorf, Switzerland, 4Advanced Materials Processing, Empa, Thun, Switzerland
PO4088 Innovative Method for examinating multiple thin film properties.
Wolfgang P. Weinhold1, Andreas M. Zoll1
1Innowep GmbH, Würzburg, Germany
PO4089 Depth profile of mechanical properties for plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation
Rutul Trivedi1, L. Hoferek1, V. Cech1
1Brno University of Technology, Brno, CzechRepublic
PO4090 Mechanical Surface Stability and Reliability under High Temperature Fields
Nick Bierwisch1, Norbert Schwarzer1, Torsten Kirst
1SIO, Nordhausen, Germany
PO4091 Crack resistance of hard coatings
Manfred Schlögl1, Florian Rovere1, Paul H. Mayrhofer1
1Montanuniversität Leoben, Leoben, Austria

Poster - Plasma Modelling and Simulation

PO4092 Kinetic modelling of plasma enhanced chemical vapour deposition (PECVD) of BN-films
Achim Lunk1, Jens Matheis2, Yating Wu3
1Institut for Plasma Research/TGZ PA, Stuttgart, Germany, 2Institute for Plasma Research, Stuttgart, Germany, 3State Key Laboratory of Metal Matrix Composites, Shanghai Jiao Tong University, Shanghai, China
PO4093 Electron Monte Carlo model for a dual magnetron discharge, used for the sputter deposition of complex oxide layers
Maksudbek Yusupov1, Evi Bultinck1, Diederik Depla2, Annemie Bogaerts1
1Research Group PLASMANT, Antwerp, Belgium, 2Department of Solid State Sciences, Ghent, Belgium
PO4094 Particle-in-cell simulation of a magnetized sheet plasma using a magnetron for sputtering enhancement
Henry ,Jr. Lee1, Leo Mendel Rosario2, Rommel Paulo Viloan3, Michelle Villamayor3, Roy Tumlos4, Henry Ramos3
1National Institute of Physics,, Metro Manila, Philippines, 2College of Arts, Science and Education, FEATI University, Manila, 1003, Philippines, 3National Institute of Physics, University of the Philippines, Quezon City, 1101, Philippines, 4Department of Science and Mathematics, University of the Philippines, Manila, 1000, Philippines
PO4095 Fluid modelling of the DC magnetron plasma under low pressure conditions
Lise Caillault1, Manivannane Pourouchottamane2, Tiberiu Minea1
1LPGP UMR 8578, Orsay, France, 2Saint-Gobain-Recherche, 39, quai Lucien-Lefranc BP 135, Aubervilliers, France
PO4096 Fixing the parameter set for reactive sputtering modelling
Koen Strijckmans1, Wouter Leroy2, Annemie Bogaerts3, Diederik Depla2
1UGent Dept. of Solid State Sciences, Gent, Belgium, 2Dept. of Solid State Sciences, Ghent University, Ghent, Belgium, 3Dept. of Chemistry, University of Antwerp, Antwerp, Belgium
PO4097 Material Processing in Chemically Active Plasmas
Stanislav Novak1, Pavel Cerny1, Rudolf Hrach1, Vera Hrachova2
1J. E. Purkinje University, Usti nad Labem, CzechRepublic, 2Charles University, Prague 8, Czech Republic
PO4098 Detailed study of plasma-substrate interaction in plasma-assisted technologies
Rudolf Hrach1, Vojtech Hruby2, Vera Hrachova2
1Charles Univ., Fac. Mathem. and Physics, Prague 8, CzechRepublic, 2Charles University, Faculty of Mathematics and Physics, Prague 8, Czech Republic
PO4099 Interaction of low-temperature plasma with fabric: study by computer simulations
Petr Bartos1, Petr Spatenka1, Michal Pekarek1
1University of South Bohemia, Ceske Budejovice, CzechRepublic
PO4100
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PO4101
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PO4102
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