Program
Monday, September 10, 2012Poster
Session, 15:15 - 16:25
Poster - Optical Coatings |
|
| PO1001 |
Optical Layer Systems for Product Authentication:
Interference, Scattering, Light Diffusion and Ellipsometric Encoding as Public, Hidden and Forensic Security Features
Uwe Beck1, Andreas Hertwig1, Ralph Stephanowitz1, Matthias Weise1, Dirk Hönig2, Stefan Schneider2, Ralph Domnick3, Matthias Belzner3 1BAM, Berlin, Germany, 2Accurion GmbH, Göttingen, Germany, 3Ara Coatings GmbH & Co. KG, Erlangen, Germany Abstract | Extended Abstract |
| PO1002 |
Wide-angle broadband AR coating by combining interference layers
with a plasma-etched gradient layer
Ulrike Schulz1, Peter Munzert1, Christiane Präfke1, Norbert Kaiser1 1Fraunhofer IOF, Jena, Germany Abstract | Extended Abstract |
| PO1003 |
Evolution of microstructural and chemical in-depth changes of variable index chromium-silicon mixed oxides induced by reactive ion beam mixing at the interface. Ramon Escobar Galindo1, Noelia Benito2, Pilar Herrero1, Olga Sanchez1, Carlos Palacio2 1ICMM-CSIC, Madrid, Spain, 2Universidad Autonoma de Madrid, Madrid, Spain Abstract | Extended Abstract |
| PO1004 |
Fabrication of conjugated polymer light-emitting devices prepared by plasma enhanced chemical vapor deposition of naphthalene Mojtaba Rajabi1, Seyed Iman Hosseini1, Marzieh Abbasi Firouzjah1, Amir Reza Ghassami1, Mohammad Reza Khani1, Babak Shokri1 1Shahid Beheshti University, Tehran, Iran Abstract | Extended Abstract |
| PO1005 |
Sensitization of Er3+ Emission in Er- and Yb-doped Si Thin Films by Laser Ablation Shinji Kawai1, Shuji Komuro2, Toru Katsumata2 1Industrial Technology Center of SAGA, Tosu, Japan, 2Toyo University, Kawagoe, Japan Abstract | Extended Abstract |
| PO1006 |
Remote plasma assisted deposition of organic luminescent thin films as UV active components in photonic structures Angel Barranco1, Francisco Aparicio2, Maria Alcaire2, Miguel Holgado3, Ana Borras2, Amadeu Griol4, Carlos A. Barrios5, Hans Sohlström6, Agustin R. Gonzalez-Elipe2 1ICMS-CSIC, Sevilla, Spain, 2Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Sevilla, Spain, 3Centro Laser UPM, Madrid, Spain, 4NTC-UPLV, Valencia, Spain, 5ISOM-UPM, Madrid, Spain, 6KTH, Stockholm, Sweden Abstract | Extended Abstract |
| PO1007 |
Deposition of Zinc Oxide as UV Protection Coating by MW-PECVD Stefan Merli1, Andreas Schulz1, Matthias Walker1, Rafael Oser2, Ulrich Stroth1 1Institute for Plasma Research, Stuttgart, Germany, 2Bayer MaterialScience Aktiengesellschaft, Leverkusen, Germany Abstract | Extended Abstract |
| PO1008 |
Development of optical microcavities based on amorphous thin films Ivan Braga Gallo1, Antonio Ricardo Zanatta1 1USP - IFSC, São Carlos, Brazil Abstract | Extended Abstract |
| PO1009 |
Thermochromic effect in Sm0.5Ca0.5MnO3 thin films elaborated by DC magnetron co-sputtering Alexis Boileau1, Fabien Capon2, Jean-François Pierson3, Silvère Barrat3, Patrick Laffez4 1Institut Jean Lamour-Université Lorraine, nancy, France, 2Institut Jean Lamour, Université de Lorraine, Nancy, France, 3Institut Jean Lamour, Université Lorraine, Nancy, France, 4Université F. Rabelais Tours, IUT de Blois, LEMA, Blois, France Abstract | Extended Abstract |
Poster - Films and surfaces for energy conversion and storage |
|
| PO1010 | An in situ-EDXRD study of reactively co-sputtered Cu(In,Ga)S2 layers Jonas Krause1, Stephan Brunken1, Klaus Ellmer1 1Helmholtz-Zentrum Berlin, Berlin, Germany Abstract | Extended Abstract |
| PO1011 |
Linking functional properties of transition metals to growth parameters Wouter Leroy1, Diederik Depla1 1Research Group DRAFT, Ghent University, Gent, Belgium Abstract | Extended Absract |
| PO1012 |
TiN layers as a back contact for chalcopyrite thin film solar cells Dariusz A. Zając1, Karsten Harbauer1, Somasundaram Murugesan1, Klaus Ellmer1 1Helmholtz Zentrum Berlin, Berlin, Germany Abstract | Extended Abstract |
| PO1013 |
a-SiCNH PACVD films grown from TMS/NH3 mixtures for Silicon PV
cells Laurent Thomas1, Isabelle Bousquet1, José Almeida Silva1, Sébastien Quoizola1, Emmanuel Hernandez1 1PROMES/CNRS, Perpignan, France Abstract | Extended Abstract |
| PO1014 |
Metal nitride thin films synthesized by reactive magnetron sputtering for supercapacitor applications Saïd Bouhtiyya1, Raul Lucio Porto2, Thierry Brousse2, Jean-François Pierson1, Fabien Capon1 1Institut Jean Lamour, Nancy, France, 2LGMPA, Nantes, France Abstract | Extended Abstract |
| PO1015 |
Progress on the comprehensive understanding of Si film structure and dynamics deposited on glass-substrates and Si-wafers by light scattering Angelos Kalampounias1, Ergina Farsari1, Eleutherios Amanatides1, Dimitrios Mataras1 1Dep. Chem. Engineering, Univ. of Patras, Patras, Greece Abstract | Extended Abstract |
| PO1016 |
Synthesis and characterization of La2NiO4-δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring Jérémie FONDARD1, Alain BILLARD1, Pascal BRIOIS1, Ghislaine BERTRAND1 1LERMPS, UTBM, Belfort, France Abstract | Extended Abstract |
| PO1017 | ATMOSPHERIC PLASMA TREATMENT OF FUEL CELL BIPOLAR PLATES Volker Buck1, Nicolas Woehrl2 1Uni. Duisburg-Essen, Duisburg, Germany, 2Uni. Duisburg-Essen and CENIDE, Duisburg, Germany Abstract | Extended Abstract |
| PO1018 | Metal-containing diamond like carbon (a-C:H:Me) as a functional coating for metallic bipolar plates "DiaPolar" Tom O'Donnell1, Jochen Brand1, Peter Kaestner2, Katarina Koster2, Günter Bräuer1, Kerstin Schmidt3, Justin Richards3 1Fraunhofer IST Braunschweig, Braunschweig, Germany, 2TU Braunschweig IOT, Braunschweig, Germany, 3Fraunhofer ICT, Wolfsburg, Germany Abstract | Extended Abstract |
| PO1019 | Plasma nitriding by strip hollow cathode method (SHC-PTT) of austenitic stainless steels for bipolar plates Krasimir Nikolov1, Katharina Köster1, Peter Kaestner1, Günter Bräuer1, Claus-Peter Klages1 1Institut für Oberflächentechnik IOT, Braunschweig, Germany Abstract | Extended Abstract |
| PO1020 | Towards synthesis of transition metal nitride thin films for Li-ion batteries: example of Cu3N and RuN Saïd Bouhtiyya1, Jean-François Pierson1, Fabien Capon1, Barbara Laik2, Jean-Pierre Peraira-Ramos2 1Institut Jean Lamour, Nancy, France, 2Institut de Chimie et des Matériaux Paris-Est UMR 7182 CNRS-UPEC, Thiais, France Abstract | Extended Abstract |
| PO1021 | Surface area nanostructuring with LIPSS formation using femtosecond laser Ricardo Serra1, João Carlos Oliveira2, Victor Oliveira3, Albano Cavaleiro2 1DEM, FCT UC, Coimbra, Portugal, 2SEG CEMUC, DEM, FCTUC, Coimbra, Portugal, 3ISEL / ICEMS, Lisbon, Portugal Abstract | Extended Abstract |
Poster - Plasma and ion etching / surface cleaning |
|
| PO1022 |
Numerically controlled local plasma jet oxidation of silicon Thomas Arnold1, Hendrik Paetzelt2, Georg Böhm2 1Leibniz-Institut für Oberflächenmodifizi, Leipzig, Germany, 2Leibniz-Institut für Oberflächenmodifizierung, Leipzig, Germany Abstract | Extended Abstract |
| PO1023 |
Silicon carbide surface micromachining using plasma ion etching of sacrificial layer Norbert Kwietniewski1, Mariusz Sochacki1, Jan Szmidt1, Andy Zhang2, Jang-Kwon Lim2, Mietek Bakowski2 1IMiO, Warsaw University of Technology, Warsaw, Poland, 2Acreo AB, Kista, Sweden Abstract | Extended Abstract |
| PO1024 |
Ion Beam Figuring of molds Thomas Tonert1, Thoralf Dunger1, Marcel Demmler1, Alfonz Luca1, Michael Zeuner1 1MicroSystems GmbH, Hohenstein-Ernstthal, Germany Abstract | Extended Abstract |
| PO1025 |
Rapid Stripping of Brass-plating on Fine Saw Wire by Triangle-type Multiple Magnetron Plasmas Hiroshi Fujiyama1, Kiyoshi Miyazaki1, Yusuke Kobayashi1, Naoshi Matsuo1, Masanori Shinohara1, Shin-ichiro Nishiyama2 1Nagasaki University, Nagasaki, Japan, 2Japan Fine Steel Co. Ltd, Sanyo-Onoda, Japan Abstract | Extended Abstract |
| PO1026 |
Scaling laws governing the NF3 cleaning plasma in a large area reactor George-Felix Leu1, Modrzynski Pawel2, Markus Klindworth2, Christoph Ellert3 1OC Oerlikon Solar Ltd, Truebbach, Switzerland, 2OC Oerlikon Solar Ltd., Truebbach, Switzerland, 3on leave from OC Oerlikon Solar Ltd., Truebbach, Switzerland Abstract | Extended Abstract |
| PO1027 |
Regeneration of Mineral Adsorbent by Nonthermal Plasma Desorption of Formaldehyde Katja Saulich1, Siegfried Müller1, Joachim Schomburg2 1INP Greifswald e.V., Greifswald, Germany, 2DURTEC GmbH, Neubrandenburg, Germany Abstract | Extended Abstract |
| PO1028 |
Residue Free Removal of Organic Contaminants on Micro Structured Surfaces by Use of an Atmospheric Pressure Plasma Leander Loewenthal1, Stephan Wieneke1, Jan H. Henze1, Lars ten Bosch1, Wolfgang Viöl1 1University of Applied Sciences and Arts, Göttingen, Germany Abstract | Extended Abstract |
| PO1029 |
Cleaning of Organic Contamination from EUV Optics Surfaces Using Hydrogen-based Plasmas Nikola Skoro1, Evangelos Gogolides1 1Institute of Microelectronics, Athens, Greece Abstract | Extended Abstract |
| PO1030 |
Removal of recontamination by cork taint from the surface of cork stoppers by atmospheric pressure plasma processes Joachim Schneider1, Martina Leins1, Andreas Schulz1, Matthias Walker1, Christian Kamm1, Ulrich Stroth1 1Uni Stuttgart, Inst. f. Plasmaforschung, Stuttgart, Germany Abstract | Extended Abstract |
| PO1031 |
Remove of silver tarnish films by using atmospheric-pressure plasma jets Michael Thomas1, Margret von Hausen1, Annika Maier2, Gerhard Eggert2 1Fraunhofer IST, Braunschweig, Germany, 2Stuttgart State Academy of Art and Design, Stuttgart, Germany Abstract | Extended Abstract |
| PO1032 |
Influences of surface-active substances on specific power inputs and on surface roughnesses of the metal product under plasma vacuum arc treatment Vladimir Arustamov1, Khatam Ashurov1, Khusniddinkhuja Kadirov1, Ilyos Khudaykulov1 1Arifov Institute of Electronics, Tashkent, Uzbekistan Abstract | Extended Abstract |
| PO1033 |
Plasma etching of aluminum nitride thin films prepared by magnetron sputtering method Piotr Firek1, Bartlomiej Stonio2, Rafal Chodun3, Jan Szmidt2, Krzysztof Zdunek3 1IMiO, Warsaw University of Technology, Warsaw, Poland, 2Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland, 3Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland Abstract | Extended Abstract |
| PO1034 |
The hydrophilic properties of the etched SiO2 glass using atmospheric dielectric barrier discharge plasma process Seung-chun Oh1, Jung-uk Shin1, Sang-sik Kim1 1Institute for Advanced Engineering, Yongin-si, South Korea Abstract | Extended Abstract |
| PO1035 |
Effects of the surface roughness on the visible transmittance of the glass using atmospheric pressure plasma etching process Jung-uk Shin1, Seung-chun Oh1, Sang-sik Kim1 1Institute for Advanced Engineering, Yongin-si, South Korea Abstract | Extended Abstract |
Poster - Physical vapour deposition |
|
| PO1036 | Experimental study of DC driven hybrid PVD-PECVD process Tereza Schmidtová1, Pavel Souček1, Petr Vašina1 1Masaryk university, Brno, Czech Republic Abstract | Extended Abstract |
| PO1037 | Remote Direct Current Plasma Sputtering for Various Coating Processes Jong-Kuk Kim1, Seunghun Lee1, Do-Geun Kim1 1Korea Institute of Materials Science, Changwon, South Korea Abstract | Extended Abstract |
| PO1038 | Integration of macro particle filter system in Larco®-technology
for ta-C-coatings in an industrial batch system Martin Holzherr1, Michael Falz1, Tobias Schmidt1, Hans-Joachim Scheibe2, Michael Leonhardt2, Carl-Friedrich Meyer2 1VTD Vakuumtechnik Dresden GmbH, Dresden, Germany, 2Fraunhofer IWS, Dresden, Germany Abstract | Extended Abstract |
| PO1039 | ON THE INJECTED GAS/ELECTRIC POWER RELATION FOR DEPOSITION EFFICIENCY CONTROL DURING THE GIMS DEPOSITION Krzysztof Zdunek1, Katarzyna Nowakowska-Langier2, Rafal Chodun1, Jerzy Dora3 1Warsaw University of Technology, Warsaw, Poland, 2National Centre for Nuclear Research, Otwock, Poland, 3Dora Power Systems, Wilczyce, Poland Abstract | Extended Abstract |
| PO1040 | Influence of the Ion Beam Current on Microstructures and Optical Properties of Al2O3 Thin Films by Oxygen Ion Beam Assisted Pulse Reactive Magnetron Sputtering Yudong Feng1, Jinxiao Wang1, Zhimin Wang1, Yi Wang1, Kai Zhao1, Xiaomei Su1, Hu Wang1 1Lanzhou Institute of Physics, Lanzhou, China Abstract | Extended Abstract |
| PO1041 |
Luminescent thin films prepared by combined reactive magnetron sputtering and plasma decomposition of non-volatile precursors Francisco Yubero1, Jorge Gil Rostra2, Agustín R. González-Elipe3 1ICMS (CSIC - U. Sevilla), Sevilla, Spain, 2ICMSE (CSIC - U. Sevilla), Sevilla, Spain, 3ICMSE (CSIC U. Sevilla), Sevilla, Spain Abstract | Extended Abstract |
| PO1042 |
Influence of the N2 partial pressure on the structure and properties of ZrAlN thin films Doris Luef1, Jörg Paulitsch1, Paul H. Mayrhofer1 1Montanuniversitaet Leoben, Leoben, Austria Abstract | Extended Abstract |
| PO1043 |
Arc-free reactive pulsed sputtering of Alumina from metalic target in oxide mode Holger Gerdes1, Ralf Bandorf1, Günter Bräuer1 1Fraunhofer IST, Braunschweig, Germany Abstract | Extended Abstract |
| PO1044 |
Combining a Magnetron Sputtering Plasma with an Electron-Cyclotron Resonance Plasma for the Deposition of Cu(In,Ga)S2 Films Thomas Welzel1, Karl Barucki2, Jonas Krause1, Karsten Harbauer1, Klaus Ellmer1 1Helmholtz-Zentrum Berlin, Berlin, Germany, 2IOT Innovative Oberflächentechnologien GmbH, Leipzig, Germany Abstract | Extended Abstract |
| PO1045 |
Understanding and using the current-voltage-pressure relationship in reactive magnetron sputtering for the growth of transparent conductive oxides Steffen Cornelius1, Mykola Vinnichenko1, Wolfhard Möller1 1Helmholtz-Zentrum Dresden-Rossendorf, Dresden, Germany Abstract | Extended Abstract |
| PO1046 |
Characterization of a triode sputter source used for the deposition of inner walls of narrow hollow cylinders Johann Laimer1, Eva Ruppert1, Herbert Störi1 1Vienna University of Technology, Wien, Austria Abstract | Extended Abstract |
| PO1047 |
Ability of conventional DC magnetron sputtering to coat complex substrates Anne-Lise THOMANN1, Constantin VAHLAS2, Lyacine ALOUI3, Eliane AMIN-CHALOUB4, Amael CAILLARD1, Eric MILLON5, Pascal BRAULT1, Mireille GAILLARD5, Nadjib SEMMAR4, Chantal BOULMER-LEBORGNE5 1GREMI / CNRS, Orléans Cedex2, France, 2CIRIMAT/INPT université de Toulouse, Toulouse cedex 4, France, 3CIRIMAT université de Toulouse, Toulouse cedex 4, France, 4GREMI / université d'Orléans, Orleans cedex 2, France, 5GREMI / université d'Orleans, Orleans cedex 2, France Abstract | Extended Abstract |
| PO1048 |
Formation of plasma technological influence of vacuum arc on the internal surfaces of metal pipes and putting of the protecting coatings Vladimir Arustamov1, Khatam Ashurov1, Khusniddinkhuja Kadirov1, Ilyos Khudaykulov1 1Arifov Institute of Electronics, Tashkent, Uzbekistan Abstract | Extended Abstract |
| PO1049 |
Particle-In-Cell Simulation of Closed Drift Type Linear Deposition Source Seunghun Lee1, Do-Geun Kim1, Jong-Kuk Kim1 1Korea Institute of Material Science, Changwon, South Korea Abstract | Extended Abstract |
| PO1050 |
Modeling the time dependency of the reactive sputter process Koen Strijckmans1, Wouter Leroy1, Diederik Depla1 1Ghent University, Gent, Belgium Abstract | Extended Abstract |
| PO1051 |
Features of DC magnetron sputtering of mosaic copper-graphite targets Valery Mitin1, Yury Mankelevich2, Alexander Pal1, Tatyana Rakhimova2, Alexey Ryabinkin2, Alexander Serov2, Alexey Mitin3, Nikolay Krasnobaev3 1Naco Technologies, Riga, Latvia, 2SINP MSU, Moscow, Russian Federation, 3VNIINM, Moscow, Russian Federation Abstract | Extended Abstract |
| PO1052 |
Sn Thin Film Deposition using a Hot Refractory Anode Vacuum Arc Isak Beilis1, Yosef Koulik2, Raymond Boxman2 1Fac Eng. Dp.Phys El. Tel Aviv Univer, Tel Aviv 69978, Israel, 2Tel Aviv University, Tel Aviv 69978, Israel Abstract | Extended Abstract |
| PO1053 | The Influence of Cathode Grain Size on the Arc Process and Coating Properties
Jianqiang Zhu1, Mats Johansson2, Peter Polcik3, Mats Ahlgren4, Johanna Rosén1, Lars Hultman1, Magnus Odén1 1IFM, Linköping University, Linköping, Sweden, 2Seco Tools AB, Fagersta, Sweden, 3Plansee Composite Materials GmbH, Lechbruck am See, Germany, 4Sandvik Tooling, Stockholm, Sweden Abstract | Extended Abstract |
| PO1054 | Pulse Plasma Ion Assisted EB-PVD with doping by ion sputtering of additional target Anatoly Kuzmichev1 1NTUU Kiev Polytechnical Institute, Kiev, Ukraine Abstract | Extended Abstract |
| PO1055 | Tungsten, Carbon and Beryllium Film Interaction with Plasma Produced by Terawatt Laser System Irradiation Cristian Lungu1, Corneliu Porosnicu1, Ionut Jepu1, Ana Mihaela Lungu1, Daniel Ursescu2, Razvan Dabu1, Cristiana E. Grigorescu3, Mariana Osiac4, Vincenc Nemanic5 1NILPRP, Bucharest, Romania, 2NILPR, Bucherest, Romania, 3INOE 2000, Bucharest, Romania, 4Physics Department, University of Craiova, Craiova, Romania, 5ISJ Ljubljana, Ljubljana, Slovenia Abstract | Extended Abstract |
Poster - Fundamentals of surface interaction and thin film growth |
|
| PO1056 |
Experimental and numerical study of sub-monolayer deposition of Ti on Si. Arindam Jana1, Ludovic Briquet2, Patrick Philipp2, Gerard Henrion3, Tom Wirtz2 1Centre de Recherche Public - Gabriel, Belvaux, Luxembourg, 2Centre de Recherche Public – Gabriel Lippmann., Belvaux, Luxembourg, 3Institut Jean Lamour, UMR CNRS – Université de Lorraine, Nancy, France Abstract | Extended Abstract |
| PO1057 |
Numerical simulations of the deposition of hexane molecules and fragments on silicon Lotta Mether1, Krister Henriksson1, Kai Nordlund1, Canan Turgut2, Patrick Philipp2 1University of Helsinki, University of Helsinki, Finland, 2Centre de Recherche Public – Gabriel Lippmann, Belvaux, Luxembourg Abstract | Extended Abstract |
| PO1058 |
Sticking of PS molecular fragments on silver (Ag) using sputter deposition Canan Turgut1, Lotta Mether2, Kai Nordlund2, Patrick Philipp3, Mohammed Belmahi4 1CRP Gabriel Lippmann, Luxembourg, Luxembourg, 2Accelerator Laboratory, University of Helsinki, Helsinki, Finland, 3Department “Science and Analysis of Materials, Centre de Recherche Public – Gabriel Lippmann, Luxembourg, Luxembourg, 4Institut Jean Lamour (IJL) CNRS UMR 7198, Université de Lorraine, nancy, France Abstract | Extended Abstract |
| PO1059 |
Effect of silicon substrate crystallinity on single atom plasma deposition/implantation Ludovic Briquet1, Arindam Jana1, Patrick Philipp1, Gérard Henrion2, Tom Wirtz1 1CRP Gabriel Lippmann, Belvaux, Luxembourg, 2Institut Jean Lamour, UMR CNRS - Université de Lorraine, Nancy, France Abstract | Extended Abstract |
| PO1060 |
Study of continuous and pulsed deposition of thin metal films by atomistic computer modelling Rudolf Hrach1, Vera Hrachova1 1Charles University, Prague 8, Czech Republic Abstract | Extended Abstract |
| PO1061 |
Structure and growth simulation of GLAD sputtered thin films Aurelien Besnard1, Corinne Nouveau1, Luc Carpentier2, Nicolas Martin2 1LaBoMaP, CLUNY, France, 2FEMTO-ST, BESANCON, France Abstract | Extended Abstract |
| PO1062 |
Characterization of the energy flux towards the substrate during magnetron sputter deposition of ZnO thin films Sven Bornholdt1, Naho Itagaki2, Kazunari Kuwahara2, Harm Wulff3, Masaharu Shiratani2, Holger Kersten1 1IEAP, University Kiel, Kiel, Germany, 2ISEE, Kyushu University, Fukuoka, Japan, 3IoP, University Greifswald, Greifswald, Germany Abstract | Extended Abstract |
| PO1063 |
ADVANTAGES OF ENERGY INFLUX MEASUREMENTS IN LOW PRESSURE PLASMA PROCESSES Anne-Lise THOMANN1, Pierre-Antoine CORMIER2, Nadjib SEMMAR3, Rémi DUSSART3, Vincent DOLIQUE4, Adil BALHARMI5, Stephanos KONSTANTINIDIS6 1GREMI / CNRS, Orléans Cedex2, France, 2GREMI Université d'Olréans, Orléans, France, 3GREMI / Université d'Orléans, Orléans, France, 4LMA / Université Claude Bernard LyonI, Villeurbanne, France, 5ChIPS / Université de Mons, Mons, Belgium, 6ChIPS, Université de Mons, Mons, Belgium Abstract | Extended Abstract |
| PO1064 |
Plasma-surface interactions: relationships between gas phase chemistry and film growth Xavier Landreau1, Christelle Dublanche-Tixier1, Pascal Tristant1 1SPCTS-CNRS-Université de Limoges, Limoges, France Abstract | Extended Abstract |
| PO1065 |
Elementary mechanisms of target poisoning during reactive sputtering Oliver Kreiter1, Carles Corbella1, Simon Große-Kreul1, Teresa de los Arcos1, Achim von Keudell1 1Ruhr-Universität Bochum - EP2, Bochum, Germany Abstract | Extended Abstract |
Poster - Plasma treatment of polymers and other soft matter |
|
| PO1066 | Plasma and laser surface activation of polymer coatings intended
for direct electroless metallization Piotr Rytlewski1 1Kazimierz Wielki University, Bydgoszcz, Poland Abstract | Extended Abstract |
| PO1067 | Plasma Activation of PEN polymers by Diffuse Coplanar Surface Barrier Discharge and Low Pressure Ion Bombardment Martin Kormunda1, Tomas Homola2, Jindrich Matousek1, Mirko Cernak3, Jaroslav Pavlik1, Zdenka Kolska1 1J.E. Purkinje University, Usti nad Labem, Czech Republic, 2Singapore Institute of Manufacturing Technology, Singapore, Singapore, 3Masaryk University, Brno, Czech Republic Abstract | Extended Abstract |
| PO1068 | Hydrophilization treatment of polyimide using Ar-O2 mixture gas surface wave plasma – Oxygen radical density and plasma parameter dependence Shigeru Ono1, Yoshinari Hirukawa1, Shigeru Ono1, Shuichi Suzuki1 1Tokyo City University, Tokyo, Japan Abstract | Extended Abstract |
| PO1069 | Semi-permanent hydrophilic thin layer prepared by APDBD for polyester Yoon Kee Kim1, Se Hoon Kim1 1Hanbat National University, Daejeon, South Korea Abstract | Extended Abstract |
| PO1070 | Fluorescence Analysis for Amines on Plasma Functionalized Surfaces Simone Reichstein1, Jan-Eric Ehlers1, Karl-Heinz Gericke1 1TU Braunschweig, PCI, Braunschweig, Germany Abstract | Extended Abstract |
| PO1071 |
An EPR/ENDOR study of free radicals in X-ray and plasma irradiated polymer powders. Ignacio Caretti1, Ignacio Jiménez1, Sabine Van Doorslaer2 1Materials Science Institute of Madrid, Madrid, Spain, 2University of Antwerp, Wilrijk, Belgium Abstract | Extended Abstract |
| PO1072 | Cross-linking of PDMS thin films in hydrogen CC-RF plasma Vladimir Danilov1, Hans-Erich Wagner1, Jürgen Meichsner1 1University of Greifswald, Greifswald, Germany Abstract | Extended Abstract |
| PO1073 | Mechanism of polymeric surface modification using by an atmospheric-pressure plasma jet Jun-Seok Oh1, Kyle Doherty1, Andrew Bowfield1, Rachal Wiliams1, Carl Sheridan1, Paul Unsworth1, Peter Weightman1, James W Bradley1 1University of Luiverpool, Liverpool, United Kingdom Abstract | Extended Abstract |
| PO1074 | In-situ FTIR-ATR spectroscopic investigations of atmospheric-pressure plasma modification of polyolefin thin films Zohreh Khosravi1, Alena Hinze2, Claus-Peter Klages2 1Institut für Oberflächentechnik,, Braunschweig, Germany, 2Institut für Oberflächentechnik,TU BS, Braunschweig, Germany Abstract | Extended Abstract |
| PO1075 |
Modification of PMMA surface properties by treatment with an RF atmospheric pressure plasma jet in presence of water vapors Tomy Acsente1, Maximilian Teodorescu1, Maria-Daniela Ionita1, Gheorghe Dinescu1 1NILPRP, Bucharest Magurele, Romania Abstract | Extended Abstract |
| PO1076 | Atmospheric-Pressure Plasma Treatment of Polymeric Surfaces Using Diffuse Coplanar Surface Barrier Discharge Jana Kubincová1, Barbara Hanselmann2, Dirk Hegemann2, Dušan Kováčik1, Mirko Černák1 1Comenius University, Bratislava, Slovakia, 2Empa, Swiss Federal Laboratories for Materials Science and Technology, St. Gallen, Switzerland Abstract | Extended Abstract |
| PO1077 | Functional coatings for polymer composites Adam Babik1, Lukas Hoferek1, Drahomira Janova1, Vladimir Cech1 1Brno University of Technology, Brno, Czech Republic Abstract | Extended Abstract |
| PO1078 | Morphology of Sputtered Gold Thin Films on Si and PET Martin Amberg1, Axel Ritter1, Patrick Rupper1, Barbara Hanselmann1, Jörg Patscheider1, Dirk Hegemann1 1Empa, Materials Science and Technology, St. Gallen, Switzerland Abstract | Extended Abstract |
| PO1079 |
Metallic Coating of Thermally Unstable Substrates, Especially Wooden Surfaces, by use of a non-thermal Atmospheric Pressure Plasma Jet Lars ten Bosch1, Leander Loewenthal1, Stephan Wieneke1, Wolfgang Viöl1 1University of Applied Sciences and Arts, Göttingen, Germany Abstract | Extended Abstract |
| PO1080 |
Copper thin films deposited on polymers by RF-IPVD. Correlations between film properties and discharge parameters. Ismael Guesmi1, Caroline Boisse-Laporte1, Renato Bisaro2, Jean Bretagne1 1LPGP UMR 8578, Orsay, France, 2THALES, Palaiseau, France Abstract | Extended Abstract |
| PO1081 |
PECVD of silicon oxide on PTFE surface with non-thermal atmospheric pressure plasma jets Jan Schäfer1, Rüdiger Foest1, Antje Quade1, Vít Kudrle2, Jaroslav Hnilica2 1INP Greifswald e.V., Greifswald, Germany, 2DPE Masaryk University, Brno, Czech Republic Abstract | Extended Abstract |
| PO1082 |
Plasma Source for UV Assisted Atomic Layer Deposition of Metal Oxides on Polymer Substrates Tommi Kääriäinen1, Marja-Leena Kääriäinen1, David Cameron1 1Lappeenranta University of Technology, Mikkeli, Finland Abstract | Extended Abstract |
| PO1083 |
Surface engineering of textiles using He/Dodecyl acrylate plasma at atmospheric pressure Prasanta Kumar Panda1, Manjeet Jassal2, Ashwini Kumar Agrawal3 1SMITA Research group, IIT Delhi, New delhi, India, 2SMITA Research group, IIT Delhi, New Delhi, India, 3SMITA Research group,IIT Delhi, New delhi, India Abstract | Extended Abstract |
| PO1084 |
Applications of Low Pressure Plasma in High-tech Textiles Rubel Alam1, Kh. M. Gaffar Hossain1, Günter Grabher1, Mokbul Hossain2 1V-Trion GmbH, Hohenems, Austria, 2Sefar AG, Thal, Swaziland Abstract | Extended Abstract |
| PO1085 |
Sensitive textile fibers Martin Drabik1, Enrico Koerner1, Martin Amberg1, Dirk Hegemann1 1Empa, St. Gallen, Switzerland Abstract | Extended Abstract |
| PO1086 |
Poly(acrylic) nanocoatings deposited by AP-PECVD processes on paper substrates for packaging applications Llorenç Bautista1, Jordi Mota1, Laia Crespo1, José Manuel García1, Meritxell Martínez1, Laurent Aubouy1 1LEITAT TECHNOLOGICAL CENTER, Terrassa, Spain Abstract | Extended Abstract |
| PO1087 |
Atmospheric Plasma surface treatment of Styrene-Butadiene Rubber Cátia Carreira1, Ricardo Silva2, Vera V. Pinto2, Maria José Ferreira2, Fernando Sousa3, Fernando Silva4, Carlos M. Pereira4 1Faculdade Ciências Universidade Porto, Porto, Portugal, 2CTCP, S. João Madeira, Portugal, 3CEI, S. João Madeira, Portugal, 4FCUP, Porto, Portugal Abstract | Extended Abstract |
Poster - Nanostructures and nanoparticles |
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| PO1088 | Formation of plasma-generated nanostructures on polymer surfaces for various polymer types Peter Munzert1, Christiane Praefke1, Ulrike Schulz1, Norbert Kaiser1 1Fraunhofer Institute for Applied Optics, Jena, Germany Abstract | Extended Abstract |
| PO1089 | Plasma functionalization of structured surfaces to control the formation of ice Michael Haupt1, Jakob Barz2, Christian Oehr1, Thomas Hirth2, Dominik Raps3, Franz Gammel3, Hannelore Benien3, Volker Weiss4, Thomas Frauenheim4 1Fraunhofer IGB, Stuttgart, Germany, 2Institute for Interfacial Engineering, University of Stuttgart, Stuttgart, Germany, 3EADS Innovation Works, Munich, Germany, 4Bremen Center for Computational Materials Science, Universität Bremen, Bremen, Germany Abstract | Extended Abstract |
| PO1090 | Polyethylene surfaces by plasma nanotexturing from superhydrophilicity to superhydrophobicity with high adhesion and superhydrophobicity with low adhesion Y.P. Li1, M.K. Lei1 1Dalian University of Technology, Dalian, China Abstract | Extended Abstract |
| PO1091 | Dendrite nanostructures formed by plasma-assisted vacuum evaporation of polymers Andrey Shukurov1, Ivan Gordeev2, Ondřej Kylián2, Jessica Ponti3, Francois Rossi3, Danka Slavínská2, Hynek Biederman2 1Charles University in Prague, KMF MFF, Prague, Czech Republic, 2Charles University in Prague, Prague, Czech Republic, 3European Commission, Joint Research Centre, Institute for Health and Consumer Protection, Ispra, Italy Abstract | Extended Abstract |
| PO1092 | Surface nanostructuring using an atmospheric pressure remote micro-plasma Ayman ALTAWEEL1, Thomas GRIES1, Thierry BELMONTE1 1institut jean lamour, nancy, France Abstract | Extended Abstract |
| PO1093 | Plasma Directed Assembly: Process Issues, Materials and Applications Dimitrios Kontziampasis1, Athanasios Smyrnakis1, Vassilios Constantoudis1, Evangelos Gogolides1 1N.C.S.R. "Demokritos", Aghia Parakevi, Greece Abstract | Extended Abstract |
| PO1094 | Selective plasma treatment - enabling technology for Microstructring of MEMS and other related devices Markus Gabriel1, Marko Eichler2, Ulrike Schoembs1 1SUSS MicroTec Lithography GmbH, Garching, Germany, 2Fraunhofer Institute for Surface Engineering and Thin Films, Braunschweig, Germany Abstract | Extended Abstract |
| PO1095 | TaN layers deposited by high power pulsed magnetron sputtering
for CNT growth control Tiberiu Minea1, Chengfei JIN2, Brigitte BOUCHET-FABRE3, Marie-Christine HUGON4, Nicolas MARSOT5, Fernando ALVAREZ6 1LPGP : CNRS-Unersity Paris-Sud, Orsay, France, 2LPGP: UMR8578 CNRS-University Paris-Sud, Orsay, France, 3Laboratoire Francis Perrin, CEA-CNRS URA 2453, CEA-Saclay, Gif sur Yvette, France, 4LPGP: UMR 8578 CNRS - University Paris-Sud, Orsay, France, 5LPGP: UMR 8578 CNRS-University Paris-Sud, Orsay, France, 6UNICAMP, Instituto de Fisica "Gleb Wataghin", Campinas, SP, Brazil Abstract | Extended Abstract |
| PO1096 | Growth and properties of AlN nanodots: Effects of V/III ratio and substrate bias potential Zakaria Bouchkour1, Pascal Tristant1, Elsa Thune2, Christelle Dublanche-Tixier1, Cédric Jaoul1, René Guinebretière2 1SPCTS - Université de Limoges, Limoges, France, 2SPCTS - ENSCI, Limoges, France Abstract | Extended Abstract |
| PO1097 | Effect of strain on silica patterned thin films deposited on stainless steel due to an uplift process induced by plasma assisted nitriding Gregory MARCOS1, Franck Cleymand1, Gustavo Lain1, Stephane Guilet2, Aurore Andrieux1, Thierry Czerwiec1 1Institut Jean Lamour, NANCY, France, 2LPN, Marcoussis, France Abstract | Extended Abstract |
| PO1098 | Wet and plasma-assisted oxidation of small Si nanowires at room temperature: reactive molecular dynamics study Umedjon Khalilov1, Erik C. Neyts1, Geoffrey Pourtois2, Adri C. T. van Duin3 1University of Antwerp, Antwerp, Belgium, 2IMEC, Leuven, Belgium, 3Penn State University, Pennsylvania, United States Abstract | Extended Abstract |
| PO1099 | Plasma polymerized coating as a protective layer of carbon nanotubes grafted carbon fibers Antinéa EINIG1, Jinbo BAI2, Pascal RUMEAU3, Jaques MAGUIN3, Youssef MAGGA2 1Ecole Centrale Paris, Châtenay-Malabry, France, 2Laboratoire de Mécanique des Sols, Structure et Matériaux, CNRS UMR 8579, Ecole Centrale Paris, Châtenay-Malabry, France, 3Institut Français du Textile et de l’Habillement, Ecully, France Abstract | Extended Abstract |
| PO1100 | Surface activation of structured organic plasma deposits: from superhydrophobic to superhydrophilic Johannes Berndt1, Eva Kovacevic1, Hamid Acid1, Laifa Boufendi1 1GREMI, Orléans, France Abstract | Extended Abstract |
| PO1101 | Synthesis of Pt based catalyst by a novel plasma deposition method Mathilde LAURENT-BROCQ1, Nathalie Job2, Jean-Jacques Pireaux1 1LISE - Namur University, Namur, Belgium, 2Laboratoire de Génie Chimique – Génie Catalytique, Liège University, Liège, Belgium Abstract | Extended Abstract |