Program

Monday, September 15, 2014Poster Session, 15:15 - 16:25

Poster - Characterization of films (optical properties, stress, …)

PO1001 Influence of the curvature measurements on stress determined by Stoney formula
Aurelien Besnard1, Maria Rosa Ardigo1, Maher Ahmed1
1Arts et Metiers ParisTech - LaBoMaP, Cluny, France
Abstract
PO1002 Investigation on the diffusion behaviour of Fe, Cr, and C in arc evaporated TiN- and CrN-based coatings and their influence on the thermal and mechanical properties
Corinna Sabitzer1, Christian Steinkellner1, Peter Polcik2, Mirjam Arndt3, Richard Rachbauer3, Jörg U. Paulitsch1, Paul H. Mayrhofer1
1TU Wien, Vienna, Austria, 2Plansee Composite Materials GmbH, Lechbruck am See, Germany, 3Oerlikon Balzers Coating AG, Balzers, Liechtenstein
Abstract
PO1003 Utilization of in-situ monitoring in modification of the growth of metallic thin films prepared by magnetron sputtering and pulsed laser deposition
Michal Novotný1, Jiří Bulíř1, Petr Pokorný1, Přemysl Fitl2, Ladislav Fekete1, Jan Nikl1, Ján Lančok1, Jindřich Musil1, Vítězslav Rouček3
1Institute of Physics, ASCR, v.v.i., Prague, Czech Republic, 2Institute of Chemical Technology, Prague, Czech Republic, 3TESLA Electrontubes s.r.o., Říčany u Prahy, Czech Republic
Abstract
PO1004 Influence of growth time on crystalline structure, morphologic and optical properties of Indium Oxide (In2O3) thin films
Attaf Abdallah1, Bouhdjar Adel1, Benkhata Youcef1, Saidi Hanane1
1Université de Biskra, Biskra, Algeria
Abstract
PO1005 Residual Stress Estimated from Raman Shift of G Band in DLC Films
Yasuhiro Miki1, Akio Nishimoto2, Takumi Sone3, Yoshiji Araki4
1Nara Prefecture Institute of Industrial, Nara, Japan, 2Department of Chemistry and Materials Engineering / Kansai University, Suita, Japan, 3ASAHI HEAT TREATMENT Corporation, Neyagawa, Japan, 4KAIBARA Corporation, Yamatokoriyama, Japan
Abstract
PO1006 Optical properties of isotropic and anisotropic films deposited by pulsed plasma
Jan Kucharčík1, Vladimír Čech1
1Brno University of Technology, Brno, Czech Republic
Abstract
PO1007 THERMOELECTRIC PROPERTIES OF BI2TE3 NANO-LAYERS PREPARED BY PULSED LASER DEPOSITION
Jan Mikšovský1, Radek Zeipl2, Miroslav Jelínek3, M. Vlček4, T. Kocourek5, J. Vaniš6
1FBME CTU in Prague, Kladno, Czech Republic, 2IP AS CR, Prague, Czech Republic, 3Institute of Physics ASCR, v. v. i., Prague, Czech Republic, 4Institute of Macromolecular Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Prague, Czech Republic, 5Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i., Prague, Czech Republic, 6Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, v.v.i., Prague, Czech Republic
Abstract
PO1008 EFFECT OF DEPOSITION CONDITIONS ON THE ELECTROPHYSICAL PROPERTIES OF CERAMIC OXIDE COATINGS FOR BIOMEDICAL APPLICATIONS
Vladimir Safonov1, Anna Zykova2, Nikolai Donkov3, Stas Yakovin4, Dmitrii Kolesnikov5, Irina Sudzhanskaya5, Igor Goncharov5
1National Science Centre KIPT, Kharkov, Ukraine, 2National Science Centre „Kharkov Institute of Physics and Technology“, Kharkov, Ukraine, 3Emil Djakov Institute of Electronics BAS, Sofia, Bulgaria, 4Department of Physical Technologies Kharkov National University, Kharkov, Ukraine, 5Belgorod State National Research University, Belgorod, Russian Federation
Abstract
PO1009 Effect of RF Power on The Electrical Properties of Sputtered Amorphous Silicon Nitride Films
Attaf Abdallah1, Saidi Hanane 1, Aida Mohamed Salah 2, Nouadji Malika 1, Lehraki Nadia 1, Hammani Nadjette 1
1Université de Biskra, Biskra, Algeria, 2Université de Constantine, Constantine, Algeria
Abstract
PO1010 Diagnostic studies for synthesis of Al doped ZnO film by magnetron sputtering
Jun Suck Lee1, JayBum Kim1, Su B. Jin1, B.B. Sahu1, Jeon G. Han1, H. Kondo2, M. Hori2
1Sungkyunkwan university, Suwon, South Korea, 2Plasma Nanotechnology Research Center, Nagoya University, Nagoya, Japan
Abstract

Poster - Plasma treatment and cleaning

PO1011 Improving the adhesion strength of PTFE coating on stainless steel and glass substrates via atmospheric and reduced pressure plasma surface treatment
Shang-I Chuang1, Hsien-Wei Chen1, Jenq-Gong Duh1
1National Tsing Hua University, Hsinchu, Taiwan
Abstract
PO1012 Water-based surface preparation processes : maintenance of cleaning baths and recycling of rinse water.
Philippe Pousaz1
1NGL Cleaning Technology SA, Nyon, Switzerland
Abstract
PO1013 Cleaning of glass surfaces using diffuse coplanar surface barrier discharge in ambient air
Tomáš Homola1, Mirko Černák2, Andrej Buček3, Dušan Kováčik3
1R-D Centre for Low-Cost Plasma and Nanot, Brno, Czech Republic, 2R&D Centre for Low-Cost Plasma and Nanotechnology Surface Modifications, Brno, Czech Republic, 3Department of Experimental Physics, Faculty of Mathematics, Physics and Informatics, Comenius University, Mlynská dolina, Bratislava, Slovak Republic
Abstract
PO1014 Enhanced adhesion of decorative coatings on aluminium substrates produced by CCP ion treatment
Andreas Panckow1, Clément David1, Pavel Prunici1, Bradley Tinkham1, Gregor Preiß2
1Solayer GmbH, Kesselsdorf, Germany, 2IPT Ionen- und Plasmatechnik GmbH, Hainburg, Germany
Abstract
PO1015 High-rate sputter etching of substrates using hollow cathode arc discharge
Jens-Peter Heinß1, Fred Fietzke1, Christoph Metzner1, Henry Morgner1, Burkhard Zimmermann1
1Fraunhofer-Institute FEP Dresden, Dresden, Germany
Abstract
PO1016
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Abstract
PO1017 Electrochemical Behavior of Reticulated Vitreous Carbon treated by Dielectric Barrier Discharge (DBD) Plasma
Leide Silva1, Luiz Ferreira2, Alberto Santos3, Konstantin Kostov3
1Technological Faculty of Pindamonhangaba, Pindamonhangaba, Brazil, 2Engineering School of Lorena - EEL USP, Lorena, Brazil, 3Universidade Estadual Paulista - FEG-UNESP, Guaratinguetá, Brazil
Abstract
PO1018 Surface modification of steel by plasma N-quench
Masahiro Okumiya1, Shota Matsuda2, Jung Hyun Kong3, Yoshiki Tsunekawa3, Masashi Yoshida4, Sang Gweon Kim5
1Toyota Tachnological Institute, Nagoya, Japan, 2Graduate student of Toyota Technological Institute, Nagoya, Japan, 3Toyota Technological Institute, Nagoya, Japan, 4Shizuoka Institute of Sience and Technology, Fukuroi, Japan, 5Korea Institute of Industreial Technolohy, Inchon, South Korea
Abstract
PO1019 Sub-Microsecond Pulsed Plasma Surface Modification as a Combinational, all Atmospheric Pressure Approach to Nano-structured TCO Production
John Hodgkinson1, Heather Yates1, David Sheel1
1The University of Salford, Salford, United Kingdom
Abstract
PO1020 Front- and Rearside Plasma Texturing of Crystalline Silicon Wafers for PV Applications
Jens Hirsch1, D. Lausch2, N. Bernhard1
1Anhalt University of Applied Sciences, Köthen, Germany, 2Fraunhofer Center for Silicon Photovoltaics CSP, Halle, Germany
Abstract
PO1021 Controlled plasma ablation of fibre reinforced plastic composites with minimal polymeric matrix charring
James Nicholas Barry1, Denis P. Dowling2
1Univeristy College Dublin, Belfield, Dublin, Ireland, 2University College Dublin, Belfield, Dublin, Ireland
Abstract
PO1022 The Remote Plasma Source (RPS) – a powerful plasma tool for stripping SU-8 photo resist
Joachim Schneider1, Jens Hofmann1, Josef Mathuni1, Alexander Mattheus1, Markus Reichmann1, Markus Dingeldein1, Klaus-Martin Baumgärtner1
1Muegge GmbH, Reichelsheim, Germany
Abstract
PO1023 Improvement adhesion strength of PTFE Using Nitrogen Ion Irradiation
Ricardo Takata1, Toru Iwao1, Motoshige Yumoto1
1Tokyo city University, Tokyo-to, Tamazutsumi Setagaya-ku, Japan
Abstract
PO1024 Antimicrobial properties of stainless steel by silver ions surface modification
Cesar Aguzzoli1, F.G. Echeverrigaray1, C.A. Figueroa1, S. Echeverrigaray1, I.J.R. Baumvol1
1University of Caxias do Sul, Caxias do Sul, Brazil
Abstract

Poster - Optical coatings

PO1025
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Abstract
PO1026
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Abstract
PO1027 Thin layers deposited with plasma sputtering and e-beam evaporation as reference samples for thickness determination by spectroscopic ellipsometry
Andreas Hertwig1, Dana Rosu2, Uwe Beck2
1BAM Fed Inst for Materials Research, Berlin, Germany, 2BAM - Federal Institute for Materials Research and Testing, Berlin, Germany
Abstract
PO1028 Reflective multilayer coatings with dielectric barriers for high concentration photovoltaic by mid frequency dual magnetron sputtering
Jose Angel Sanchez-Garcia1, Maider Machado1, Carlos Prieto2, Marta Brizuela1, Oihana Zubillaga1
1TECNALIA, San Sebastian, Spain, 2Instituto de Ciencia de Materiales de Madrid, Madrid, Spain
Abstract
PO1029
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Abstract
PO1030 Spectrally selective SiC(N-Metal):H based optical multilayers for thermodynamic Solar Energy conversion
Audrey Soum-Glaude1, Isabelle Bousquet1, Laurie Di Giacomo1, Sébastien Quoizola1, Emmanuel Hernandez1, Gilles Flamant1, Laurent Thomas1
1PROMES-CNRS, Font-Romeu Odeillo, France
Abstract
PO1031 Development of an electrochromic layer working on sodium ions intercalation
Manuel Tresse1, Clotilde Boulanger1, Nicolas Stein1, David Horwat1
1Institut Jean Lamour, Nancy Cedex, France
Abstract
PO1032 Fabrication of optical coatings based on oxides Ti, Zr, Si with high laser resistance by magnetron sputtering.
Igor Sysoev1, Oleg Volpian1, Georgy Ermakov1, Аlexey Krikunov2, Yury Obod2
1Research Institute "Polyus", Moscow, Russia, 2SME "Fotron Auto" Ltd, Moscow, Russian Federation
Abstract
PO1033 A NEW TECHNIQUE OF THERMAL NOISE MEASUREMENT: USE OF AFM CANTILEVERS COATED WITH DIELECTRIC MATERIALS
Vincent Dolique1, Jerome Degallaix1, Raffaelle Flaminio1, Daniele Forest1, Massimo Granata1, Laurent Pinard1, Tianjun Li2, Ludovic Bellon2, Gianpietro Cagnoli1, Mickael Geitner2
1LMA - CNRS, Villeurbanne, France, 2ENS LYON, LYON, France
Abstract
PO1034 Multichannel in-situ optical control of layer thickness in interference films fabrication.
Andrey Kvas1, Oleg Volpyan2, Roman Dronskiy1, Fedor Egorov3, Georgy Ermakov2, Nataly Popova1, Sergey Shkatula1
1SME "Fotron Auto" Ltd, Moscow, Russia, 2POLYUS Research Institute of M. F. Stelmakh, Moscow, Russian Federation, 3Kotelnikov Institute of Radioengineering & Electronics, RAS, Fryazino, Russian Federation
Abstract

Poster - Atmospheric pressure plasma CVD

PO1035 Surface Characterization of SiOx Films on AZ91D Magnesium Alloys by Atmospheric Pressure Plasma Jet
Yu-Lin Kuo1, Kuang-Hui Chang2, Ting-Yi Lu2
1NTUST, Taipei, Taiwan, 2Department of Mechanical Engineering/National Taiwan University of Science and Technology, Taipei, Taiwan
Abstract
PO1036 Water vapor permeation properties of SiOx bi-layer films deposited in atmospheric pressure high current dielectric barrier discharge
Hindrik de Vries1, Sergey Starostin1, Jan Bouwstra2, Adriana Creatore3, Richard van de Sanden1
1FOM institute DIFFER, Nieuwegein, Netherlands, 2Fujifilm, Tilburg, Netherlands, 3Eindhoven University of Technology, Eindhoven, Netherlands
Abstract
PO1037 Large area atmospheric pressure plasma processes –Applications of the LARGE plasma source between flame pyrolysis and thermal spraying
Gerrit Mäder1, Stefan Kaskel2, Julius Roch2, Liliana Kotte2
1Fraunhofer Institute for Material, Dresden, Germany, 2Fraunhofer IWS, Dresden, Germany
Abstract
PO1038 Deposition of Water Stable Plasma Polymerized Acrylic Acid/MBA Organic Coatings by Atmospheric Pressure Air Plasma Jet
Farzaneh AREFI-KHONSARI1, Dhia Ben-Salem2, Olivier Carton2, Houssam Fakhouri2, Jerome Pulpytel2
1UPMC, Paris, France, 2Sorbonne Universités, UPMC Univ Paris 06, UMR 8235,CNRS, LISE, F-75005, Paris, France
Abstract
PO1039 Dielectric barrier discharge for deposition of highly porous TiO2 coatings
Artem Shelemin1, Andrei Choukourov1, Jaroslav Kousal1, Danka Slavinska1, Hynek Biederman1
1Charles University in Prague, Prague, Czech Republic
Abstract
PO1040 Design and testing of a new type of DBD-PACVD flow reactors employing transverse concentration gradients
Jens Philipp1, Artur Laukart2, Michael Thomas2, Claus-Peter Klages1
1IOT TU Braunschweig, Braunschweig, Germany, 2Fraunhofer IST, Braunschweig, Germany
Abstract
PO1041 Atmospheric plasma surface modification for adhesion improvement in steel-polymer composites
Bert Verheyde1, Gabriella Da Ponte1, Amit Ghosh2, Bruno Van Mele2
1VITO, Mol, Belgium, 2Vrije Universiteit Brussel (VUB), Brussels, Belgium
Abstract
PO1042 Material removal on metallic surfaces using a plasma electrolytical polishing method
Carsten Löser1, Klaus Nestler1, Henning Zeidler1, Wolfgang Adamitzki1, Nicolas Laugel1
1Beckmann-Institute e.V., Oelsnitz/Erzgeb., Germany
Abstract
PO1043 Synthesis of carbon nanosheets using microwave plasma torch at atmospheric pressure
Ondrej Jasek1, Jozef Toman1, Radim Hrdy2, Jan Prasek2
1Faculty of Science, Masaryk University, Brno, Czech Republic, 2Department of Microelectronics, Brno University of Technology, Brno, Czech Republic
Abstract
PO1044 Sub-micro patterning of silicon surfaces assisted by atmospheric pressure plasma CVD
Alexis Boileau1, Thiago Amaral1, Thomas Gries1, Rodrigo Perito Cardoso2, Cédric Noël1, Thierry Belmonte1
1Institut Jean Lamour, Nancy, France, 2Universidade Federal do Paraná, Setor de Tecnologia, Departamento de Engenharia Mecânica, Curitiba, Brazil
Abstract
PO1045 Simulation and Modelling of Atmospheric Pressure Plasmas for Thin Film Deposition Processes
Martina Leins1, Sandra Gaiser1, Markus Becker2, Detlef Loffhagen2, Jens Philipp3, Claus-Peter Klages3, Gerrit Mäder4, Eckhard Beyer4
1IGVP Uni Stuttgart, Stuttgart, Germany, 2INP Greifswald, Greifswald, Germany, 3IOT TU Braunschweig, Braunschweig, Germany, 4TU Dresden, Dresden, Germany
Abstract
PO1046 Deposition of organosilicon thin films on prepainted steel by atmospheric pressure DBD for easy-cleaning and anti-staining properties.
Alain Daniel1, Florin Duminica1, Catherine Archambeau1, Francis Boydens2, François Reniers2
1CRM Group, Liège, Belgium, 2Université Libre de Bruxelles - CHANI, Bruxelles, Belgium
Abstract
PO1047 Multifunctional thin film deposited in an Atmospheric Pressure Townsend Discharge for protecting wood
Jacopo Profili1, Nicolas Gherardi2, Luc Stafford3, Olivier Levasseur3
1Laboratoire LAPLACE, Toulouse, France, 2Laboratoire Laplace, Toulouse, France, 3Université de Montreal, Département de physique, Montreal, Canada
Abstract
PO1048 Atmospheric plasma copolymerization of maleic anhydride and acetylene for stable carboxyl-rich coating deposition
Anton Manakhov1, Lenka Zajickova1, Marek Elias1, David Necas1, Eva Kedronova1, Jan Cechal2, Jirina Medalova3
1CEITEC-Masaryk University, Brno, Czech Republic, 2CEITEC-Brno University of Technology, Brno, Czech Republic, 3Faculty of Science-Masaryk University, Brno, Czech Republic
Abstract
PO1049 Synthesis of aluminum nanoparticles in various liquids
THIERRY BELMONTE1, Ahmad Hamdan1, Cédric Nöel1, Francis Kosior1, Jaafar Ghanbaja1, Gérard Henrion1
1Institut Jean Lamour, NANCY, France
Abstract
PO1050 Study of graphene etching using new type atmospheric pressure plasma
Duk Jae Kim1, Y.K. Shim1
1Geniatech Inc., Suwon, Gyeonggi-do, South Korea
Abstract
PO1052 The in-situ modification of chromatography adsorbents using atmospheric pressure plasma.
James Walsh1, Tom Willett2, Eirini Theodosiou3, Owen Thomas2
1The University of Liverpool, Liverpool, United Kingdom, 2The University of Birmingham, Birmingham, United Kingdom, 3Loughborough University, Loughborough, United Kingdom
Abstract
PO1053 Exhaust air purification with DBD
Andreas Schulz1, Martina Leins1, Matthias Walker1, Thomas Hirth1, Daniel Dobslaw2, Steffen Helbich2, Christine Dobslaw3, Bernd Glocker3
1University of Stuttgart, IGVP, Stuttgart, Germany, 2University of Stuttgart, ISWA, Stuttgart, Germany, 3PlasmaAir AG, Weil der Stadt, Germany
Abstract
PO1054 Discharge Properties and Radical-Generation Chracteristics in DBD Plasma Jet
Giichiro Uchida1, Kosuke Takenaka1, Kazufumi Kawabata1, Atsushi Miyazaki1, Yuichi Setsuhara1, Keigo Takeda2, Kenji Ishikawa2, Masaru Hori2
1Osaka University, Ibaraki, Japan, 2Nagoya University, Nagoya, Japan
Abstract
PO1055 Removal of fluorocarbon contaminations from water
Michael Haupt1, Jakob Barz1, Hendrik Schikora1, Christian Oehr1
1Fraunhofer IGB, Stuttgart, Germany
Abstract

Poster - HiPIMS

PO1056    Different process parameters controlling reactive high-power impulse magnetron sputtering of dielectric oxide films
Jiri Rezek1, Jaroslav Vlcek1, Alexandr Belosludtsev1
1University of West Bohemia, Plzen, Czech Republic
Abstract
PO1057 The effect of ballmaterials on the tribological properties of CrN Coatings deposited by HIPIMS Technology
Hui Zhou1, Jun Zheng2, Zhao Jiang2
1Lanzhou Institute of Phycics, Lanzhou, China, 2Lanzhou Institute of Physics, Lanzhou, China
Abstract
PO1058 Effect of substrate bias on the fabrication of AlCrN thin films using high power impulse magnetron sputtering technique
Jyh-Wei Lee1, Yu-Chiao Hsiao2, Yung-Chin Yang2, Bo-Wei Chang3, Bih-Show Lou4
1Ming-Chi University of Technology, New Taipei City, Taiwan, 2Department of Materials and Resources Engineering, National Taipei University of Technology, Taipei, Taiwan, 3Department of Materials engineering, Ming Chi University of Technology, New Taipei City, Taiwan, 4Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan
Abstract
PO1059 Highly conductive transparent aluminium doped zinc oxide films deposited near room temperature by reactive high power impulse magnetron sputtering
Martin Mickan1, Ulf Helmersson2, David Horwat1
1Institut Jean Lamour, Nancy cedex, France, 2Plasma & Coatings Physics Division, IFM–Material Physics, Linköping, Sweden
Abstract
PO1060 Reactive deposition of alumina from industrial size rotatables with superimposed HIPIMS
Holger Gerdes1, Ralf Bandorf1, Michael Mark2, Thomas Schuette3, Guenter Braeuer1
1Fraunhofer IST, Braunschweig, Germany, 2Melec, Baden Baden, Germany, 3Plasus, Kissing, Germany
Abstract
PO1061 EFFECT OF MAGNETIC FIELD ON HIPIMS DISCHARGE PROPERTIES
Vitezslav Stranak1, Jones Alami2, Ann-Pierra Herrendorf3, Zdenek Hubicka1, Rainer Hippler3
1Institute of Physics, AS CR, Prague, Czech Republic, 2INI Coating Ltd., Rheinbreitbach, Germany, 3University of Greifswald, Greifswald, Germany
Abstract
PO1062 Pressure effects on the properties of Cr thin films sputtered by HiPIMS in deep oscillations magnetron sputtering (DOMS) mode
Ricardo Serra1, Fábio Ferreira2, João Carlos Oliveira2, Albano Cavaleiro2
1Universidade de Coimbra, Coimbra, Portugal, 2SEG-CEMUC, Universidade de Coimbra, Coimbra, Portugal
Abstract
PO1063 Cr-based thin films deposited by HiPIMS-DOMS
João Oliveira1, Fabio Ferreira1, Ricardo Serra1, Albano Cavaleiro1
1SEG-CEMUC, University of Coimbra, Coimbra, NIF: 501617582, Portugal
Abstract
PO1064 Combination of Plasma based Ion Implantation and Deposition (PbII&D) and High Power Impulse Magnetron Sputtering for the development of antimicrobial surfaces on polymers
Martin Polak1, Antje Quade1, Thomas Weihe1, Frank Hempel1, Klaus-Dieter Weltmann1
1INP Greifswald, Greifswald, Germany
Abstract
PO1065 High-rate reactive high-power impulse magnetron sputtering of hafnium dioxide films
Alexandr Belosludtsev1, Jiri Rezek1, Jaroslav Vlcek1, Jiri Houska1, Radomir Cerstvy1
1University of West Bohemia, Plzen, Czech Republic
Abstract
PO1066 Determination of sputtered species densities in HIPIMS discharge by optical emission spectroscopy
Petr Vasina1, Matej Fekete1, Peter Klein1, Lenka Dosoudilova1, Zdenek Navratil1, Jaroslav Hnilica1, Pavel Dvorak1
1Masaryk University, Brno, Czech Republic
Abstract
PO1067 Investigation of hybrid DCMS/HiPIMS Diamond Like Carbon coatings for tribological applications.
Jérémy Courtier1, Pascal Briois1, Eric Monsifrot2, Frédéric Schuster3, Alain Billard4
1UTBM, IRTES LERMPS, Belfort, France, 2DEPHIS SARL, Etupes, France, 3CEA, Cross Cutting Program Adv Mat Saclay, Gif Sur Yvette, France, 4UTBM, LRC CEA, IRTES LERMPS, Belfort, France
Abstract
PO1068 Structure and mechanical characteristics of Cr-B films produced by DC and high Power Pulsed Magnetron Sputtering of a CrB2 target
David Horwat1, Philipp Vladimirovich Kiryukhantsev-Korneev2, Jean-François Pierson1, Evgeny Alexandrovich Levashov2
1Institut Jean Lamour, Nancy, France, 2NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY “MISIS”, Moscow, Russian Federation
Abstract
PO1069 Influence of the discharge regime on Ti thin films growth and properties in dc, single pulsed and chopped high power impulse magnetron sputtering
Marcel Meško1, René Heller1, René Hübner1, Matthias Krause1
1Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany
Abstract
PO1070 Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillations magnetron sputtering (DOMS) mode.
Fabio Ferreira1, Ricardo Serra1, João Oliveira1, Albano Cavaleiro1
1SEG-CEMUC, Universidade de Coimbra, Coimbra, NIF: 501617582, Portugal
Abstract
PO1071 On the I-V characteristics in a reactive high power impulse magnetron sputtering (HiPIMS)
Jon Tomas Gudmundsson1, Fridrik Magnus2, S. Shayestehaminzade3, Tryggvi K. Tryggvason3, Olafur B. Sveinsson3, Sveinn Olafsson3
1University of Iceland, Reykjavik, Iceland, 2Department of Physics and Astronomy, Uppsala University, Uppsala, Sweden, 3Science Institute, University of Iceland, Reykjavik, Iceland
Abstract

Poster - Nanocomposites, nanostructures

PO1073 Characterisation and properties of nano-composite thin film deposited by Atmospheric Pressure Townsend Discharge
Jacopo Profili1, Nicolas Gherardi1, Luc Stafford2, Olivier Levasseur2
1Laboratoire LAPLACE, Toulouse, France, 2Université de Montreal, Département de physique, Montreal, Canada
Abstract
PO1074 The Feasibility of Ultra-Hardness in Nanocomposite Coatings
Marcus Fuchs1
1Saxonian Institute of Surface Mechanics, Wachau, Germany
Abstract
PO1075 Effect of lithium and silicon oxides on formation of boron nitride nanostructures
Konsantin Firestein1, Andrei Matveev1, Dmitry Shtansky1, Dmitrii Golberg2
1NUST "MISiS", Moscow, Russia, 2National Institute for Materials Science (NIMS), Tsukuba, Japan
Abstract
PO1076
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Abstract
PO1077 Self-organized Ni particles deposited on TiNxOy coated ion patterned Si substrate for carbon nanotubes growth
Mónica Morales C1, R. B. Merlo1, R. Droppa Jr.2, C. A. Figueroa3, F. Alvarez1
1UNICAMP, IFGW, Campinas, Brazil, 2Universidade Federal do ABC, Santo André, Brazil, 3Universidade de Caxias do Sul, Caxias do Sul, Brazil
Abstract
PO1078 NaCl and KCl assisted-growth of RuO2 nanowires by atmospheric pressure microwave afterglow.
Duclair KUETE SAA1, Thomas GRIES1, Sylvie MIGOT-CHOUX1, Samuel LAMINSI2, Thierry BELMONTE1
1University of Lorraine, Nancy, France, 2University of Yaoundé 1, Yaoundé, Cameroon
Abstract
PO1079 Optical Anisotropy in Ordered Silver Nanodots produced by plasma ions
Mukesh Ranjan1, Mukesh Ranjan1
1FCIPT, Institute for Plasma Research, Gandhinagar, India
Abstract
PO1080 Highly efficient nanoparticle generation in the gas phase by pulsed DC magnetron sputtering in reactive gas admixtures
Oleksandr Polonskyi1, Amir Mohammad Ahadi1, Alexander Hinz1, Egle Vasiliauskaite1, Thomas Strunskus1, Franz Faupel1
1Christian-Albrechts University at Kiel, Kiel, Germany
Abstract
PO1081 Characterization of nanostructure surfaces of fluoropolymers produced by reactive plasma treatment
Cindy Steiner1, Steffen Günther1, Matthias Fahland1
1Fraunhofer FEP Dresden, Dresden, Germany
Abstract
PO1082 The growth of Nb-B-Al-O Nanocomposite Films by Multi-target Magnetron Co-sputtering
Dejun Li1, N Liu2, L Dong2
1Tianjin Normal University, Tianjin, China, 2College of Physics and Materials Science, Tianjin Normal University, Tianjin, China
Abstract
PO1083 Corrosion and microhardness behavior of electrodeposited Ni–Mo alloy coatings in the presence of organic inhibitor
BEN TEMAM Hachemi1, GUETTAF TEMAM Elhachmi2
1Université de Biskra, Biskra, Algeria, 2Laboratoire de Physique des Couches Minces et Applications Université Mohamed Khider- Biskra, Algérie, Biskra, Algeria
Abstract
PO1084 Deposition of Cu/a-C:H nanocomposite films
Tereza Steinhartová1, Jan Hanuš1, Ondřej Kylián1, Andrei Choukourov1, Jaroslav Kousal1, Hynek Biederman1
1Charles University in Prague, Prague, Czech Republic
Abstract
PO1085 Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering
Pavel Souček1, Vilma Buršíková1, Lukáš Zábranský1, Monika Stupavská1, Petr Vašina1
1Masaryk University, Brno, Czech Republic
Abstract
PO1086 Characterization of boron nitride zirconium thin films prepared by PVD
Abdelouahad CHALA1, Shahnaz SIAD2, Mohamed Abdou Djouadi3
1Université de Biskra, Biskra, Algeria, 2Laboratoire de Physique des Couches Minces et Applications, Université de Biskra, Biskra, Algeria, 3IMN, UMR 6502, Nantes, France
Abstract
PO1087 Tilting column and 3D pattern formation during ion beam assisted growth of carbon:nickel nanocomposite films
Matthias Krause1, Maja Buljan2, Wolfhard Möller1, Stefan Facsko1, Matthias Zschornak1, Sebastian Wintz1, Rene Heller1, Jose Luis Endrino3, Sibylle Gemming1
1Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany, 2Ruder Bošković Institute, Zagreb, Croatia/Hrvatska, 3Cranfield University, Cranfield, United Kingdom
Abstract
PO1088 Plasma polymerized fluorocarbon films and their silver nanocomposites for sensitive Raman scattering techniques
Martin Petr1, Martin Subr2, Eva Kocisova2, Ondrej Kylian2, Jan Hanus2, Marek Prochazka2, Hynek Biederman2
1Charles University in Prague, Prague, Czech Republic, 2Charles University in Prague, Faculty of Mathematics and Physics, Prague, Czech Republic
Abstract
PO1089 Simulations of the heat transfer through the water-polymer-interface on anti-ice polymer films in dependence of micro-structures and PECVD coatings
Philipp Grimmer1, Michael Haupt1, Jakob Barz1, Christian Oehr1, Thomas Hirth1
1Fraunhofer IGB, Stuttgart, Germany
Abstract
PO1090 Silver/SiOxCyHz– polymer nanocomposite thin film prepared by a high rate deposition system
Oleksandr Polonskyi1, Tilo Peter1, Alexander Hinz1, Thomas Strunskus1, Franz Faupel1
1Christian-Albrechts University at Kiel, Kiel, Germany
Abstract
PO1091
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Abstract
PO1092 Rapid growth of copper oxide nanowires by an atmospheric pressure micro-afterglow: investigation of the role of stress.
Thomas Gries1, Ayman Altaweel1, Sylvie Migot1, Pascal Boulet1, André Mézin1, Thierry Belmonte1
1Institut Jean Lamour - CNRS, Nancy Cedex, France
Abstract
PO1093 Gas phase interaction between 3-Aminopropyltriethoxysilane (APTES) and Ar-N2 afterglow: application to nanoparticles synthesis.
GUEYE Magamou1, GRIES Thomas1, Noel Cédric1, BELMONTE Thierry1, CHOQUET Patric2, BULOU Simon2, LECOQ Elodie2
1Institut Jean Lamour, Nancy, France, 2Centre de Recherche Public Gabriel Lippmann, Belvaux, Luxembourg
Abstract
PO1094 CONFORMAL GROWTH OF ZnO FILMS ON ALUMINA TEMPLATES BY REACTIVE MAGNETRON SPUTTERING
OlgaA Sánchez1, Miriam Yuste 2, Manuel Hernandez Velez 3, Oscar Martínez Sacristan 4, Ramon Escobar Galindo 2
1Instituto Ciencia Materiales Madrid, Madrid, Spain, 2Instituto Ciencia Materiales Madrid (CSIC), Madrid, Spain, 3Universidad Autónoma Madrid (UAM), Madrid, Spain, 4Universidad de Valladolid, Valladolid, Spain
Abstract
PO1095 synthesis and characterisations of nanoporous diamond membranes for future active membrane fuel cells fabrication
Silvere Barrat1, Amine Sellam2
1Institut Jean Lamour, Nancy, France, 2Insitut Jean Lamour, Nancy, France
Abstract
PO1096 Fibrous Stents with Antimicrobial Properties
Rita Rebelo1, Noora Manninen2, Raul Fangueiro3, Albano Cavaleiro2, Sandra Carvalho4
1University of Minho, Guimarães, Portugal, 2SEG-CEMUC Mechanical Engineering Department, University of Coimbra, Coimbra, Portugal, 3Fibrous Materials Research Group, University of Minho, Guimarães, Portugal, 4GRF-CFUM, Physics Department, University of Minho, Guimarães, Portugal
Abstract
PO1097 Effects TiN and TaN barrier layers on the emergence of Ag and Cu particles and the subsequent mechanical and antibacterial properties of TaN-(Ag,Cu) nanocomposite films
Jang-Hsing Hsieh1, Y. J. Cho2, Y. J. Lin2
1Ming Chi University of Technology, New Taipei City, Taiwan, 2Ming Chi University of Tech., New Taipei City, Taiwan
Abstract
PO1098 Hydrophobic and superhydrophobic CFx catings by magnetron sputtering
Corinne Nouvellon1, Fabien Monteverde1, Alisson Tromont1, Fatima Ajouaoui1, Laura Yonge1, Olivier Van Overschelde2, Alain Daniel3, Catherine Archambeau3, Thomas Godfroid1, Rony Snyders4
1Materia Nova, Mons, Belgium, 2ChIPS/UMONS, Mons, Belgium, 3CRM, Liège, Belgium, 4ChIPS/UMONS and Materia Nova, Mons, Belgium
Abstract
PO1099 Structure and properties of B-doped multilayer TiAlCrN coatings deposited using CFUBMS system
Philipp Kiryukhantsev-Korneev1, Josphat Phiri1, Konstantin Kuptsov1, Evgeny Levashov1, Dmitry Shtansky1
1National University "MISIS", Moscow, Russia
Abstract

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