Program



Monday, September 13, 2010Poster Session, 15:15 - 16:25

Poster - Optical Coatings

PO1001 Improving the optical properties of titanium nitride based coatings for industrial solar thermal applications
Ramon Escobar Galindo1, Miriam Yuste1, Olga Sanchez1, Jose Maria Albella1
1Instituto Ciencia Materiales Madrid, Madrid, Spain
PO1002 Photoluminescence of Nd-doped TiO2 Thin Films by Laser Ablation
Shinji Kawai1, Shuji Komuro2, Toru Katsumata2
1AIST, Tsukuba, Japan, 2Toyo University, Kawagoe, Japan
PO1003 INFLUENCE OF SUBSTRATE ON STRUCTURAL AND OPTICAL PROPERTIES OF CaTiO3:Pr3+ DEPOSED BY RADIOFREQUENCY REACTIVE MAGNETRON SPUTTERING IN ELECTROLUMINESCENCE STRUCTURE
Angélique Bousquet1, Ludovic Sarakha1, Fadi Zoubian1, Eric Tomasella1, Philippe Boutinaud1, Rachid Mahiou1
1Laboratoire des Matériaux Inorganiques, Aubière, France
PO1004 Investigation of the working pressure effect on NdNiO3 thin films deposited by reactive magnetron co-sputtering followed by a soft annealing process.
Alexis Boileau1, Fabien CAPON2, Jean-François PIERSON2, Silvère BARRAT2, Patrick LAFFEZ3
1Institut Jean Lamour-CP2S-EcoleDesMines, Nancy, France, 2Institut Jean Lamour, Département CP2S, UMR CNRS 7198, Ecole des Mines, Parc de Saurupt, Nancy, France, 3Université de Tours, IUT de Blois, Laboratoire d'Electrodynamique des Matériaux Avancés, UMR CNRS CEA 6187, Place Jean Jaurès, Blois, France
PO1005 Elaboration and characterisations of NdCoO3 thin films prepared by DC magnetron co-sputtering
Fabien Capon1, Alexis Boileau1, David Horwat1, Jean-François Pierson1
1Institut Jean Lamour, Nancy, France
PO1006 Physical vapour deposition and plasma-etching of organic compounds for optical applications
Ulrike Schulz1, Christiane Präfke1, Peter Munzert1, Christoph Goedeker1, Norbert Kaiser1
1Fraunhofer IOF, Jena, Germany

Poster - Computer Modeling of Film Growth and Structure

PO1007 High temperature simulations of the early stage growth of Ge quantum dots on silicon based substrates with the kinetic Monte Carlo code NASCAM.
Stéphane Lucas1, Pavel Moskovkin1
1University of Namur (FUNDP) - PMR, Namur, Belgium
PO1008 New Si-B-C-N materials: Combining electrical conductivity with extremely high thermal stability
Jiri Houska1, Simon Kos1, Petr Zeman1, Jiri Capek1, Pavel Calta1, Petr Steidl1, Jaroslav Vlcek1
1University of West Bohemia, Plzen, CzechRepublic
PO1009 Nano structured thin films by GLAD: a simulation approach
Aurélien Besnard1, Nicolas Martin1, Luc Carpentier1
1Institut FEMTO-ST, Besançon, France
PO1010 Nanostructure of Thin Films Grown by Deposition of Isotropically Distributed Gaseous Particles
Rafael Álvarez1, Pablo Romero-Gomez1, Jorge Gil-Rostra1, Jose Cotrino1, Francisco Yubero1, Alberto Palmero1, Agustin R. Gonzalez-Elipe1
1ICMSE, CSIC, Sevilla, Spain

Poster - Electro and Magneto Functional Films

PO1011 Granular magnetoresistive films preparation and characterization
Cristian P. LUNGU1, Ionut JEPU1, Ion MUSTATA1, Ana Mihaela LUNGU1, Catalin TICOS1, Corneliu POROSNICU1, Alexandru ANGHEL1, Petrica CHIRU1, Victor KUNCSER2
1NILPRP, Bucharest, Romania, 2INCDFM, Bucharest, Romania
PO1012 Electronic properties of thin AlN films deposited by magnetron sputtering method on silicon substrates
Piotr Firek1, Krzysztof Zdunek2, Jan Szmidt3, Rafal Chodun2, Katarzyna Nowakowska-Langier4, Michal Waskiewicz3
1Institute of Microelectronics and Optoel, Warsaw, Poland, 2Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland, 3Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland, 4The Andrzej Soltan Institute for Nuclear Studies, Warsaw, Poland
PO1013 Iron Doped Ba0,6 Sr0,4 Ti1-x Fex O3 Thin Films Deposited by RF Magnetron Co-sputtering
Florian Stemme1, Holger Gesswein1, Joachim R. Binder1, Michael Bruns1
1Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen, Germany
PO1014 Sputter deposited Al2O3, SiO2 and Si3N4 films for electrical insulation at high temperatures
Hagen Bartzsch1, Daniel Glöß1, Pierre Pötschick1, Matthias Gittner1, Peter Frach1, Johannes Hartung2, Wolfgang Brode3
1Fraunhofer FEP, Dresden, Germany, 2Von Ardenne Anlagentechnik GmbH, Dresden, Germany, 3Siegert TFT GmbH, Hermsdorf, Germany
PO1015 Ni/YSZ cermet sputter deposited under reactive atmopsheres: potential anode for SOFC
Pascal BRIOIS1, Alain BILLARD1
1LERMPS-UTBM, Belfort, France
PO1016 Hydrogenated carbon layer system for sensory applications
Saskia Biehl1, Sebastian Staufenbiel1, Frank Hauschild1
1Fraunhofer IST, Braunschweig, Germany
PO1017 Performance of TiO2 films obtained by cathodic arc deposition as carbon monoxide gas sensor
Adriana Márquez1, Ariel Kleiman1, Diego Lamas2
1Plasma Physics Institute - FCEN, UBA, Buenos Aires, Argentina, 2Centro de Investigaciones en Sólidos , CONICET-CITEDEF, Villa Martelli, Argentina

Poster - HiPIMS

PO1018 A simplified model of a high-power pulsed magnetron sputtering discharge
Tomas Kozak1, Andrea Dagmar Pajdarova1
1University of West Bohemia, Plzen, CzechRepublic
PO1019 The evolution of the IEDF in a low pressure HIPIMS discharge
Phitsanu Poolcharuansin1, James Bradley1
1The University of Liverpool, Liverpool, UnitedKingdom
PO1020 Time-resolved Langmuir probe measurements during modulated pulsed power reactive magnetron sputtering of Cr/CrN
Bernd Liebig1, James W Bradley1, Nicholas St J Braithwaite2, Peter J Kelly3, Roman Chistyakov4, Bassam Abraham4
1University of Liverpool, Liverpool, UnitedKingdom, 2The Open University, Milton Keynes, United Kingdom, 3Manchester Metropolitan University, Manchester, United Kingdom, 4Zpulser, LLC, Mansfield, MA, United States
PO1021 Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O atmosphere
Martin Čada1, Zdeněk Hubička2, Petr Adámek2, Vítězslav Straňák2, Lubomír Jastrabík2
1Institute of Physics of the AS CR, v.v.i, Prague 8, CzechRepublic, 2Institute of Physics of the AS CR, v.v.i., Prague 8, Czech Republic
PO1022 Time-resolved diagnostics of high power pulsed magnetron discharges during formation of antimicrobial Ti-Cu thin films
Vitezslav Stranak1, Martin Cada2, Zdenek Hubicka2, Harm Wulff3, Karsten Schroeder4, Rainer Hippler3
1University of Greifswald, Greifswald, Germany, 2Academy of Sciencies of the Czech Republic, Institute of Physics, Prague, Czech Republic, 3University of Greifswald, Institute of Physics, Greifswald, Germany, 4Leibniz Institute for Plasma Science and Technology e.V., Greifswald, Germany
PO1023 Characterization of a High-Power Impulse Magnetron Sputtering discharge by Laser Induced Fluorescence Spectroscopy
Nikolay Britun1, Stephanos Konstantinidis1, Rony Snyders2
1Lab. Inorganic and Analytical Chemistry, Mons, Belgium, 2Lab. Inorganic and Analytical Chemistry; Materia Nova Research Center, Mons, Belgium
PO1024 Investigation of HIPIMS discharge by energy resolved mass spectrometry in a reactive atmosphere with Oxygen content
Yolanda Aranda Gonzalvo1, Arutiun P. Ehiasarian2
1Hiden Analytical Ltd., Warrington, UnitedKingdom, 2Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield, United Kingdom
PO1025 Experimental investigation of physical processes in the high power pulsed magnetron discharge
Ivan Shchelkanov1, Georgiy Khodachenko2, Galina Krashevskaya2, Artyom Sokolov2
1NRNU, Moscow, RussianFederation, 2NRNU MEPhI, Moscow, Russian Federation
PO1026 Effect of the enlarged target power densities during shortened voltage pulses on high power impulse magnetron sputtering of zirconium
Jiri Rezek1, Jan Lazar2, Jaroslav Vlcek2
1Dep. of Physics, Uni. of West Bohemia, Plzen, CzechRepublic, 2Department of Physics, University of West Bohemia, Plzen, Czech Republic
PO1027 Dual-magnetron open field sputtering system for sideways deposition of thin films
Asim Aijaz1, Daniel Lundin1, Petter Larsson1, Ulf Helmersson1
1IFM, Linköping University, Linköping, Sweden
PO1028 The influence of pulse shape, length and peak current density on ion flux to the substrate, deposition rate and plasma composition for high power pulsed sputtering discharges.
Frank Papa1, Holger Gerdes2, Ralf Bandorf2, Arutiun Ehiasarian3, Guenter Braeuer2, Thomas Krug1, Roel Tietema1
1Hauzer Techno Coating BV, Venlo, Netherlands, 2Fraunhofer-Institut für Schicht- und Oberflächentechnik, IST, Braunschweig, Germany, 3Materials and Engineering Research Institute Sheffield Hallam University, Sheffield, United Kingdom
PO1029 Process Control for TiO2 Deposition Using HiPIMS
Paul Barker1, Glen West1, Peter Kelly1, James Bradley2
1Manchester Metropolitan University, Manchester, UnitedKingdom, 2University of Liverpool, Liverpool, United Kingdom
PO1030 Turning HIPIMS/HPPMS into a Product
Christoph Schiffers1, Werner Kölker1, Stephan Bolz1, Walter May1
1CemeCon AG, Wuerselen, Germany
PO1031 Important aspects of reactive High Impulse Power Magnetron Sputtering
Martynas Audronis1, Victor Bellido-Gonzalez1, Benoit Daniel1
1Gencoa Ltd, Liverpool, UnitedKingdom
PO1032 Optical properties of oxide thin films deposited by reactive HiPIMS
Montri Aiempanakit1, Petter Larsson2, Jens Jensen3, Tomáš Kubart4, Ulf Helmersson2
1IFM Linkoping University, Linkoping, Sweden, 2Plasma & Coatings Physics Division, IFM-Materials Physics, Linköping University, Linköping, Sweden, 3Thin film Physics Division, IFM-Materials Physics, Linköping University, Linköping, Sweden, 4The Ångström Laboratory, Uppsala University, Uppsala, Sweden
PO1033 Deposition of zinc oxide thin film on wire by DCMS / HiPIMS techniques
Antoine Lejars1, David Duday1, David Horwat2, Patrick Choquet1, Philippe Pigeat2, Tom Wirtz1
1Centre de Recherche Public - Gabriel Lippmann, Belvaux, Luxembourg, 2Institut Jean Lamour, Nancy, France
PO1034 Pulsed Magnetron Sputtering Systems Used for the Deposition of TiO2 and TiO2:N Thin Films
Zdeněk Hubička1, Martin Čada1, Štepán Kment1, Lubomír Jastrabík1
1Institute of Physics ASCR, v.v.i., Prague 8, CzechRepublic
PO1035 MF-Superimposed Reactive HiPIMS for Deposition of ZnO:Al
Holger Gerdes1, Ralf Bandorf1, Paul Barker2, Peter Kelly2, Günter Bräuer1
1Fraunhofer IST, Braunschweig, Germany, 2Surface Engineering Group, Manchester, United Kingdom
PO1036
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PO1037 COMPARISON OF THE PROPERTIES OF TiN AND CrN COATINGS SYNTHESISED BY REACTIVE ARC EVAPORATION AND HIGH POWER IMPULSED MAGNETRON SPUTTERING
Frédéric Lapostolle1, Amélie Guillaumot1, Jean François Pierson2, David Pilloud2, Alain Billard1
1LERMPS UTBM, Belfort, France, 2IJL, Nancy, France
PO1038
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PO1039 First HIPIMS tests for superconducting Niobium films
Wil Vollenberg1, Sergio Calatroni2, Anna Gustafsson2
1CERN-TS-VSC, Geneva 23, Switzerland, 2CERN-TE-VSC, Geneva 23, Switzerland
PO1040 Thin Nickel layer growth on PET and PC by HIPIMS and DC sputtering
Alessandro Patelli1, Simone Vezzu'1, Piero Schiavuta1, Lorenzo Zottarel1, Marino Colasuonno1, Valentino Rigato2
1CIVEN, Marghera - Venezia, Italy, 2LNL - INFN, Legnaro (PD), Italy

Poster - Plasma and Ion Etching and Activation

PO1041 Hydrogen plasma etching of silicon dioxide in a hollow-cathode system
Stephen Muhl1, Ovidio Peña2, Wendi López3, Luis Rodríguez-Fernández4, Jose Luis Ruvalcaba-Sil4
1IIM-UNAM, Mexico, Mexico, 2Institut de Ciencia de Materials de Barcelona, Barcelona, Spain, 3Instituto de Investigaciones en Materiales, U.N.A.M., Mexico, Mexico, 4Instituto de Fisica, U.N.A.M., Mexico, Mexico
PO1042 Surface characterization after subaperture Reactive Ion Beam Etching
André Miessler1, Thomas Arnold1
1IOM Leipzig, Leipzig, Germany
PO1043 Etching mechanisms during Plasma Jet Machining of silicon carbide
Inga-Maria Eichentopf1, Thomas Arnold1
1IOM Leipzig, Leipzig, Germany
PO1044
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PO1045 Carbon layers cleaning from inside of narrow gaps by a RF glow discharge
Cristian Stancu1, Maximilian Teodorescu1, Aurelian-Catalin Galca2, Gheorghe Dinescu1
1NILPRP, Magurele, Ilfov, Romania, 2NIMP, Magurele, Ilfov, Romania
PO1046 INVESTIGATION OF THE INFLUENCE OF OXYGEN PLASMA ON THE COPPER SURFACE
Karola Richter1, Christoph Kubasch1, Johann-Wolfgang Bartha1
1Technische Universität Dresden, Dresden, Germany
PO1047 Effect of plasma treatment on the properties of Fe- and Co- based electrocatalysts
Natalie Savastenko1, Volker Brüser1, Kirsten Anklam1, Stefan Müller1, Andreas Schmuhl2, Henrik Junge3
1INP Greifswald e.V., Greifswald, Germany, 2AMT Analysenmesstechnik GmbH, Rostock, Germany, 3Leibniz-Institut für Katalyse e. V., Rostock, Germany
PO1048 Effects of atmospheric pressure plasma in aqueous solution on dissolution of copper residues
Won Gyu Lee1, Cheon Kwang Ko1
1Kangwon National University, Chuncheon, SouthKorea
PO1049 The Surface Texturing of SCM 415 Steel by Using Electrical Discharge Machining and Ion Beam Etching Methods
Jung-Dae Kwon1, Seong-Hwan Yun1, Seunghun Lee1, Do-Geun Kim1, Jong-Kuk Kim1
1Korea Institute of Materials Science, Changwonsi, SouthKorea
PO1050 Reliable Fine Interconnection as Forming Trench on Polyimide Film
JONGJOO RHA1, JONGKUK KIM2, JUNGDAE KWON3
1Korea Institute of Materials Science, Changwon, SouthKorea, 2KOREA INSTITUTE OF MATERIALS AND SCIENCE, Changwon, South Korea, 3INSTITUTE OF MATERILAS AND SCIENCE, CHANGWON, South Korea
PO1051 Comparison between hexatriacontane and acid stearic behaviours under late Ar-O2 post-discharge.
Euclides Alexandre Bernardelli1, Thierry Belmonte2, Fabienne Poncin-Epaillard3, Ana Maria Maliska4
1Institut Jean Lamour, Nancy, France, 2Institut Jean Lamour, Department of Physics and Chemistry of Solids and Surfaces, Nancy-Université, CNRS, Parc de Saurupt, CS 14234, Nancy, France, 3Laboratoire Polymères Colloïdes Interfaces, UMR CNRS 6120, Université du Maine, Avenue O Messiaen, Le Mans, France, 4Universidade Federal de Santa Catarina, Laboratório de Materiais, Departamento de Engenharia Mecânica, 88040–900 Florianópolis, SC, Brasil., Florianópolis, Brazil
PO1052 Ion Beam Figuring (IBF) of High Precision Aspherical Optics
Frank Allenstein1, Michael Zeuner1, Marcel Demmler1, Thoralf Dunger1, Matthias Nestler1, Sven Kiontke2
1Roth & Rau MicroSystems GmbH, Hohenstein-Ernstthal, Germany, 2asphericon GmbH, Jena, Germany
PO1053 DBD Excimer VUV source for surface treatment without direct plasma contact
Siegmar Rudakowski1, Markus Roth1
1OSRAM GmbH, Wipperfürth, Germany

Poster - Carbon-Based Films

PO1054 High rate deposition of DLC coatings from pulsed plasma using different carbon containing precursors
Hirotaka Ito1, kenji Yamamoto2, Koichiro Akari3, Satoshi Hirota3
1Materials Research Laboratory, Kobe Stee, Kobe, Japan, 2Materials Research Lab, Kobe Steel Ltd., Hyogo, Japan, 3Advanced Products and Technology Dept, Kobe Steel Ltd., Hyogo, Japan
PO1055 High rate deposition of hard a-C:H films using microwave excited plasmas-assisted CVD
Marcus Günther1, Ingmar Bialuch2, Siegfried Peter1, Klaus Bewilogua2, Frank Richter1
1Technical University of Chemnitz, Chemnitz, Germany, 2Fraunhofer-Institute for Surface Engineering and Thin Films, Braunschweig, Germany
PO1056
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PO1057 Deposition and structure characterization of carbon films prepared at atmospheric pressure by plasma jet
Vitas Valinčius1, Liutauras Marcinauskas2, Alfonsas Grigonis3
1Lithuanian Energy Institute, Kaunas, Lithuania, 2Lithuanian Energy Institute, Plasma Processing Laboratory/Kaunas University of Technology, Department of Physics, Kaunas, Lithuania, 3Department of Physics, Kaunas University of Technology, Kaunas, Lithuania
PO1058 Growth of nitrogen-containing diamond-like carbon using a magnetized sheet plasma source
Leo Mendel Rosario1, Rommel Paulo Viloan2, Michelle Marie Villamayor2, Roy Tumlos3, Henry Ramos2
1FEATI University, Manila, Philippines, 2National Institute of Physics, University of the Philippines, Diliman, Quezon City, Philippines, 3University of the Philippines, Manila, Manila City, Philippines
PO1059 On the influence from micro topography on the structure and growth of low friction amorphous carbon PVD coatings
Harald Nyberg1, Julia Gerth2, Johanna Olofsson2, Urban Wiklund2, Staffan Jacobson2
1Ångström Tribomaterials Group, UU, Uppsala, Sweden, 2Tribomaterials Group, The Ångström Laboratory, Uppsala University, Uppsala, Sweden
PO1060
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PO1061
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PO1062 Mechanical and structural properties of thin sputtered a-C and CNx layers to polymer substrates
Zdenek Stryhal1, Hartmut Kupfer1, Frank Richter1, Arndt Schumann1, Jens Sumpf1
1TU Chemnitz, Chemnitz, Germany
PO1063 Study of mechanical, physical and chemical properties of a-C:H thin films deposited by reactive magnetron sputtering in d.c. pulsed mode.
Julien L. Colaux1, Thierry Delvigne2, Ernst Breuer3, François Van dievoet4, David Strivay5, Stéphane Lucas6
1University of Namur (FUNDP) - PMR, Namur, Belgium, 2Delta Services Industriels (DSI), Froyennes, Belgium, 3Breuer Technical Development (BTD), MALMEDY, Belgium, 4BFB OIL RESEARCH, Gembloux, Belgium, 5Univerisyt of Liège (ULg), Liège, Belgium, 6University of Namur (FUNDP) - PMR, Namur, Belgium
PO1064 Study on the properties of modified amorphous carbon thin films deposited by PECVD
Adrian Stoica1, Valentin Mocanu2, Magdalena Kadlecikova3, Vratislav Perina4, Petr Klapetek5, Daniel Franta2, David Necas2, Pavel Slavicek2, Vilma Bursikova2
1Masaryk University, FS, DPE, Brno, CzechRepublic, 2Masaryk University, Faculty of Science, Department of Physical Electronics, Brno, Czech Republic, 3Department of Microelectronics, Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Bratislava, Slovak Republic, 4Institute of Nuclear Physics, Academy of Sciences of the Czech Republic, Rez near Prague, Czech Republic, 5Czech Metrology Institute, Brno, Czech Republic
PO1065 Low stress, nanostructured, biocompatible DLC coatings prepared by thermionic vacuum arc method
Cristian P. LUNGU1, Ionut JEPU1, Ana Mihaela LUNGU1, Constantin Fenic1, Carmen MOLDOVAN2, Bogdan FIRTAT2, Radu ALBULESCU3, Cristiana GRIGORESCU4
1NILPRP, Bucharest, Romania, 2IMT, Bucharest, Romania, 3NICP, Bucharest, Romania, 4INOE 2000, Bucharest, Romania
PO1066 DLC-Si THIN FILMS DEPOSITED BY REACTIVE SPUTTERING: STRUCTURAL AND OPTICAL EVOLUTIONS.
Eric Tomasella1, Tiphaine Soubeyrand2, Eric Tomasella2, Angelique Bousquet2, Marc Dubois2, Joel cellier2, Thierry Sauvage3, Celine Eypert4, Jean Paul Gaston4, El Matti Ech-Chamikh5
1LMI - université Clermont 2, aubiere, France, 2LMI-CNRS, aubiere, France, 3CEMHTI-CNRS, Orleans, France, 4Horiba Jobin Yvon, Chilly mazarin, France, 5LPSCM, Marrakech, Morocco
PO1067 Optical versus microscopic properties of ECR and RF-bias generated amorphous hydrogenated carbon layers
Andreas Hertwig1, Maksym Rybachuk2, Matthias Weise3, Uwe Beck3
1BAM - Fed Inst for Materials Research, Berlin, Germany, 2Universite de Quebec, Varennes, Canada, 3BAM, Berlin, Germany
PO1068 Hard graphite-like hydrogenated amorphous carbon grown by a remote plasma on steel substrates for tribological applications
Teodor Zaharia1, Roland Groenen2, Peter Persoone2, Richard van de Sanden1
1Eindhoven University of Technology, Eindhoven, Netherlands, 2N.V. Bekaert S.A., Zwevegem, Belgium
PO1069 Hydrogen Content Variation for Enhancing the Lubricated Tribological Performance of DLC Coatings
Koray Yilmaz1, Kirsten Bobzin2, Nazlim Bagcivan2, Sebastian Theiß2
1Surface Engineering Institute RWTH, Aachen, Germany, 2Surface Engineering Institute RWTH Aachen, Aachen, Germany
PO1070 Application of DLC films deposited by plasma CVD for effective protection of flexible substrates
Diego Martínez Martínez1, Mark Schenkel1, J.P. van der Pal1, Yutao Pei2, J.Th.M. De Hosson1
1Materials Innovation Institute, Groningen, Netherlands, 2Materials Innovation Insitute, Groningen, Netherlands
PO1072 Adhesion behavior of CVD- diamond coatings on WC-Co insert deposited onto Cr- based sublayers prepared by PVD and PED methods
Ekaterina Azarova1, Evgeny Levashov2, Victor Ralchenko3, Andrey Bolshakov3, Evgeny Ashkinazi3, Satoru Hosomi4
1MISIS, Moscow, RussianFederation, 2National University of Science and Technology “MISIS”, Moscow, Leninsky prospect, 4, Russian Federation, 3A.M. Prokhorov General Physics Institute of Russian Academy of Science, Moscow, Vavilova str., 38, Russian Federation, 4Tomei Diamond Co. Ltd., Oyama Plant 4-5-1, Jyoto, Oyama Tochigi, Japan
PO1073 Tribological properties of a-C:H:F coatings with different chemical compositions
Jean-Pierre Lavoute1, Cédric Jaoul1, Olivier Jarry2, Pascal Tristant1, Christelle Dublanche-Tixier1, Hélène Ageorges1, Maggy Colas1, Thérèze Merle-Mejean1
1Université de Limoges, CNRS, SPCTS, Limoges Cedex, France, 2Sorevi Bekaert, Parc Ester Technopôle, Limoges, France
PO1074 Tribological properties of a-C:N coatings prepared by magnetron sputtering and anode layer source
Srecko Paskvale1, Peter Panjan1, Miha Cekada1, Markus Kahn2, Borut Podgornik3
1Jozef Stefan Institute, Ljubljana, Slovenia, 2Joannuem Research, Laser Center Leoben, Niklasdorf, Austria, 3Centre for Tribology and Technical Diagnostics, Ljubljana, Slovenia
PO1076 Effect of nitrogen on tribological properties of X-ray amorphous carbon films with added titanium
Martin Hromadka1, Petr Novak1, Jindrich Musil1
1Dep. of Physics, Univ. of West Bohemia, Plzen, CzechRepublic
PO1077 Carbon coatings doped by copper: tribological behavior in olive oil lubrication
Roseli Marins Balestra1, Alichandra M. G. Castro2, Manuel Evaristo2, P. Mutafov3, Tomas Polcar3, Albano Cavaleiro2
1SEG-CEMUC Dep. Eng. Mech. Univ. Coimbra, Coimbra, Portugal, 2SEG-CEMUC – Department of Mechanical Engineering, University of Coimbra, Coimbra, Portugal, 3Department of Control Engineering, Faculty of Electrical Engineering, Czech Technical University, Prague, Czech Republic
PO1078
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Poster - Plasma treatment of polymers and textiles

PO1079 In-situ XPS study of low energy argon and oxygen ions etched flexible polymeric substrates
Martin Kormunda1, Jaroslav Pavlik1
1Purkinje University, Usti nad Labem, CzechRepublic
PO1080 Impact of Atmospheric Pressure Plasma on Polymers: Modification vs. Etching
Katja Fricke1, Andreas Vogelsang1, Karsten Schröder1, Thomas von Woedtke1, Klaus-Dieter Weltmann1
1INP Greifswald e.V., Greifswald, Germany
PO1081
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PO1082 Polystyrene surface modification with atmospheric pressure capillary dielectric barrier micro-plasma jet
Jun-Seok Oh1, Kyle Doherty2, Rachel Williams2, Carl Sheridan2, Paul Unsworth3, Andrew Bowfield3, Peter Weightman3, Paul Bryant1, James Bradley1
1University of Liverpool, Liverpool, UnitedKingdom, 2Clinical Engineering, University of Liverpool, Liverpool, United Kingdom, 3Physics, University of Liverpool, Liverpool, United Kingdom
PO1083 Polymer surface functionalization based on SO2 plasma treatments
Andreas Holländer1, Stefan Kröpke2
1Fraunhofer IAP, Potsdam, Germany, 2Fraunhofer-Institut für Angewandte Polymerforschung, Potsdam, Germany
PO1084 Argon Plasma Treatment of Polymers - Trapping of Radicals by Nitric Oxide Gassing
Maalolan Ramanujam1, Renate Mix2, Joerg Friedrich2
1BAM-Federal Inst for Materials research, Berlin, Germany, 2Federal Institute for Materials Research and Testing, Berlin, Germany
PO1085 Plasma modification of PET foils with different crystallinity
Tinneke Jacobs1, Nathalie De Geyter1, Rino Morent1, Christophe Leys1
1Faculty of Engineering, Ghent University, Gent, Belgium
PO1086 Polyurethane treatment by air dielectric barrier discharge at atmospheric pressure
Konstantin Kostov1, Alessandro L. R. dos Santos1, Pedro A. P. Nascente2, Milton E. Kayama1, Rogerio P. Mota1, Mauricio A. Algatti1
1State University of Sao Paulo - UNESP, Guaratingueta, SP, Brazil, 2Federal University of São Carlos - UFSCar, São Carlos, SP, Brazil
PO1087 Surface modification of Poly(tetrafluoroethylene) and Poly(vinylidene difluoride) using atmospheric pressure plasma jet in Ar/CO2 mixtures
Abdollah Sarani1, Emile Carbone2, Anton Yu Nikiforov3, Christophe Leys3, François Reniers2
1Department of Applied Physics, Gent Univ, Gent, Belgium, 2Université Libre de Bruxelles (ULB) Faculté des Sciences Service de Chimie Analytique et Chimie des Interfaces, Brussels, Belgium, 3Ghent University, Department of Applied Physics, Gent, Belgium
PO1088 EFFECT OF THE TYPE OF GAS AND TEMPERATURE DURING ATMOSPHERIC PRESSURE GLOW DISCHARGE TREATMENTS ON LDPE FILMS
Lorenzo Bautista1, Jordi Mota1, Laia Crespo1, Mercè de la Fuente1, Meritxell Martínez1, Chiara Pavan2, Meritxell de la Varga1, Laurent Aubouy1
1LEITAT TECHNOLOGICAL CENTER, Terrassa, Spain, 2GRINP, S..r.l. - R&D DEPARTMENT, Torino, Italy
PO1089 Investigations on the influence of hygroscopic surfaces on the plasma-assisted modification of polyamide
Friederike von Fragstein1, Karim Bahroun1, Walter Michaeli1
1Institut für Kunststoffverarbeitung, Aachen, Germany
PO1090
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PO1091 Modification of chitosan by different plasmas
Vera Elinson1, Ramilya Nezhmetdinova2, Alexandr Naumkin3, Andrey Lyamin4, Olga Podlesnaya5
1"MATI"-Russian State Technological Univ., Moscow, RussianFederation, 2"MATI" - Russian Technological University, Moscow, Russian Federation, 3Institute of Elementoorganic Substances of RAS, Moscow, Russian Federation, 4"MATI"- Russian Technological University, Moscow, Russian Federation, 5"MATI" - Russian Technological university, Moscow, Russian Federation
PO1092 Quantitative Chemical Determination of Organic Layers using CDXPS: A Standard Experimental Procedure ?
Pierre-Luc Girard-Lauriault1, Paul Dietrich1, Thomas Gross1, Wolfgang E.S. Unger1
1BAM, Berlin, Germany
PO1093 Plasma tailoring of polycarbonate to the desired SuperHydrophilic/SuperHydrophobic features
Fabio Palumbo1, Rosa Di Mundo2, Riccardo d'Agostino3, Davide Cappelluti4
1CNR-IMIP, Bari, Italy, 2Dipartimento di Chimica Universita di Bari, Bari, Italy, 3Plasma Solution s.r.l., Bari, Italy, 4Dipartimento di chimica - Universita di Bari, bari, Italy
PO1094
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PO1095 Plasma treatment of membranes for direct methanol fuel cells
Matthias Walker1, Joachim Schneider1, Andreas Schulz1, Jochen Kerres2, Ludwig Jörissen3, Ulrich Stroth1
1Inst. f. Plasmaforschung, Uni Stuttgart, Stuttgart, Germany, 2Inst. f. Chem. Verfahrenstechnik, Uni Stuttgart, Stuttgart, Germany, 3ZSW Baden-Württemberg, Ulm, Germany
PO1096
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PO1097 Primary amine grafting on polystyrene using a non destructive plasma functionalization technique
Cristina Navio1, Thomas Godfroid2, Benoit Ruelle1, Rony Snyders3
1Université de Mons, Mons, Belgium, 2Materia Nova Research Center, Mons, Belgium, 3Université de Mons and Materia Nova Research Center, Mons, Belgium
PO1098 Plasma functionalization of foils and technical textiles with specific tunable wetting behavior
Michael Haupt1, Brunhilde Kindle-Hasse2, Jakob Barz1, Christian Oehr1, Matthias Bess3, Rudolf Knes3, Wolfgang Siefert2, Heinz Hilgers4
1Fraunhofer IGB, Stuttgart, Germany, 2ROWO Coating GmbH, Herbolzheim, Germany, 3Pink GmbH Plasma-finish, Wertheim-Bestenheid, Germany, 4Cerobear GmbH, Herzogenrath, Germany
PO1099 Overview of the interaction between sputtered deposited metal layers and PET surfaces
Martin Amberg1, Enrico Körner2, Sebastien Guimond2, Barbara Hanselmann2, Dirk Hegemann2
1EMPA Materials Science and Technology, St. Gallen, Switzerland, 2EMPA Materials Science and Technology, St. Gallen, Switzerland
PO1100 Dielectric properties of carbon-unvowen fabric composite obtained by plasma assisted physical vapour deposition.
Maciej Jaroszewski1, Janina Pospieszna1
1Wroclaw University of Technology, Wroclaw, Poland
PO1101 Zinck-unvowen fabric composite obtained by magnetron sputtering.
Maciej Jaroszewski1, Jan Ziaja1
1Wroclaw University of Technology, Wroclaw, Poland
PO1102 Evaluation of biological safety for plasma-polymer treatment.
Victor Vasilets1, Valentina Egorova2, Viktor Sevastianov2
1IEPCP Russian Academy of Sciences, Chernogolovka, RussianFederation, 2Federal Research Center of Transplantology and Artificial Organs, Moscow, Russian Federation

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