Program



Monday, September 10, 2012Poster Session, 15:15 - 16:25

Poster - Optical Coatings

PO1001 Optical Layer Systems for Product Authentication: Interference, Scattering, Light Diffusion and Ellipsometric Encoding as Public, Hidden and Forensic Security Features
Uwe Beck1, Andreas Hertwig1, Ralph Stephanowitz1, Matthias Weise1, Dirk Hönig2, Stefan Schneider2, Ralph Domnick3, Matthias Belzner3
1BAM, Berlin, Germany, 2Accurion GmbH, Göttingen, Germany, 3Ara Coatings GmbH & Co. KG, Erlangen, Germany
Abstract | Extended Abstract

PO1002 Wide-angle broadband AR coating by combining interference layers with a plasma-etched gradient layer
Ulrike Schulz1, Peter Munzert1, Christiane Präfke1, Norbert Kaiser1
1Fraunhofer IOF, Jena, Germany
Abstract | Extended Abstract

PO1003 Evolution of microstructural and chemical in-depth changes of variable index chromium-silicon mixed oxides induced by reactive ion beam mixing at the interface.
Ramon Escobar Galindo1, Noelia Benito2, Pilar Herrero1, Olga Sanchez1, Carlos Palacio2
1ICMM-CSIC, Madrid, Spain, 2Universidad Autonoma de Madrid, Madrid, Spain
Abstract | Extended Abstract

PO1004 Fabrication of conjugated polymer light-emitting devices prepared by plasma enhanced chemical vapor deposition of naphthalene
Mojtaba Rajabi1, Seyed Iman Hosseini1, Marzieh Abbasi Firouzjah1, Amir Reza Ghassami1, Mohammad Reza Khani1, Babak Shokri1
1Shahid Beheshti University, Tehran, Iran
Abstract | Extended Abstract

PO1005 Sensitization of Er3+ Emission in Er- and Yb-doped Si Thin Films by Laser Ablation
Shinji Kawai1, Shuji Komuro2, Toru Katsumata2
1Industrial Technology Center of SAGA, Tosu, Japan, 2Toyo University, Kawagoe, Japan
Abstract | Extended Abstract

PO1006 Remote plasma assisted deposition of organic luminescent thin films as UV active components in photonic structures
Angel Barranco1, Francisco Aparicio2, Maria Alcaire2, Miguel Holgado3, Ana Borras2, Amadeu Griol4, Carlos A. Barrios5, Hans Sohlström6, Agustin R. Gonzalez-Elipe2
1ICMS-CSIC, Sevilla, Spain, 2Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Sevilla, Spain, 3Centro Laser UPM, Madrid, Spain, 4NTC-UPLV, Valencia, Spain, 5ISOM-UPM, Madrid, Spain, 6KTH, Stockholm, Sweden
Abstract | Extended Abstract

PO1007 Deposition of Zinc Oxide as UV Protection Coating by MW-PECVD
Stefan Merli1, Andreas Schulz1, Matthias Walker1, Rafael Oser2, Ulrich Stroth1
1Institute for Plasma Research, Stuttgart, Germany, 2Bayer MaterialScience Aktiengesellschaft, Leverkusen, Germany
Abstract | Extended Abstract

PO1008 Development of optical microcavities based on amorphous thin films
Ivan Braga Gallo1, Antonio Ricardo Zanatta1
1USP - IFSC, São Carlos, Brazil
Abstract | Extended Abstract

PO1009 Thermochromic effect in Sm0.5Ca0.5MnO3 thin films elaborated by DC magnetron co-sputtering
Alexis Boileau1, Fabien Capon2, Jean-François Pierson3, Silvère Barrat3, Patrick Laffez4
1Institut Jean Lamour-Université Lorraine, nancy, France, 2Institut Jean Lamour, Université de Lorraine, Nancy, France, 3Institut Jean Lamour, Université Lorraine, Nancy, France, 4Université F. Rabelais Tours, IUT de Blois, LEMA, Blois, France
Abstract | Extended Abstract

Poster - Films and surfaces for energy conversion and storage

PO1010 An in situ-EDXRD study of reactively co-sputtered Cu(In,Ga)S2 layers
Jonas Krause1, Stephan Brunken1, Klaus Ellmer1
1Helmholtz-Zentrum Berlin, Berlin, Germany
Abstract | Extended Abstract

PO1011 Linking functional properties of transition metals to growth parameters
Wouter Leroy1, Diederik Depla1
1Research Group DRAFT, Ghent University, Gent, Belgium
Abstract | Extended Absract

PO1012 TiN layers as a back contact for chalcopyrite thin film solar cells
Dariusz A. Zając1, Karsten Harbauer1, Somasundaram Murugesan1, Klaus Ellmer1
1Helmholtz Zentrum Berlin, Berlin, Germany
Abstract | Extended Abstract

PO1013 a-SiCNH PACVD films grown from TMS/NH3 mixtures for Silicon PV cells
Laurent Thomas1, Isabelle Bousquet1, José Almeida Silva1, Sébastien Quoizola1, Emmanuel Hernandez1
1PROMES/CNRS, Perpignan, France
Abstract | Extended Abstract

PO1014 Metal nitride thin films synthesized by reactive magnetron sputtering for supercapacitor applications
Saïd Bouhtiyya1, Raul Lucio Porto2, Thierry Brousse2, Jean-François Pierson1, Fabien Capon1
1Institut Jean Lamour, Nancy, France, 2LGMPA, Nantes, France
Abstract | Extended Abstract

PO1015 Progress on the comprehensive understanding of Si film structure and dynamics deposited on glass-substrates and Si-wafers by light scattering
Angelos Kalampounias1, Ergina Farsari1, Eleutherios Amanatides1, Dimitrios Mataras1
1Dep. Chem. Engineering, Univ. of Patras, Patras, Greece
Abstract | Extended Abstract

PO1016 Synthesis and characterization of La2NiO4-δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring
Jérémie FONDARD1, Alain BILLARD1, Pascal BRIOIS1, Ghislaine BERTRAND1
1LERMPS, UTBM, Belfort, France
Abstract | Extended Abstract

PO1017 ATMOSPHERIC PLASMA TREATMENT OF FUEL CELL BIPOLAR PLATES
Volker Buck1, Nicolas Woehrl2
1Uni. Duisburg-Essen, Duisburg, Germany, 2Uni. Duisburg-Essen and CENIDE, Duisburg, Germany
Abstract | Extended Abstract

PO1018 Metal-containing diamond like carbon (a-C:H:Me) as a functional coating for metallic bipolar plates "DiaPolar"
Tom O'Donnell1, Jochen Brand1, Peter Kaestner2, Katarina Koster2, Günter Bräuer1, Kerstin Schmidt3, Justin Richards3
1Fraunhofer IST Braunschweig, Braunschweig, Germany, 2TU Braunschweig IOT, Braunschweig, Germany, 3Fraunhofer ICT, Wolfsburg, Germany
Abstract | Extended Abstract

PO1019 Plasma nitriding by strip hollow cathode method (SHC-PTT) of austenitic stainless steels for bipolar plates
Krasimir Nikolov1, Katharina Köster1, Peter Kaestner1, Günter Bräuer1, Claus-Peter Klages1
1Institut für Oberflächentechnik IOT, Braunschweig, Germany
Abstract | Extended Abstract

PO1020 Towards synthesis of transition metal nitride thin films for Li-ion batteries: example of Cu3N and RuN
Saïd Bouhtiyya1, Jean-François Pierson1, Fabien Capon1, Barbara Laik2, Jean-Pierre Peraira-Ramos2
1Institut Jean Lamour, Nancy, France, 2Institut de Chimie et des Matériaux Paris-Est UMR 7182 CNRS-UPEC, Thiais, France
Abstract | Extended Abstract

PO1021 Surface area nanostructuring with LIPSS formation using femtosecond laser
Ricardo Serra1, João Carlos Oliveira2, Victor Oliveira3, Albano Cavaleiro2
1DEM, FCT UC, Coimbra, Portugal, 2SEG CEMUC, DEM, FCTUC, Coimbra, Portugal, 3ISEL / ICEMS, Lisbon, Portugal
Abstract | Extended Abstract

Poster - Plasma and ion etching / surface cleaning

PO1022 Numerically controlled local plasma jet oxidation of silicon
Thomas Arnold1, Hendrik Paetzelt2, Georg Böhm2
1Leibniz-Institut für Oberflächenmodifizi, Leipzig, Germany, 2Leibniz-Institut für Oberflächenmodifizierung, Leipzig, Germany
Abstract | Extended Abstract

PO1023 Silicon carbide surface micromachining using plasma ion etching of sacrificial layer
Norbert Kwietniewski1, Mariusz Sochacki1, Jan Szmidt1, Andy Zhang2, Jang-Kwon Lim2, Mietek Bakowski2
1IMiO, Warsaw University of Technology, Warsaw, Poland, 2Acreo AB, Kista, Sweden
Abstract | Extended Abstract

PO1024 Ion Beam Figuring of molds
Thomas Tonert1, Thoralf Dunger1, Marcel Demmler1, Alfonz Luca1, Michael Zeuner1
1MicroSystems GmbH, Hohenstein-Ernstthal, Germany
Abstract | Extended Abstract

PO1025 Rapid Stripping of Brass-plating on Fine Saw Wire by Triangle-type Multiple Magnetron Plasmas
Hiroshi Fujiyama1, Kiyoshi Miyazaki1, Yusuke Kobayashi1, Naoshi Matsuo1, Masanori Shinohara1, Shin-ichiro Nishiyama2
1Nagasaki University, Nagasaki, Japan, 2Japan Fine Steel Co. Ltd, Sanyo-Onoda, Japan
Abstract | Extended Abstract

PO1026 Scaling laws governing the NF3 cleaning plasma in a large area reactor
George-Felix Leu1, Modrzynski Pawel2, Markus Klindworth2, Christoph Ellert3
1OC Oerlikon Solar Ltd, Truebbach, Switzerland, 2OC Oerlikon Solar Ltd., Truebbach, Switzerland, 3on leave from OC Oerlikon Solar Ltd., Truebbach, Switzerland
Abstract | Extended Abstract

PO1027 Regeneration of Mineral Adsorbent by Nonthermal Plasma Desorption of Formaldehyde
Katja Saulich1, Siegfried Müller1, Joachim Schomburg2
1INP Greifswald e.V., Greifswald, Germany, 2DURTEC GmbH, Neubrandenburg, Germany
Abstract | Extended Abstract

PO1028 Residue Free Removal of Organic Contaminants on Micro Structured Surfaces by Use of an Atmospheric Pressure Plasma
Leander Loewenthal1, Stephan Wieneke1, Jan H. Henze1, Lars ten Bosch1, Wolfgang Viöl1
1University of Applied Sciences and Arts, Göttingen, Germany
Abstract | Extended Abstract

PO1029 Cleaning of Organic Contamination from EUV Optics Surfaces Using Hydrogen-based Plasmas
Nikola Skoro1, Evangelos Gogolides1
1Institute of Microelectronics, Athens, Greece
Abstract | Extended Abstract

PO1030 Removal of recontamination by cork taint from the surface of cork stoppers by atmospheric pressure plasma processes
Joachim Schneider1, Martina Leins1, Andreas Schulz1, Matthias Walker1, Christian Kamm1, Ulrich Stroth1
1Uni Stuttgart, Inst. f. Plasmaforschung, Stuttgart, Germany
Abstract | Extended Abstract

PO1031 Remove of silver tarnish films by using atmospheric-pressure plasma jets
Michael Thomas1, Margret von Hausen1, Annika Maier2, Gerhard Eggert2
1Fraunhofer IST, Braunschweig, Germany, 2Stuttgart State Academy of Art and Design, Stuttgart, Germany
Abstract | Extended Abstract

PO1032 Influences of surface-active substances on specific power inputs and on surface roughnesses of the metal product under plasma vacuum arc treatment
Vladimir Arustamov1, Khatam Ashurov1, Khusniddinkhuja Kadirov1, Ilyos Khudaykulov1
1Arifov Institute of Electronics, Tashkent, Uzbekistan
Abstract | Extended Abstract

PO1033 Plasma etching of aluminum nitride thin films prepared by magnetron sputtering method
Piotr Firek1, Bartlomiej Stonio2, Rafal Chodun3, Jan Szmidt2, Krzysztof Zdunek3
1IMiO, Warsaw University of Technology, Warsaw, Poland, 2Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland, 3Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
Abstract | Extended Abstract

PO1034 The hydrophilic properties of the etched SiO2 glass using atmospheric dielectric barrier discharge plasma process
Seung-chun Oh1, Jung-uk Shin1, Sang-sik Kim1
1Institute for Advanced Engineering, Yongin-si, South Korea
Abstract | Extended Abstract

PO1035 Effects of the surface roughness on the visible transmittance of the glass using atmospheric pressure plasma etching process
Jung-uk Shin1, Seung-chun Oh1, Sang-sik Kim1
1Institute for Advanced Engineering, Yongin-si, South Korea
Abstract | Extended Abstract

Poster - Physical vapour deposition

PO1036 Experimental study of DC driven hybrid PVD-PECVD process
Tereza Schmidtová1, Pavel Souček1, Petr Vašina1
1Masaryk university, Brno, Czech Republic
Abstract | Extended Abstract

PO1037 Remote Direct Current Plasma Sputtering for Various Coating Processes
Jong-Kuk Kim1, Seunghun Lee1, Do-Geun Kim1
1Korea Institute of Materials Science, Changwon, South Korea
Abstract | Extended Abstract

PO1038 Integration of macro particle filter system in Larco®-technology for ta-C-coatings in an industrial batch system
Martin Holzherr1, Michael Falz1, Tobias Schmidt1, Hans-Joachim Scheibe2, Michael Leonhardt2, Carl-Friedrich Meyer2
1VTD Vakuumtechnik Dresden GmbH, Dresden, Germany, 2Fraunhofer IWS, Dresden, Germany
Abstract | Extended Abstract

PO1039 ON THE INJECTED GAS/ELECTRIC POWER RELATION FOR DEPOSITION EFFICIENCY CONTROL DURING THE GIMS DEPOSITION
Krzysztof Zdunek1, Katarzyna Nowakowska-Langier2, Rafal Chodun1, Jerzy Dora3
1Warsaw University of Technology, Warsaw, Poland, 2National Centre for Nuclear Research, Otwock, Poland, 3Dora Power Systems, Wilczyce, Poland
Abstract | Extended Abstract

PO1040 Influence of the Ion Beam Current on Microstructures and Optical Properties of Al2O3 Thin Films by Oxygen Ion Beam Assisted Pulse Reactive Magnetron Sputtering
Yudong Feng1, Jinxiao Wang1, Zhimin Wang1, Yi Wang1, Kai Zhao1, Xiaomei Su1, Hu Wang1
1Lanzhou Institute of Physics, Lanzhou, China
Abstract | Extended Abstract

PO1041 Luminescent thin films prepared by combined reactive magnetron sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero1, Jorge Gil Rostra2, Agustín R. González-Elipe3
1ICMS (CSIC - U. Sevilla), Sevilla, Spain, 2ICMSE (CSIC - U. Sevilla), Sevilla, Spain, 3ICMSE (CSIC U. Sevilla), Sevilla, Spain
Abstract | Extended Abstract

PO1042 Influence of the N2 partial pressure on the structure and properties of ZrAlN thin films
Doris Luef1, Jörg Paulitsch1, Paul H. Mayrhofer1
1Montanuniversitaet Leoben, Leoben, Austria
Abstract | Extended Abstract

PO1043 Arc-free reactive pulsed sputtering of Alumina from metalic target in oxide mode
Holger Gerdes1, Ralf Bandorf1, Günter Bräuer1
1Fraunhofer IST, Braunschweig, Germany
Abstract | Extended Abstract

PO1044 Combining a Magnetron Sputtering Plasma with an Electron-Cyclotron Resonance Plasma for the Deposition of Cu(In,Ga)S2 Films
Thomas Welzel1, Karl Barucki2, Jonas Krause1, Karsten Harbauer1, Klaus Ellmer1
1Helmholtz-Zentrum Berlin, Berlin, Germany, 2IOT Innovative Oberflächentechnologien GmbH, Leipzig, Germany
Abstract | Extended Abstract

PO1045 Understanding and using the current-voltage-pressure relationship in reactive magnetron sputtering for the growth of transparent conductive oxides
Steffen Cornelius1, Mykola Vinnichenko1, Wolfhard Möller1
1Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany
Abstract | Extended Abstract

PO1046 Characterization of a triode sputter source used for the deposition of inner walls of narrow hollow cylinders
Johann Laimer1, Eva Ruppert1, Herbert Störi1
1Vienna University of Technology, Wien, Austria
Abstract | Extended Abstract

PO1047 Ability of conventional DC magnetron sputtering to coat complex substrates
Anne-Lise THOMANN1, Constantin VAHLAS2, Lyacine ALOUI3, Eliane AMIN-CHALOUB4, Amael CAILLARD1, Eric MILLON5, Pascal BRAULT1, Mireille GAILLARD5, Nadjib SEMMAR4, Chantal BOULMER-LEBORGNE5
1GREMI / CNRS, Orléans Cedex2, France, 2CIRIMAT/INPT université de Toulouse, Toulouse cedex 4, France, 3CIRIMAT université de Toulouse, Toulouse cedex 4, France, 4GREMI / université d'Orléans, Orleans cedex 2, France, 5GREMI / université d'Orleans, Orleans cedex 2, France
Abstract | Extended Abstract

PO1048 Formation of plasma technological influence of vacuum arc on the internal surfaces of metal pipes and putting of the protecting coatings
Vladimir Arustamov1, Khatam Ashurov1, Khusniddinkhuja Kadirov1, Ilyos Khudaykulov1
1Arifov Institute of Electronics, Tashkent, Uzbekistan
Abstract | Extended Abstract

PO1049 Particle-In-Cell Simulation of Closed Drift Type Linear Deposition Source
Seunghun Lee1, Do-Geun Kim1, Jong-Kuk Kim1
1Korea Institute of Material Science, Changwon, South Korea
Abstract | Extended Abstract

PO1050 Modeling the time dependency of the reactive sputter process
Koen Strijckmans1, Wouter Leroy1, Diederik Depla1
1Ghent University, Gent, Belgium
Abstract | Extended Abstract

PO1051 Features of DC magnetron sputtering of mosaic copper-graphite targets
Valery Mitin1, Yury Mankelevich2, Alexander Pal1, Tatyana Rakhimova2, Alexey Ryabinkin2, Alexander Serov2, Alexey Mitin3, Nikolay Krasnobaev3
1Naco Technologies, Riga, Latvia, 2SINP MSU, Moscow, Russian Federation, 3VNIINM, Moscow, Russian Federation
Abstract | Extended Abstract

PO1052 Sn Thin Film Deposition using a Hot Refractory Anode Vacuum Arc
Isak Beilis1, Yosef Koulik2, Raymond Boxman2
1Fac Eng. Dp.Phys El. Tel Aviv Univer, Tel Aviv 69978, Israel, 2Tel Aviv University, Tel Aviv 69978, Israel
Abstract | Extended Abstract

PO1053 The Influence of Cathode Grain Size on the Arc Process and Coating Properties
Jianqiang Zhu1, Mats Johansson2, Peter Polcik3, Mats Ahlgren4, Johanna Rosén1, Lars Hultman1, Magnus Odén1
1IFM, Linköping University, Linköping, Sweden, 2Seco Tools AB, Fagersta, Sweden, 3Plansee Composite Materials GmbH, Lechbruck am See, Germany, 4Sandvik Tooling, Stockholm, Sweden
Abstract | Extended Abstract

PO1054 Pulse Plasma Ion Assisted EB-PVD with doping by ion sputtering of additional target
Anatoly Kuzmichev1
1NTUU Kiev Polytechnical Institute, Kiev, Ukraine
Abstract | Extended Abstract

PO1055 Tungsten, Carbon and Beryllium Film Interaction with Plasma Produced by Terawatt Laser System Irradiation
Cristian Lungu1, Corneliu Porosnicu1, Ionut Jepu1, Ana Mihaela Lungu1, Daniel Ursescu2, Razvan Dabu1, Cristiana E. Grigorescu3, Mariana Osiac4, Vincenc Nemanic5
1NILPRP, Bucharest, Romania, 2NILPR, Bucherest, Romania, 3INOE 2000, Bucharest, Romania, 4Physics Department, University of Craiova, Craiova, Romania, 5ISJ Ljubljana, Ljubljana, Slovenia
Abstract | Extended Abstract

Poster - Fundamentals of surface interaction and thin film growth

PO1056    Experimental and numerical study of sub-monolayer deposition of Ti on Si.
Arindam Jana1, Ludovic Briquet2, Patrick Philipp2, Gerard Henrion3, Tom Wirtz2
1Centre de Recherche Public - Gabriel, Belvaux, Luxembourg, 2Centre de Recherche Public – Gabriel Lippmann., Belvaux, Luxembourg, 3Institut Jean Lamour, UMR CNRS – Université de Lorraine, Nancy, France
Abstract | Extended Abstract

PO1057 Numerical simulations of the deposition of hexane molecules and fragments on silicon
Lotta Mether1, Krister Henriksson1, Kai Nordlund1, Canan Turgut2, Patrick Philipp2
1University of Helsinki, University of Helsinki, Finland, 2Centre de Recherche Public – Gabriel Lippmann, Belvaux, Luxembourg
Abstract | Extended Abstract

PO1058 Sticking of PS molecular fragments on silver (Ag) using sputter deposition
Canan Turgut1, Lotta Mether2, Kai Nordlund2, Patrick Philipp3, Mohammed Belmahi4
1CRP Gabriel Lippmann, Luxembourg, Luxembourg, 2Accelerator Laboratory, University of Helsinki, Helsinki, Finland, 3Department “Science and Analysis of Materials, Centre de Recherche Public – Gabriel Lippmann, Luxembourg, Luxembourg, 4Institut Jean Lamour (IJL) CNRS UMR 7198, Université de Lorraine, nancy, France
Abstract | Extended Abstract

PO1059 Effect of silicon substrate crystallinity on single atom plasma deposition/implantation
Ludovic Briquet1, Arindam Jana1, Patrick Philipp1, Gérard Henrion2, Tom Wirtz1
1CRP Gabriel Lippmann, Belvaux, Luxembourg, 2Institut Jean Lamour, UMR CNRS - Université de Lorraine, Nancy, France
Abstract | Extended Abstract

PO1060 Study of continuous and pulsed deposition of thin metal films by atomistic computer modelling
Rudolf Hrach1, Vera Hrachova1
1Charles University, Prague 8, Czech Republic
Abstract | Extended Abstract

PO1061 Structure and growth simulation of GLAD sputtered thin films
Aurelien Besnard1, Corinne Nouveau1, Luc Carpentier2, Nicolas Martin2
1LaBoMaP, CLUNY, France, 2FEMTO-ST, BESANCON, France
Abstract | Extended Abstract

PO1062 Characterization of the energy flux towards the substrate during magnetron sputter deposition of ZnO thin films
Sven Bornholdt1, Naho Itagaki2, Kazunari Kuwahara2, Harm Wulff3, Masaharu Shiratani2, Holger Kersten1
1IEAP, University Kiel, Kiel, Germany, 2ISEE, Kyushu University, Fukuoka, Japan, 3IoP, University Greifswald, Greifswald, Germany
Abstract | Extended Abstract

PO1063 ADVANTAGES OF ENERGY INFLUX MEASUREMENTS IN LOW PRESSURE PLASMA PROCESSES
Anne-Lise THOMANN1, Pierre-Antoine CORMIER2, Nadjib SEMMAR3, Rémi DUSSART3, Vincent DOLIQUE4, Adil BALHARMI5, Stephanos KONSTANTINIDIS6
1GREMI / CNRS, Orléans Cedex2, France, 2GREMI Université d'Olréans, Orléans, France, 3GREMI / Université d'Orléans, Orléans, France, 4LMA / Université Claude Bernard LyonI, Villeurbanne, France, 5ChIPS / Université de Mons, Mons, Belgium, 6ChIPS, Université de Mons, Mons, Belgium
Abstract | Extended Abstract

PO1064 Plasma-surface interactions: relationships between gas phase chemistry and film growth
Xavier Landreau1, Christelle Dublanche-Tixier1, Pascal Tristant1
1SPCTS-CNRS-Université de Limoges, Limoges, France
Abstract | Extended Abstract

PO1065 Elementary mechanisms of target poisoning during reactive sputtering
Oliver Kreiter1, Carles Corbella1, Simon Große-Kreul1, Teresa de los Arcos1, Achim von Keudell1
1Ruhr-Universität Bochum - EP2, Bochum, Germany
Abstract | Extended Abstract

Poster - Plasma treatment of polymers and other soft matter

PO1066 Plasma and laser surface activation of polymer coatings intended for direct electroless metallization
Piotr Rytlewski1
1Kazimierz Wielki University, Bydgoszcz, Poland
Abstract | Extended Abstract

PO1067 Plasma Activation of PEN polymers by Diffuse Coplanar Surface Barrier Discharge and Low Pressure Ion Bombardment
Martin Kormunda1, Tomas Homola2, Jindrich Matousek1, Mirko Cernak3, Jaroslav Pavlik1, Zdenka Kolska1
1J.E. Purkinje University, Usti nad Labem, Czech Republic, 2Singapore Institute of Manufacturing Technology, Singapore, Singapore, 3Masaryk University, Brno, Czech Republic
Abstract | Extended Abstract

PO1068 Hydrophilization treatment of polyimide using Ar-O2 mixture gas surface wave plasma – Oxygen radical density and plasma parameter dependence
Shigeru Ono1, Yoshinari Hirukawa1, Shigeru Ono1, Shuichi Suzuki1
1Tokyo City University, Tokyo, Japan
Abstract | Extended Abstract

PO1069 Semi-permanent hydrophilic thin layer prepared by APDBD for polyester
Yoon Kee Kim1, Se Hoon Kim1
1Hanbat National University, Daejeon, South Korea
Abstract | Extended Abstract

PO1070 Fluorescence Analysis for Amines on Plasma Functionalized Surfaces
Simone Reichstein1, Jan-Eric Ehlers1, Karl-Heinz Gericke1
1TU Braunschweig, PCI, Braunschweig, Germany
Abstract | Extended Abstract

PO1071 An EPR/ENDOR study of free radicals in X-ray and plasma irradiated polymer powders.
Ignacio Caretti1, Ignacio Jiménez1, Sabine Van Doorslaer2
1Materials Science Institute of Madrid, Madrid, Spain, 2University of Antwerp, Wilrijk, Belgium
Abstract | Extended Abstract

PO1072 Cross-linking of PDMS thin films in hydrogen CC-RF plasma
Vladimir Danilov1, Hans-Erich Wagner1, Jürgen Meichsner1
1University of Greifswald, Greifswald, Germany
Abstract | Extended Abstract

PO1073 Mechanism of polymeric surface modification using by an atmospheric-pressure plasma jet
Jun-Seok Oh1, Kyle Doherty1, Andrew Bowfield1, Rachal Wiliams1, Carl Sheridan1, Paul Unsworth1, Peter Weightman1, James W Bradley1
1University of Luiverpool, Liverpool, United Kingdom
Abstract | Extended Abstract

PO1074 In-situ FTIR-ATR spectroscopic investigations of atmospheric-pressure plasma modification of polyolefin thin films
Zohreh Khosravi1, Alena Hinze2, Claus-Peter Klages2
1Institut für Oberflächentechnik,, Braunschweig, Germany, 2Institut für Oberflächentechnik,TU BS, Braunschweig, Germany
Abstract | Extended Abstract

PO1075 Modification of PMMA surface properties by treatment with an RF atmospheric pressure plasma jet in presence of water vapors
Tomy Acsente1, Maximilian Teodorescu1, Maria-Daniela Ionita1, Gheorghe Dinescu1
1NILPRP, Bucharest Magurele, Romania
Abstract | Extended Abstract

PO1076 Atmospheric-Pressure Plasma Treatment of Polymeric Surfaces Using Diffuse Coplanar Surface Barrier Discharge
Jana Kubincová1, Barbara Hanselmann2, Dirk Hegemann2, Dušan Kováčik1, Mirko Černák1
1Comenius University, Bratislava, Slovakia, 2Empa, Swiss Federal Laboratories for Materials Science and Technology, St. Gallen, Switzerland
Abstract | Extended Abstract

PO1077 Functional coatings for polymer composites
Adam Babik1, Lukas Hoferek1, Drahomira Janova1, Vladimir Cech1
1Brno University of Technology, Brno, Czech Republic
Abstract | Extended Abstract

PO1078 Morphology of Sputtered Gold Thin Films on Si and PET
Martin Amberg1, Axel Ritter1, Patrick Rupper1, Barbara Hanselmann1, Jörg Patscheider1, Dirk Hegemann1
1Empa, Materials Science and Technology, St. Gallen, Switzerland
Abstract | Extended Abstract

PO1079 Metallic Coating of Thermally Unstable Substrates, Especially Wooden Surfaces, by use of a non-thermal Atmospheric Pressure Plasma Jet
Lars ten Bosch1, Leander Loewenthal1, Stephan Wieneke1, Wolfgang Viöl1
1University of Applied Sciences and Arts, Göttingen, Germany
Abstract | Extended Abstract

PO1080 Copper thin films deposited on polymers by RF-IPVD. Correlations between film properties and discharge parameters.
Ismael Guesmi1, Caroline Boisse-Laporte1, Renato Bisaro2, Jean Bretagne1
1LPGP UMR 8578, Orsay, France, 2THALES, Palaiseau, France
Abstract | Extended Abstract

PO1081 PECVD of silicon oxide on PTFE surface with non-thermal atmospheric pressure plasma jets
Jan Schäfer1, Rüdiger Foest1, Antje Quade1, Vít Kudrle2, Jaroslav Hnilica2
1INP Greifswald e.V., Greifswald, Germany, 2DPE Masaryk University, Brno, Czech Republic
Abstract | Extended Abstract

PO1082 Plasma Source for UV Assisted Atomic Layer Deposition of Metal Oxides on Polymer Substrates
Tommi Kääriäinen1, Marja-Leena Kääriäinen1, David Cameron1
1Lappeenranta University of Technology, Mikkeli, Finland
Abstract | Extended Abstract

PO1083 Surface engineering of textiles using He/Dodecyl acrylate plasma at atmospheric pressure
Prasanta Kumar Panda1, Manjeet Jassal2, Ashwini Kumar Agrawal3
1SMITA Research group, IIT Delhi, New delhi, India, 2SMITA Research group, IIT Delhi, New Delhi, India, 3SMITA Research group,IIT Delhi, New delhi, India
Abstract | Extended Abstract

PO1084 Applications of Low Pressure Plasma in High-tech Textiles
Rubel Alam1, Kh. M. Gaffar Hossain1, Günter Grabher1, Mokbul Hossain2
1V-Trion GmbH, Hohenems, Austria, 2Sefar AG, Thal, Swaziland
Abstract | Extended Abstract

PO1085 Sensitive textile fibers
Martin Drabik1, Enrico Koerner1, Martin Amberg1, Dirk Hegemann1
1Empa, St. Gallen, Switzerland
Abstract | Extended Abstract

PO1086 Poly(acrylic) nanocoatings deposited by AP-PECVD processes on paper substrates for packaging applications
Llorenç Bautista1, Jordi Mota1, Laia Crespo1, José Manuel García1, Meritxell Martínez1, Laurent Aubouy1
1LEITAT TECHNOLOGICAL CENTER, Terrassa, Spain
Abstract | Extended Abstract

PO1087 Atmospheric Plasma surface treatment of Styrene-Butadiene Rubber
Cátia Carreira1, Ricardo Silva2, Vera V. Pinto2, Maria José Ferreira2, Fernando Sousa3, Fernando Silva4, Carlos M. Pereira4
1Faculdade Ciências Universidade Porto, Porto, Portugal, 2CTCP, S. João Madeira, Portugal, 3CEI, S. João Madeira, Portugal, 4FCUP, Porto, Portugal
Abstract | Extended Abstract

Poster - Nanostructures and nanoparticles

PO1088 Formation of plasma-generated nanostructures on polymer surfaces for various polymer types
Peter Munzert1, Christiane Praefke1, Ulrike Schulz1, Norbert Kaiser1
1Fraunhofer Institute for Applied Optics, Jena, Germany
Abstract | Extended Abstract

PO1089 Plasma functionalization of structured surfaces to control the formation of ice
Michael Haupt1, Jakob Barz2, Christian Oehr1, Thomas Hirth2, Dominik Raps3, Franz Gammel3, Hannelore Benien3, Volker Weiss4, Thomas Frauenheim4
1Fraunhofer IGB, Stuttgart, Germany, 2Institute for Interfacial Engineering, University of Stuttgart, Stuttgart, Germany, 3EADS Innovation Works, Munich, Germany, 4Bremen Center for Computational Materials Science, Universität Bremen, Bremen, Germany
Abstract | Extended Abstract

PO1090 Polyethylene surfaces by plasma nanotexturing from superhydrophilicity to superhydrophobicity with high adhesion and superhydrophobicity with low adhesion
Y.P. Li1, M.K. Lei1
1Dalian University of Technology, Dalian, China
Abstract | Extended Abstract

PO1091 Dendrite nanostructures formed by plasma-assisted vacuum evaporation of polymers
Andrey Shukurov1, Ivan Gordeev2, Ondřej Kylián2, Jessica Ponti3, Francois Rossi3, Danka Slavínská2, Hynek Biederman2
1Charles University in Prague, KMF MFF, Prague, Czech Republic, 2Charles University in Prague, Prague, Czech Republic, 3European Commission, Joint Research Centre, Institute for Health and Consumer Protection, Ispra, Italy
Abstract | Extended Abstract

PO1092 Surface nanostructuring using an atmospheric pressure remote micro-plasma
Ayman ALTAWEEL1, Thomas GRIES1, Thierry BELMONTE1
1institut jean lamour, nancy, France
Abstract | Extended Abstract

PO1093 Plasma Directed Assembly: Process Issues, Materials and Applications
Dimitrios Kontziampasis1, Athanasios Smyrnakis1, Vassilios Constantoudis1, Evangelos Gogolides1
1N.C.S.R. "Demokritos", Aghia Parakevi, Greece
Abstract | Extended Abstract

PO1094 Selective plasma treatment - enabling technology for Microstructring of MEMS and other related devices
Markus Gabriel1, Marko Eichler2, Ulrike Schoembs1
1SUSS MicroTec Lithography GmbH, Garching, Germany, 2Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany
Abstract | Extended Abstract

PO1095 TaN layers deposited by high power pulsed magnetron sputtering for CNT growth control
Tiberiu Minea1, Chengfei JIN2, Brigitte BOUCHET-FABRE3, Marie-Christine HUGON4, Nicolas MARSOT5, Fernando ALVAREZ6
1LPGP : CNRS-Unersity Paris-Sud, Orsay, France, 2LPGP: UMR8578 CNRS-University Paris-Sud, Orsay, France, 3Laboratoire Francis Perrin, CEA-CNRS URA 2453, CEA-Saclay, Gif sur Yvette, France, 4LPGP: UMR 8578 CNRS - University Paris-Sud, Orsay, France, 5LPGP: UMR 8578 CNRS-University Paris-Sud, Orsay, France, 6UNICAMP, Instituto de Fisica "Gleb Wataghin", Campinas, SP, Brazil
Abstract | Extended Abstract

PO1096 Growth and properties of AlN nanodots: Effects of V/III ratio and substrate bias potential
Zakaria Bouchkour1, Pascal Tristant1, Elsa Thune2, Christelle Dublanche-Tixier1, Cédric Jaoul1, René Guinebretière2
1SPCTS - Université de Limoges, Limoges, France, 2SPCTS - ENSCI, Limoges, France
Abstract | Extended Abstract

PO1097 Effect of strain on silica patterned thin films deposited on stainless steel due to an uplift process induced by plasma assisted nitriding
Gregory MARCOS1, Franck Cleymand1, Gustavo Lain1, Stephane Guilet2, Aurore Andrieux1, Thierry Czerwiec1
1Institut Jean Lamour, NANCY, France, 2LPN, Marcoussis, France
Abstract | Extended Abstract

PO1098 Wet and plasma-assisted oxidation of small Si nanowires at room temperature: reactive molecular dynamics study
Umedjon Khalilov1, Erik C. Neyts1, Geoffrey Pourtois2, Adri C. T. van Duin3
1University of Antwerp, Antwerp, Belgium, 2IMEC, Leuven, Belgium, 3Penn State University, Pennsylvania, United States
Abstract | Extended Abstract

PO1099 Plasma polymerized coating as a protective layer of carbon nanotubes grafted carbon fibers
Antinéa EINIG1, Jinbo BAI2, Pascal RUMEAU3, Jaques MAGUIN3, Youssef MAGGA2
1Ecole Centrale Paris, Châtenay-Malabry, France, 2Laboratoire de Mécanique des Sols, Structure et Matériaux, CNRS UMR 8579, Ecole Centrale Paris, Châtenay-Malabry, France, 3Institut Français du Textile et de l’Habillement, Ecully, France
Abstract | Extended Abstract

PO1100 Surface activation of structured organic plasma deposits: from superhydrophobic to superhydrophilic
Johannes Berndt1, Eva Kovacevic1, Hamid Acid1, Laifa Boufendi1
1GREMI, Orléans, France
Abstract | Extended Abstract

PO1101 Synthesis of Pt based catalyst by a novel plasma deposition method
Mathilde LAURENT-BROCQ1, Nathalie Job2, Jean-Jacques Pireaux1
1LISE - Namur University, Namur, Belgium, 2Laboratoire de Génie Chimique – Génie Catalytique, Liège University, Liège, Belgium
Abstract | Extended Abstract

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