Monday, September 12, 2016Poster Session, 15:15 - 16:45

Poster - Powders and Plasmas

PO1001 Design oriented modelling for the synthesis process of copper nanoparticles by a radio-frequency induction thermal plasma system
Matteo Gherardi1, Simone Bianconi1, Marco Boselli1, Vittorio Colombo1
1University of Bologna, Bologna, it

PO1002 High throughput, room temperature synthesis of cluster assembled silicon based nanostructured materials
Giorgio Nava1, Francesco Fumagalli2, Fabio Di Fonzo2
1Politecnico di Milano, Milano, it, 2Center for Nanoscience and Technology, Milano, Italy

PO1003 OES characterization of a nanoparticles source based on magnetron sputtering
Vanessa Orozco1, Cédric Jaoul1, Frédéric Dumas-Bouchiat1, Pascal Tristant1
1Université de Limoges, Limoges, fr

PO1004 Ag nanoparticles produced by DC magnetron sputtering applied to optical biosensor
Lucia Mendizabal1, Nestor Bolaños1, Eva Gutierrez- Berasategui1, Javier Barriga1
1IK4-TEKNIKER, Eibar, es

PO1005 Size control, transport, and collection of nanoparticles grown in pulsed hollow cathode discharge: Theory and modeling
Nils Brenning1, Iris Pilch2, Emil Kalered2, Lars Ojamäe2, Robert Boyd2, Rickard Gunnarsson2, Mohammad Hasan3, Ulf Helmersson2
1Linköping University, IFM, Linköping, se, 2Linköping University, IFM-material physics, Linköping, Sweden, 3Electrical Engineeering & Electronics, University of Liverpool, Liverpool, United Kingdom

PO1006 Size control, transport and collection of nanoparticles grown in pulsed hollow cathode discharge: Experiments.
Sebastian Ekeroth1, Rickard Gunnarsson1, Sadegh Askari1, Iris Pilch1, Nils Brenning1, Robert Boyd1, Ulf Helmersson1
1Linköping University, Linköping, se

PO1007 Mass Spectrometric Measurements on a Nanodust forming Plasma
Erik von Wahl1, Safa Labidi2, Maxime Mikikian2, Titaïna Gibert2, Holger Kersten1
1IEAP University of Kiel, Kiel, de, 2GREMI, Groupe de Recherches sur l'Energétique des Milieux Ionisés, CNRS / Université d'Orléans, Orléans, France

PO1008 Titanium oxide particles obtained using an argon RF atmospheric plasma jet
Andrada Lazea-Stoyanova1, Valentina Marascu1, Cristian Stancu1, Aurel Mihai Vlaicu2, Valentin Serban Teodorescu2, Gheorghe Dinescu1
1N.I.L.P.R.P, Magurele, Bucharest, ro, 2N.I.M.P, Magurele, Bucharest, Romania

PO1009 Synthesis of Ag, Pt and AgPt nanoparticles by magnetron based gas aggregation source
Amael CAILLARD1, Thomas LECAS1, Pascal BRAULT2, anne-lise THOMANN3, Marie France BARTHE4, Caroline ANDREAZZA5, Pascal ANDREAZZA6
1GREMI/Univ Orléans/CNRS, ORLEANS, fr, 2GREMI/Univ/Orleans/CNRS, ORLEANS, France, 3GREMI/Univ Orleans/CNRS, ORLEANS, France, 4CEMHTI/CNRS, ORLEANS, France, 5ICMN/CNRS/Univ Orléans, ORLEANS, France, 6ICMN/CNRS/univ Orleans, ORLEANS, France

PO1010 Plasma polymer coated silica particles: A new class of heavy metal adsorbents
Behnam Akhavan1, Karyn Jarvis2, Peter Majewski2
1The University of Sydney, Sydney, au, 2University of South Australia, Adelaide, Australia

PO1011 Plasma processing of graphite micropowder for improving the electrochemical capacity of Li-ion intercalation batteries
Vito Roberto Giampietro1, Patrick Pietsch2, Vanessa Wood2, Philipp Rudolf von Rohr3, Michal Gulas4
1ETH Zurich- Inst. of Process Engineering, Zurich, ch, 2ETH Zurich - Integrated Systems Laboratory, Zurich, Switzerland, 3ETH Zurich - Inst. of Process Engineering, Zurich, Switzerland, 4IMERYS Graphite & Carbon, Bodio, Switzerland

PO1012 Development of a Wurster type fluidized bed reactor coupled with an atmospheric plasma jet for the deposition of titanium oxide coating on micrometric particles: experiments and modeling
Jerome PULPYTEL1, Seyed Shayan Tabiban1, Farzaneh Arefi-Khonsari1, Mikel Leturia2, Khashayar Saleh2
1LISE - UPMC - CNRS, Paris, fr, 2TIMR - UTC, Compiègne, France

PO1013 BN nanoparticles as antiwear additive in oil lubricant
Andrey Bondarev1, Dmitry Shtansky1
1NUST MISiS, Moscow, ru

Poster - Structure and Composition

PO1014 Phase tailoring of Ta thin films by HiPIMS in Deep Oscillations Magnetron Sputtering (DOMS) mode.
Fabio Ferreira1, Claudio Sousa1, Albano Cavaleiro1, João Oliveira1
1SEG-CEMUC, Universidade de Coimbra, Coimbra, pt

PO1015 The derivatization reactions of functional plasma polymers. Advantages and Limitations.
Anton Manakhov(1,2)1, Lenka Zajickova1, Jean-Jacques Pireaux2
1CEITEC-Masaryk University, Brno, cz, 2University of Namur, Namur, Belgium

Mariagrazia Troia1, Andreas Schulz1, Matthias Walker1, Thomas Hirth1
1Universität Stuttgart, IGVP, Stuttgart, de

PO1017 Correlation between crystallographic localization of Erbium in RF magnetron sputtered AlN:Er by laboratory XRD and CTEM with luminescence quenching
Valerie BRIEN1, Pascal Boulet2
1CNRS Institut Jean Lamour, Vandoeuvre lès Nancy, fr, 2IJL (CC X-gamma) CNRS, Vandoeuvre lès Nancy, France

PO1018 Use of electrochemical techniques to determine the microporosity of structured PVD coatings
Juan Vega1, Herbert Scheerer2, Georg Anderson2, Matthias Oeschner2
1Institut für Werkstoffkunde TU Darmstadt, Darmstadt, de, 2Technische Universität Darmstadt, Darmstadt, Germany

PO1019 Wetting properties of ZnO-films on glass deposited by Pulsed-DC Magnetron Sputtering
Klemens Ilse1, Ulrich Kunert1, Volker Naumann1, Christian Hagendorf1
1Fraunhofer CSP, Halle, de

PO1020 Characterization of hydrogen-free amorphous carbon films by filtered vacuum arc on stainless steel
Mariana Fazio1, Darina Manova2, Dietmar Hirsch2, Evgenia Valcheva3, Stephan Mändl2, Adriana Márquez1
1Inst. f. Plasma Physics DF-CONICET, Buenos Aires, ar, 2Inst. f. Oberflächenmodifizierung, Leipzig, Germany, 3Faculty of Physics, Sofia University, Sofia, Bulgaria

PO1021 X-ray Photoelectron Spectroscopy (XPS) investigation of SiCxNy:H thin films on Si elaborated by PVD : atomic composition study
Christine ROBERT-GOUMET1, Guillaume MONIER2, Hussein MEHDI2, Abdellatif BACHAR3, Angélique BOUSQUET3, Eric TOMASELLA3
1Pascal Institute, Aubiere, fr, 2Pascal Institute, UMR 6602 CNRS, Aubiere, France, 3Clermont-Ferrand Chemistry Institute, UMR 6296 CNRS, Aubiere, France

PO1022 Structure-stress relationships in nanocrystalline multi-layered AlCrN coatings studied by cross-sectional X-ray nanodiffraction
Stefan Klima1, Nikolaus Jäger1, Hynek Hruby2, Christian Mitterer1, Jozef Keckes1, Rostislav Daniel1
1Montanuniversität Leoben, Leoben, at, 2eifeler-Vacotec GmbH, Düsseldorf, Germany

PO1023 Design, Fabrication and Characterization of n-Si Columnar Structures for Solar Cell Applications
Ayşegül Develioğlu1, Levent Trabzon1
1Istanbul Technical University, Istanbul, tr

PO1024 Evolution of structure, stresses and mechanical properties of a fcc/hex-AlCrN multilayer system upon thermal loading revealed by cross-sectional X-ray nanodiffraction and micromechanical testing
Nikolaus Jäger1, Stefan Klima2, Hynek Hruby3, Michael Meindlhumer4, Bernhard Sartory5, Christian Mitterer2, Jozef Keckes4, Rostislav Daniel2
1Montanuniversität Leoben, Leoben, at, 2Department of Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Leoben, Austria, 3eifeler-Vacotec GmbH, Düsseldorf, Germany, 4Department of Materials Physics, Montanuniversität Leoben, Leoben, Austria, 5Materials Center Leoben Forschung GmbH, Leoben, Austria

Poster - Electrical and Magnetic Coatings

PO1025 Electrical and Structural properties of Cu2O thin films deposited at different temperature by magnetron sputtering.
RADJEHI LAMIA1, Radjehi Lamia2, Lamri Salim2, Sanchette frederic.2, DUCROS Cedric3, Djelloul Abedlekader4
1UTT_Antenne de Nogent, Nogent, fr, 2ICD-LASMIS, Université de Technologie de Troyes, UMR 6281, CNRS, Antenne de Nogent, Pôle, Nogent, France, 3CEA Grenoble LITEN/DTMN/SERE/LRME, 17 rue des Martyrs, Grenoble, France, 4LASPI2A Laboratoire des Structures, Propriétés et Interactions Inter Atomiques, Khenchela University, Algeria., Khenchela, Algeria

PO1026 Influence of hydrogen incorporation associated to thermal treatments on the optical and electrical properties of Al-doped ZnO thin films.
Gloria Gottardi1, Victor Micheli1, Rajesh Pandiyan2, Mian Kashif Safeen3, Ruben Bartali1, Nadhira Laidani1
1Fondazione Bruno Kessler, Trento, it, 2INRS, Varennes, QC, Canada, 3Università degli Studi di Trento, Trento, Italy

PO1027 Structural impact of Cr doping in titanium oxide thin films grown by co-sputtering and flash-lamp annealed
RAUL GAGO-FERNANDEZ1, Slawomir Prucnal2, Rafael Pérez-Casero3, Ignacio Caretti4, Frank Lungwitz2, Steffen Cornelius5
1ICMM-CSIC, MADRID, es, 2HZDR, Dresden, Germany, 3CMAM-UAM, Madrid, Spain, 4University of Antwerp, Wilrijk, Belgium, 5Delft University of Technology, Delft, Netherlands

PO1028 BiVO4 Photoanodes for Water Splitting Deposited by Reactive Magnetron Co-Sputtering: Role of Doping and Morphology for its Photoactivity
Klaus Ellmer1, Fuxian Wang1, Dennis Friedrich1, Roel van de Krol1
1Helmholtz-Zentrum Berlin für Materialien, Berlin, de

PO1029 Transparent conductive IZO films deposited by reactive sputtering from metallic targets
IVAN FERNANDEZ1, Ovidio Peña2, Victor Bellido-Gonzalez3, Raquel Gonzalez-Arrabal2, Heqing Li4
1NANO4ENERGY SL, MADRID, es, 2Instituto de Fusion Nuclear ETSII-UPM, Madrid, Spain, 3Gencoa LTD, Liverpool, United Kingdom, 4Gencoa Ltd.,, Liverpool, United Kingdom

PO1030 Deposition of Co3O4 thin films on stainless steel sieves
Petra Ksirova1, Michaela Brunclikova1, Michal Kohout1, Jiri Olejnicek1, Martin Cada1, Frantisek Kovanda2, Zdenek Hubicka1
1Institute of Physics of the CAS, Prague, cz, 2University of Chemistry and Technology, Prague, Czech Republic

PO1031 Deposition of hematite iron oxide thin photoanodes by reactive high power magnetron sputtering for photoelectrochemical water splitting
Stepan Kment1, Zdenek Hubicka2, Josef Krysa3, Jiri Olejnicek2, Martin Cada2, Radek Zboril1, Patrik Schmuki4
1Palacky University Olomouc, Olomouc, cz, 2Institute of Physics AS CR, Prague, Czech Republic, 3University of Chemistry and Technology Prague, Prague, Czech Republic, 4University of Erlangen-Nuremberg, Erlangen, Germany

PO1032 Al in ZnO - An investigation of Al electrical activation in relation to structure and charge transport limits
Steffen Cornelius1, Mykola Vinnichenko2
1Delft University of Technology, Delft, nl, 2Fraunhofer-Institut für Keramische Technologien und Systeme IKTS, Dresden, Germany

PO1033 Comparative study of Zn(O,S) layer obtained by RF and pulsed DC magnetron sputtering for photovoltaic application
Sabine Fabert1, Romain Meunier1, Michèle Carette1, Antoine Goullet1, Pierre-Yves Thoulon2, Marc Ricci2, Pierre-Yves Jouan1, Marie-Paule Besland1
1Institute of Materials Jean Rouxel, Nantes, fr, 2Crosslux, Rousset, France

PO1034 HiPIMS deposition of Ta-O-N coatings with modified surface by Cu nanoclusters for water splitting application
Jiri Capek1, Sarka Batkova1, Jiri Houska1
1University of West Bohemia, Plzen, cz

PO1035 Properties of transparent IGZO thin films prepared using conventional sputtering methods and HiPIMS
Pavel Baroch1, Jiri Rezek1, Jiri Houska1
1University of West Bohemia, Plzen, cz

PO1036 Electrochemical water splitting on non-noble metal oxide films grown by PECVD
Lukasz Jozwiak1, Jacek Balcerzak1, Jan Sielski1, Marcin Kozanecki1, Jacek Tyczkowski1
1Lodz University of Technology, Lodz, pl

PO1037 ZnO:Al films by a reactive mid-frequency sputtering process from dual rotatable targets.
Felipe Carreri1, Volker Sittinger1, Ralf Bandorf1, Michael Vergöhl1, Günter Bräuer1
1Fraunhofer IST, Braunschweig, de

PO1038 Development and large scale production of conductive thin films to reduce surface impedance of collimators for particle accelerators.
Wil Vollenberg1, Pedro Costa Pinto1, Mauro Taborelli1, Antonio Lafuente Mazuecos1, Nicolo Biancacci1
1CERN, Geneva, ch

PO1039 Electrical properties and thermal stability of Mg2Si co sputter deposited coatings
Alain Billard1, Mohammad Arab Pour Yazdi2, Nicolas Martin3
1utbm, belfort, fr, 2UTBM, Belfort, France, 3Femto-ST, Besancon, France

PO1040 High performance resistive switching device fabricated from NbO2-x and HfO2 layers deposited by high power impulse magnetron sputtering
Rajesh Ganesan1, Benjamin Treverrow1, Dougal. G. McCulloch1, David. R. McKenzie1, Marcela. M.M. Bilek1
1The University of Sydney, Sydney, au

PO1041 Electrical resistivity and structural properties of TiN and ZrN coatings deposited at low temperature
Kristian Rechendorff1, Søren Sørensen1, Klaus Pagh Almtoft1, Bjarke Holl Christensen1, Morten Karstoft Rasmussen1, Christian Ole Viktorin1, Lars Pleth Nielsen1
1Danish Technological Institute, Aarhus, dk

Poster - Plasma Treatment and Cleaning

PO1042 Solid-State Crosslinking of water soluble polymers by Atmospheric Pressure Non-Equilibrium Plasma: A Novel Straightforward Approach
Anna Liguori1, Matteo Gheradi1, Chiara Gualandi1, Silvia Panzavolta1, Adriana Bigi1, Maria Letizia Focarete1, Vittorio Colombo1
1University of Bologna, Bologna, it

PO1043 Investigation of the nucleation stage of plasma-deposited SiOx barrier films as function of substrate chemistry
Christian Hoppe1, Felix Mitschker2, Teresa de los Arcos1, Guido Grundmeier1, Peter Awakowicz2
1University of Paderborn, Paderborn, de, 2Ruhr-University of Bochum, Bochum, Germany

PO1044 Efficient surface treatment of polymers by means of atmospheric pressure high current diffuse dielectric barrier discharge
Sergey Starostin1, Hindrik W. de Vries2, Bernadette van der Velden-Schuermans1, Jan B. Bouwstra1
1FUJIFILM Manufacturing Europe B.V., Tilburg, nl, 2Dutch Institute For Fundamental Energy Research (DIFFER), Eindhoven, Netherlands

PO1045 One step plasma texturing of polytetrafluoroethylene: surfaces with unique morphology and dynamic water repellent behaviour
Fabio Palumbo1, Rosa Dimundo2, Francesco Bottiglione2, Giuseppe Carbone3, Chiara Loporto4, Pietro Favia5
1CNR NANOTEC, Bari, it, 2DMMM, Politecnico di Bari,, Bari, Italy, 3DMMM, Politecnico di Bari, Bari, Italy, 4Dpt of Chemistry University of Bari, Bari, Italy, 5dpt of Chemistry, University of Bari, Bari, Italy

PO1046 Influence of the Texture on the Plasma Nitriding of AISI 304L
Jasmin Biehler1, Jasmin Biehler1, Holger Hoche1, Matthias Oechsner1
1Center for Engineering Materials, Darmstadt, de

PO1047 Surface modification of AZ91 magnesium alloy by high current pulsed electron beam treatment
Shengzhi HAO1, Mincai LI1, Zhiyuan WANG1
1Dalian University of Technology, Dalian, cn

PO1048 Linear Ion Source Applications in Industry and Research
Victor Bellido-Gonzalez1, Victor Bellido-Gonzalez1, Frank Papa2, Heqing Li1, Tommaso Sgrilli1, Florian Meyer1
1Gencoa Ltd, Liverpool, gb, 2Gencoa USA, Davis, United States

PO1049 Influence of Plasma Bullets in Helium Atmospheric Pressure Plasma Jet on the Surface Modification of LDPE
Zheng-Shi Chang1, Cong-Wei Yao1, Guan-Jun Zhang1
1Xi'an Jiaotong University, Xi'an, cn

PO1051 Angular dependence of SiO2 etch rates during fluorocarbon plasma etching
Jeong Geun Bak1, Chang-Koo Kim1
1Ajou university, Suwon, kr

Veta Mukaeva1, Evgeny Parfenov1, Rimma Nevyantseva1, Andrey Bybin1
1Ufa State Aviation Technical University, Ufa, ru

Evgeny Parfenov1, Lyudmila Parfenova2, Aleksey Yerokhin3, Elena Lukina2, Ruzil Farrakhov1
1Ufa State Aviation Technical University, Ufa, ru, 2Institute of Petrochemistry and Catalysis of RAS, Ufa, Russian Federation, 3University of Sheffield, Sheffield, United Kingdom

PO1055 Plasma Electrolytic Oxidation with Alternating Current and Asymmetric Electrodes
Lucas Gerads1, Jürgen Schmidt2
1Aixcon PowerSystems GmbH, Stolberg, de, 2INNOVENT e.V. Technologieentwicklung Jena, Jena, Germany

PO1056    Angular dependence of Si3N4 etch rates and SiO2-to-Si3N4 etch selectivity in C4F6/O2/Ar/CH2F2 plasmas
Jeong Geun Bak1, Chang-Koo Kim1
1Ajou university, Suwon, kr

PO1057 Infrared gas phase study on plasma-polymer interactions in high-current air-like dielectric barrier discharge
Yaoge Liu1, Stefan Welzel1, Serguei Starostin2, Richard van de Sanden1, Jan Bouwstra2, Richard Engeln3, Hindrik de Vries1
1FOM Institute-DIFFER, Eindhoven, nl, 2FUJIFILM Manufacturing Europe B.V., Tilburg, Netherlands, 3TU Eindhoven, Eindhoven, Netherlands

PO1058 Schlieren photography of gas flow structuration in atmospheric pressure plasma jet
Iuliia Onyshchenko1, Anton Nikiforov1, Nathalie De Geyter1, Rino Morent1
1Ghent University, Ghent, be

PO1059 Synthesis of carbon nano/micro-structures using extreme plasma fluxes
Damien Aussems1, Kirill Bystrov1, Marcin Rasinski2, Laurent Marot3, Peter Lipman4, Ilker Dogan1, Michael Gleeson1, Thomas Morgan1, Richard van de Sanden1
1DIFFER, Eindhoven, nl, 2Forschungszentrum Jülich, Jülich, Germany, 3Department of Physics, University of Basel, Basel, Switzerland, 4Chemical Engineering, TU/e, Eindhoven, Netherlands

PO1060 Experimental Study of Atmospheric pressure Argon /Oxygen Plasma Jet and Treatment of Polycarbonate and Polyamide-Nylon Surface
Rajendra Shrestha1, Deepak Subedi1
1Kathmandu University, Dhulikhel, np

PO1061 Use of conventional plasma etching system for the fabrication of superhydrophobic Si surfaces
Jun-Hyun Kim1, Chang-Koo Kim1
1Ajou university, Suwon, kr

PO1062 Surface modification of polypropylene films by atmospheric pressure dielectric barrier discharge
Marina Ratova1, Peter Kelly1, Glen West1, James Bradley2, David Donaghy2
1Manchester Metropolitan University, Manchester, gb, 2The University of Liverpool, Liverpool, United Kingdom

PO1063 Design, realization and testing of a 2D-gradient DBD reactor for combinatorial plasmachemical surface treatment
Andreas Klaus Czerny1, Jens Philipp1, Claus-Peter Klages2
1IOT, TU Braunschweig, Braunschweig, de, 2IOT Braunschweig/ Fraunhofer IST, Braunschweig, Germany

PO1064 Study of biocompatibility of Plasma Polymerized Diethylene Glycol Dimethyl Ether Films
Antonio Renato Bigansolli1, Roberto Yzumi Honda2, Mauricio Antonio Algatti2, Rogério Pinto Mota2
1Instituto de Tecnologia-UFRRJ, Seropédica, br, 2FEG-DFQ-UNESP, Guaratinguetá, SP, Brazil

PO1065 The effects produced by two types of atmospheric pressure plasma sources on polymeric surfaces
Gheorghe DINESCU1, Eusebiu Rosini Ionita1, Anton Yu Nikiforov2, Maria Daniela Ionita1, Mihaela Morar1, Christophe Leys2
1Natl. Inst. Laser, Plasma, Rad. Physics, Magurele-Bucharest, ro, 2Univ Ghent, Dept Appl Phys, Ghent, Belgium

PO1066 Cold Atmospheric Pressure Plasma treatment of PEEK and PEKK based composite for aeronautical purposes
Lucie BRES1, Nicolas GHERARDI2, Nicolas NAUDE2, Bertrand RIVES1
1IRT Saint Exupéry, Toulouse, fr, 2LAPLACE ; Université de Toulouse, CNRS, INPT, UPS, Toulouse, France

PO1067 Water Plasma Treatment for Low Carbon Alloy Steel Using DC Pulse Power
Masahiro Okumiya1, Jung-Hyun Kong2, Yoshiki Tsunekawa2, Sang-gweon Kim3, Kyyoul Yun4, Masashi Yoshida5
1TOYOTA TECHNOLOGICAL INSTITUTE, Nagoya, jp, 2Toyota Technological Institute, Nagoya, Japan, 3Korea Institute of Industrial Technology, Incheon, South Korea, 4Gifu University, Gifu, Japan, 5Shizuoka Insititute of Science and Technology, Fukuroi, Japan

PO1068 Multifunctional Low Density Polyethylene packaging films obtained by fluorination combined or not with plasma treatment
Eric Tomasella1, J. Peyroux1, M. Dubois1, N. Batisse1, A.P. Kharitonov2, D. Flahaut3, L. Romana4, P. Thomas4
1ICCF-CNRS, Aubiere, fr, 2Branch, Moscow, Russian Federation, 3IPREM-CNRS, Pau, France, 4GTSI, Pointe à Pitre, France

PO1069 Influence of carbon black in commercial SBS rubbers on their adhesion properties after plasma-modification
Iwona Krawczyk-Kłys1, Izabella Jaruga1, Jacek Balcerzak2, Jan Sielski2, Jacek Tyczkowski2
1Institute of Leather Industry, Łódź, pl, 2Lodz University of Technology, Lodz, Poland

PO1070 Plasma surface modification of cellulose and its application as filler in the polypropylene composites
Pavel Černý1, Petr Špatenka2, Pavel Olšan3, Petr Bartoš3
1University of South Bohemia, České Budějovice, cz, 2Czech Technical University of Prague, Faculty of Mechanical Engineering, Department of Materials Engineering, Prague, Czech Republic, 3University of South Bohemia, Faculty of Agriculture, Department of Agricultural Machinery and Services, České Budějovice, Czech Republic

PO1071 Plasma nitriding of Al alloys – process technology and surface properties
Anke Dalke1, Heinz-Joachim Spies1, Horst Biermann1
1IWT/ TU Bergakademie Freiberg, Freiberg, de

PO1072 Comparative study of nitrogen expanded phases properties on stainless steels
Bruno Ramos1, Keila Kleinjohann1, Ana Maria Maliska1
1Universidade Federal de Santa Catarina, Florianópolis, br

PO1073 Changes in the angular dependence of SiO2 etch rates with bias voltage in a C4F8 plasma
Chang Jin Park1, Chang-Koo Kim1
1Ajou university, Suwon, kr

PO1074 Highly selective deposition of CVD diamond on Si wafers by using a combined technique of photolithography and ion etching
Stepan Linnik1, Vitaliy Ohotnikov1, Alexander Gaydaychuk1
1Tomsk Polytechnic University, Tomsk, ru

PO1075 Use of a novel cold RF atmospheric pressure plasma jet as a cleaning and restoring tool for daguerreotypes
Paolo Scopece1, Alice Delva2, Emanuele Verga Falzacappa1, Sandra M Petrillo3, Alessandro Patelli4, Paolo Ugo2
1Nadir S.r.l., Venezia, it, 2Department of Molecular Sciences and Nanosystems, University Ca’Foscari of Venice, Venezia, Italy, 3SMP Photoconservation, Genzano di Roma, Italy, 4Department of Physic, University of Padua, Padova, Italy

PO1076 Nanostructured Ti surfaces by low-energy ion-beam irradiation
Jens Bauer1, Frank Frost1, Thomas Arnold1
1Leibniz Institute of Surface Modificatio, Leipzig, de

PO1077 Calcium-phosphate coatings deposition on titanium and Ti-15Mo by plasma electrolytic oxidation
Lyubov SNIZHKO1, Oksana Banakh2, Tony Journot3, Oleg Kalinichenko1, Pierre-Antoine Gay2
1USUCT, Dnepropetrovsk, ua, 2Haute Ecole ARC Ingénierie, La Chaux-de-Fonds, Switzerland, 3Haute Ecole Arc Ingénierie, La Chaux-de-Fonds, Switzerland

Husein Meshreghi1, Mikhail Gorbatkov2, Allan Matthews3, Aleksey Yerokhin4
1The University of Sheffield, Sheffield, gb, 2Ufa State Aviation Technical University, Ufa, Russian Federation, 3University of Manchester, Manchester, United Kingdom, 4University of Sheffield, Sheffield, United Kingdom

PO1079 Cromatipic®; A Modern way of Metallization on plastics with inline technology for high productivity and high quality.
Chinmay Trivedi1, Ivan Kolev2, Dave Doerwald2, Roel Tietema2, Jeroen Landsbergen2, Jaume Amigo2
1IHI Hauzer Techno Coating B.V., Venlo, nl, 2IHI Hauzer Techno Coating BV, Venlo, Netherlands

PO1080 Influence of electrolyte concentration and additives on the plasma electrolytic oxidation treatment of Ti-6Al-4V alloy
Bih-Show Lou1, Feng-chuan Chang2, Chaur-Jeng Wang2, Jyh-Wei Lee3
1Chemistry Division, Center of General Ed, Taoyuan, tw, 2Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan, 3Department of Materials engineering, Ming Chi University of Technology, New Taipei City, Taiwan

Poster - Mechanical Properties

PO1081 Atomic-scale strengthening mechanism of transition-metal nitrides (TM=Ti, Zr, Hf, V, Cr) single phase films with large composition ranges
Kechang Han1, Qing Yao2, Guoqiang Lin2, Chuang Dong2, Kaiping Tai3, Xin Jiang3
1Dalian university of technology, Dalian, cn, 2Dalian University of Technology, Dalian, China, 3Institute of Metals Research,Chinese Academy of Sciences, Shenyang, China

PO1082 Modified Four Ball Tester as a Quick Verifying Tribometer for Different PECVD-DLC – Coatings in Extremely High Load Applications
Kamel Silmy1, Jurij Ossipov2, Volker Bucher2, Michael Banghard1, Tarek Lutz1
1NMI, Reutlingen, de, 2Furtwangen University, Villingen-Schwenningen, Germany

PO1083 Tribological properties of the high temperature protective amorphous SiCxNy coatings
Jan Tomáštík1, Radim Čtvrtlík2
1Palacký University of Olomouc, Olomouc, cz, 2Joint Laboratory of Optics, Czech Academy of Sciences, Olomouc, Czech Republic

PO1084 Effect of hydrogen on the mobility of surface defects induced in plasma etching process for silicon
Masaru Nakamura1, Taehoon Kim1, Hayato Izumi1, Shoji Kamiya1
1Nagoya Institute of Technology, Nagoya, jp

PO1085 Mechanical properties of a-SiC:H films: an influence of surface topography on nanoindentation measurements
Vladimir Cech1, Tomas Lasota2, Erik Palesch1, Jaroslav Lukes3
1Brno University of Technology, Brno, cz, 2Honeywell spol.s.r.o., Brno, Czech Republic, 3Czech Technical University in Prague, Prague, Czech Republic

PO1086 High temperature oxidation of silicon carbide and silicon carbonitride films
Radim Ctvrtlik1, Valeriy Kulikovsky2, Jan Tomastik3, Vaclav Ranc3, Petra Bazgerova3
1Palacky University, Olomouc, cz, 2Institute of Physics of the Czech Academy of Sciences, Prague, Czech Republic, 3Regional Centre of Advanced Technologies and Materials, Palacky University, Olomouc, Czech Republic

PO1087 Adhesion of a-SiC:H and a-SiOC:H films deposited on silicon wafers by PECVD
Tomas Plichta1, Vladimir Cech1
1Brno University of Technology, Brno, cz

PO1088 Wear measurement in real time with a new ball cratering equipment
Reinhold Bethke1, Nadine Noecker1, Michael Eder2
1Fraunhofer IST, Braunschweig, de, 2BAQ, Braunschweib, Germany